退火处理

通过90oC退火处理，纳米胶束转变为PS在表面的环状结构。

After annealed at 90 oC , the micelle structure was transferred into donut-like structure with more PS on the surface .

对轧制复合的AgCu双金属薄板采用不同温度的退火处理，研究了结合面分离强度随退火温度变化的规律，讨论了影响分离强度的因素。

The Ag / Cu bimetallic strips bonded by roll process were annealed at different temperatures . The effect of annealing temperature on the peeling strength was investigated and the mechanism responsible for the peeling strength various with annealing temperature was discussed .

退火处理对冷喷涂Ni涂层组织与力学性能的影响

Effect of Annealing Treatment on Microstructures and Mechanical Properties of Cold-sprayed Ni Coating

Ti缓冲层及退火处理对Si（111）基片上生长的ZnO薄膜结构和发光特性的影响

Photoluminescence of as-grown and annealed ZnO films on Ti-buffered Si ( 111 ) substrates

退火处理对纳米ZnO膜结构及气敏特性的影响

Effects of annealing on gas sensing performance and microstructure of nano-grain ZnO films

采用射频磁控溅射复合靶技术制备了SiSiO2薄膜，并在各种温度下进行了退火处理。

The Si-SiO_2 films are prepared by RF co-sputtering technique .

退火处理对Nano-SiC-Al2O3/TiC纳米陶瓷复合材料性能的影响

Effect of Annealing Process on Nano SiC Al_2O_3 / TiC Ceramic Composites

退火处理Fe（Co）Al（Zr）O系薄膜磁性能的研究

Magnetic Properties of Annealed Fe ( Co ) Al ( Zr ) O System Films

非晶软磁合金Fe（73.5）Cu1Nb3Si（13.5）B9的退火处理与性能研究

Annealing treatment of amorphous soft magnetic alloy Fe_ ( 73.5 ) Cu_1Nb_3Si_ ( 13.5 ) B_9 and investigation of its properties

N2、Ar气氛下快速退火处理硅片获得洁净区和氧沉淀的研究

The formation of the denuded zone and the oxygen precipitates with Rapid Thermal Annealing process under N_2 and Ar

退火处理对SnOx薄膜气敏性能的影响

Influence of Heat Treatment on the Gas Sensitivity of SnO_x Thin Film

由于样品未作高温热退火处理，为此由Al组分误差函数模型推导的扩散长度要大大高于扩散系数公式。

The diffusion lengths of Al component calculated from error function were larger than that calculated from coefficient of diffusion formula .

光亮退火处理304不锈钢在NaCl溶液中的耐蚀性

Study on corrosion resistance of bright annealing treated 304 stainless steel in NaCl solutions

研究了直接退火处理和涂敷CdCl2甲醇饱和溶液后退火处理对CdS薄膜的影响。

The influence of annealing and CdCl_2 treatment on CBD-CdS thin film was studied .

退火处理对ITO表面特性及有机发光器件性能的影响

Influence of Annealing Treatment on ITO Surface and OLED Performances

沉积温度和退火处理对脉冲激光沉积的ZnO∶Al膜性能的影响

Influence of substrate temperature and post-treatment on the properties of ZnO ∶ Al thin films prepared by pulsed laser deposited

a－SiN∶H的退火处理及其对a－Si∶HTFT性能与可靠性的影响

Annealing Behaviour of a-SiN ∶ H and Its Effects on Performances and Reliability of a-Si ∶ H TFTs

说明在空气气氛下对Tm∶YAG晶体进行退火处理改善了晶体的性能。

It indicates that laser properties of Tm ∶ YAG crystal are improved after annealing in atmosphere .

脉冲偏压及退火处理对电弧离子镀N掺杂TiO2薄膜结构和性能的影响

Effect of Pulsed Bias and Post-annealing on Structure and Performance of N-doped TiO_2 Films Deposited by Arc Ion Plating

通过在空气、N2、H2不同气氛环境下900℃保温并退火处理，控制T&ZnO晶须中的本征缺陷浓度；

The intrinsic defects concentration of ZnO was changed through heat treatment at 900 ℃ and annealing in air , N_2 and H_2 atmosphere respectively ;

用磁控溅射法（RMS）制备了SiC微晶薄膜，并对其进行了退火处理。

Microcrystal SiC films were prepared by RF-magnetron sputtering technique ( RMS ) and then annealed .

退火处理对ZnS薄膜的结构和光学性质的影响

Influences of Annealing Treatment on Structure and Optical Properties of ZnS Films

发现Mn~+离子、C离子的注入都会损伤样品的晶格结构，从而影响样品的发光特性，而退火处理对这些损伤有一定的修复作用，这可以从发光峰强度的变化及波长的蓝移来判定。

Moreover , the crystal lattice structure will be restored after annealing , which can be determined by the change of fluorescence peak intensity and blue migration of wavelength .

对两种合金进行扩散退火处理，并对退火处理前后的金相显微组织进行了比较研究：最后对这两种合金进行了X射线衍射实验和吸放氢性能测试实验。

After diffuse annealing , these two alloys'microstructure were analyzed and compared . At last , X-ray diffraction experiment and hydrogen absorption experiment were done .

对喷射成形制备的钢/AlPb合金复合板材的微观组织，轧制和退火处理后的组织及耐磨性进行了研究。

Microstructure and wear resistance of spray formed steel / Al-Pb composite strip after spray forming , rolling and annealing were studied .

XRD数据显示，与Gr复合的NiCo纳米粒子经退火处理后具有晶格结构，且不规则的分散在Cr表面。

XRD shows that NiCo nanoparticles have crystal structures after annealing , irregularly dispersing on Gr surface .

改善薄膜的发光性能，在500℃退火处理过的ZnO薄膜PL谱中几乎看不到深能级发光现象；

The film which annealed over 500 ℃ almost cannot be seen any deep level emission in the spectra of PL.

结合XRD谱图分析结果可发现，退火处理对纳米晶粒的形成与长大起着关键作用。

From the XRD spectrum it is found that the annealing plays a key part in the nano crystal grain forming and growing .

在超高真空条件下，经300&600℃的热退火处理，可促进Cr膜与金刚石基底间的界面扩散和反应。

The interface diffusion and reaction between Cr and diamond was promoted by annealing in the range from 300 ℃ to 600 ℃ in high vacuum .

而且，后期的退火处理对CdS薄膜的结构、形貌、透射率也有很大影响。

In addition , post-annealing treatment had greatly affected on the structure , surface morphology and transmittance of CdS thin films .