正性光刻胶

JS-4正性光刻胶两重性的研究

A Study of Image Duality of JS-4 Positive Photoresist

正性光刻胶在圆分划元件光刻中的应用

Application of Positive Photoresist in the Lithography of Circular Divided Elements

在电极制作过程中，对Cu表面上覆盖的正性光刻胶的前、后烘烤温度及时间进行了研究。

During the course of making electrodes , the temperature and time for pre-bake and hard-bake of positive photoresist on the surface of Cu were studied ;

BP-212正性光刻胶的抗蚀特性研究

Studies of the Corrosion Resistance of BP-212 Positive Resist

正性光刻胶使用的一种新方法&低温显影技术

New Technology for Using Positive Photoresist & Low Temperature Development

正性光刻胶的噪声抑制

Noise restrain of positive photoresist

本文简要地叙述了正性光刻胶的基本特性，详细地讨论了它的感光机理和工艺参数的选择。

Teh basic properties of positive photoresist are briefly presented , photosensitive mechanism and the selection in technological parameters are discussed in detail in the paper .