四甲基氢氧化铵

四甲基氢氧化铵的制备与提纯综述

The Preparation and Purification of TMAH

研究了浓度为10%的四甲基氢氧化铵（TMAH）溶液，在不同量的Si粉掺杂下，对铝膜及硅衬底的腐蚀及其pH值的变化。

Characterization of etching of Al film and Si substrate with 10 % tetramethylammonium hydroxide ( TMAH ) has been done at a condition of adding various amount of Si dust .

四甲基氢氧化铵（TMAH）的制备（Ⅰ）四甲基氢氧化铵在MEMS中的应用

Preparation of tetramethyl ammonium hydroxide ( I ) application of TMAH solution in MEMS

使用四甲基氢氧化铵（TMAH）作为分散剂，研究了分散剂用量对SiC浆料流变性能的影响，并分析了其原因。

Using tetramethyl ammonium hydroxide ( TMAH ) as dispersant for SiC aqueous suspension , the effects of dispersant concentration and pH value on the rheological behavior of SiC aqueous suspension were studied .

实验研究了在负压0.1MPa的情况下，五水四甲基氢氧化铵与异丙醇共沸4h，然后减压真空干燥得到四甲基氢氧化铵三水结晶化合物的过程。

The study depicts the process of tetramethyl ammonium hydroxide pentahydrate and isopropyl alcohol azeotropic in the case of negative pressure 0.1 Mpa for 4h , and then dried by vacuum .

当归水溶性多糖的分离、纯化及结构初步分析四甲基氢氧化铵的制备与提纯综述

The Preparation , Purification and Structure Analysis of Water-Soluble Polysaccharides from Angelica sinensis

四甲基氢氧化铵制备方法及应用

Preparation and Applications of Tetramethylammonium Hydroxide

因此，研究结晶水的脱除工艺条件，尽可能的使四甲基氢氧化铵纯度提高，制得三水的四甲基氢氧化铵结晶化合物具有非常重要的意义。

Therefore , the study of crystal water removal technique to prepare high purity tetramethylammonium hydroxide is very important .

四甲基氢氧化铵广泛应用于半导体清洗，而其主要的电解原料四甲基氯化铵中的金属离子含量直接影响产品纯度。

Tetramethylammonium hydroxide is used in cleaning semiconductor , but metal ions in its primary raw material tetramethylammonium chloride will affect product purity .