湿法刻蚀

Cr掩模在硅湿法刻蚀中的应用研究

Application of Cr Mask in Si Wet Etching

湿法刻蚀对Si基片孔点阵及ZnO外延薄膜周期形貌的影响

Influence of wet etching on the morphologies of Si patterned substrates and ZnO epilayers

Cr薄膜的沉积与湿法刻蚀工艺研究

A Study on Cr Thin Films Depositing and its Wet-Etching

基于湿法刻蚀的MEMS压印模版制作

Imprint Template Fabrication Method for MEMS Based on Wet Etching

光增强湿法刻蚀提高Si衬底垂直结构GaN基LED的出光效率

Improvement for Extraction Efficiency of Vertical GaN-Based LED on Si Substrate by Photo-Enhanced Wet Etching

另一方面，GaN材料的湿法刻蚀也是一个重要的研究课题。

Besides , wet etching of GaN is also an important subject .

利用限制扩散湿法刻蚀法制作GaAs微透镜

Fabrication of GaAs-microlens by using diffusion-limited wet etching

GaN材料湿法刻蚀的研究与进展

Research and Progress of Wet Etching for GaN

在此基础上，利用氧化、湿法刻蚀及背面释放等传统MEMS工艺，批量制备了所需带纳米孔的空心针尖阵列。

Based on this , nano-aperture hollow pyramid tip arrays are fabricated using the traditional MEMS fabrication process .

PZT铁电薄膜的雾化湿法刻蚀技术研究

Research of Spray Etching of PZT Film

在湿法刻蚀过程中，Si（111）面腐蚀是各向同性的，导致腐蚀会形成圆弧状侧壁剖面。

The arcuate sidewall etching profile is formed due to anisotropy of Si ( 111 ) plane during the process of wet etching .

电化学湿法刻蚀来选择性剥离GaN外延获得的自由无支撑LED薄膜能有效解决这些困扰。

Electrochemical wet etching to selectively stripping the GaN epitaxial to get the freedom unsupported LED film can effectively solve these problems .

并且采用湿法刻蚀技术，制备了该结构的LED芯片，测试得到该种LED芯片出光效率较之普通LED芯片提高了33%。

Then the LED of this kind of structure is gotten by means of wet etching , and its efficiency increases by33 % compared with normal LED .

利用天然氧化层掩模的真空紫外硅闪耀光栅的湿法刻蚀制作湿法刻蚀对Si基片孔点阵及ZnO外延薄膜周期形貌的影响

Vacuum-ultraviolet Blazed Silicon Gratings Anisotropically Wet-etched by a Native-oxide Mask Influence of wet etching on the morphologies of Si patterned substrates and ZnO epilayers

用浸没的湿法刻蚀方法，以熔石英为基板刻蚀材料，用优化配方的HF刻蚀液进行刻蚀，研究了HF刻蚀一维光栅台阶的斜坡陡度。

By immersing wet_etch method , slope angle of one_dimension step gratings is studied with fused silica and optimized etching liquor HF .

讨论了薄膜生长的几种常用方法，说明了热氧化和化学汽相沉积（CVD）、湿法刻蚀和干法刻蚀（ICP）分别所适用的范围极其对波导性能的影响。

We also explained the difference of hot oxide and CVD ( chemical vapor deposition ), wet etching and dry etching .

HF/CrO3溶液对AlGaAs的选择性湿法刻蚀应用于楔型结构的制备

Selective Wet Etching of HF / CrO_3 Solution on AlGaAs : Application to Vertical Taper Structures

Pyrex玻璃的湿法刻蚀研究

Wet Etching of Pyrex Glass

本文在实验室的前期工作基础上尝试了利用湿法刻蚀技术进行基于SOI材料AWG器件的波导制作。

Based this principle and the previous experimental work of our laboratory , this paper attempts to fabricate the AWG devices on SOI by wet etching method .

湿法刻蚀具有设备简单，操作方便，所用化学药品毒性小，对GaN材料损伤小等优点，可以作为干法刻蚀的补充。

Wet etching has many advantages , such as simple equipment , convenient operation , nontoxic gases and small damage to GaN sample , so it is a useful supplement to dry etching of GaN .

回顾了近年来GaN材料湿法刻蚀的研究进展，着重探讨了GaN材料光辅助化学湿法刻蚀的机理、p-GaN材料湿法刻蚀的难点以及湿法刻蚀在GaN材料研究中的应用。

The progress of wet etching for GaN is reviewed . We have discussed the mechanism of photo-assisted chemical wet etching , the difficulty of p-GaN wet etching and the application of wet etching in the research of GaN .

分别用湿法刻蚀（HF）和干法刻蚀（NH3）对异质结界面进行预处理，可以有效钝化界面，减少因界面复合而造成的效率损失。

Then , the wet-etching ( HF ) and dry-etching ( NH3 ) were used to pre-treat the interface of heterojunction separately , which can passivate the interface effectively and reduce the efficiency loss due to the recombination at the interface .

该文主要介绍以加工金属、聚合物以及陶瓷为主的LIGA技术，先进硅刻蚀技术（ASE）和石英晶体深槽湿法刻蚀技术。

Three main bulk micromachining processes are described in the paper : the LIGA technology , which is mainly for processing of metal , polymer and ceramic , anisotropic silicon etch ( ASE ) techniques and deep wet chemical etching of quartz process .

采用SODA&LIME玻璃、水热法制备的压电薄膜和浇注成型的PDMS盖片，通过光刻、显影和除铬、湿法刻蚀、掩蔽层去除等微加工工艺，制作了无阀压电微泵。

SODA & LIME glass , PZT thin film by hydrothermal method and PDMS plate by casting moulding are together used to equip a valveless micropump . The processes of lithography , develop and dechromisation , wet etching and masking layer removing are investigated forthe micropump fabrication .

采用选择性湿法刻蚀，制备出基于InP/空气隙的分布布拉格反射镜，并将该结构的反射镜引入RCE光电探测器。

InP / air-gap distributed Bragg reflector ( DBR ) with high reflectivity is fabricated by using selective wet etching . Moreover , long wavelength RCE photodetectors with InP / air-gap DBR is realized for the first time .

对Pyrex7740玻璃的湿法刻蚀工艺进行了研究。

The deep wet etching of Pyrex 7740 glass is investigated .

在湿法刻蚀诱导坑时，需适当延长刻蚀时间。

Etching time has been extended in wet etching course .

湿法刻蚀熔石英斜坡陡度的研究

Study on the Etching Slope Angle of Fused Silica with Wet-etching Method

基于细胞自动控制算法的硅各向异性湿法刻蚀物理仿真

Cellular Automatic Control Algorithm-Based Anisotropic Silicon Wet Etching Physical Simulation

基于玻璃湿法刻蚀的微流控器件加工工艺研究

Research on glass wet etching for micro fluidic devices