正性光刻胶
- 网络positive photoresist;positive resist;Positive Photo Resist
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JS-4正性光刻胶两重性的研究
A Study of Image Duality of JS-4 Positive Photoresist
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正性光刻胶在圆分划元件光刻中的应用
Application of Positive Photoresist in the Lithography of Circular Divided Elements
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在电极制作过程中,对Cu表面上覆盖的正性光刻胶的前、后烘烤温度及时间进行了研究。
During the course of making electrodes , the temperature and time for pre-bake and hard-bake of positive photoresist on the surface of Cu were studied ;
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BP-212正性光刻胶的抗蚀特性研究
Studies of the Corrosion Resistance of BP-212 Positive Resist
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正性光刻胶使用的一种新方法&低温显影技术
New Technology for Using Positive Photoresist & Low Temperature Development
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正性光刻胶的噪声抑制
Noise restrain of positive photoresist
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本文简要地叙述了正性光刻胶的基本特性,详细地讨论了它的感光机理和工艺参数的选择。
Teh basic properties of positive photoresist are briefly presented , photosensitive mechanism and the selection in technological parameters are discussed in detail in the paper .