多弧离子镀

采用多弧离子镀技术制备了Ti（C，N）基金属陶瓷功能梯度材料。

A reasonable technology of preparation of gradient hard coatings by multi-arc ion plating was introduced .

高速钢刀具多弧离子镀TiN涂层研究

Study of Multi-Arc Ion Plating TiN Films on High Speed Steel Tools

（Ti，Cr）N薄膜的多弧离子镀工艺、显微结构及力学性能研究

Research on the Deposition Technique and Microstructure of Titanium Chromium Nitride Thin Films

多弧离子镀TiN／Cu多层复合纳米膜研究

Nanometer multilayer complex TiN / Cu film preparation by multi-arc ion plating

多弧离子镀TiN涂层结合力的影响因素

Factors Affecting Adhesive Strength of Multi Arc Ion Plated TiN Coating

TiN多弧离子镀涂层质量与X射线衍射图谱

Relationship of X-ray Diffraction Pattern with TiN Coatings Quality

多弧离子镀沉积温度对TiN涂层性能的影响

The effect of deposition temperature of multi-arc on properties of TiN coatings

Mo+C离子注入多弧离子镀TiN薄膜研究

Research on Mo + C Implantation into TiN Film by Multi-arc Ion Plating

多弧离子镀TiN涂层在冲孔冲模上的应用

Application of the TiN Coating of Multi arc Ion Plating on the Punching

铝合金表面多弧离子镀TiN涂层的耐磨性能

Wear Resistance of TiN Coating Prepared by Multi-arc Ion Plating on Aluminum Alloy Surface

多弧离子镀TiN装饰膜表面颗粒研究

Study of Macroparticles on TiN Decorative Films Prepared by the Multi-Are Ion Plating Process

多弧离子镀TiN与不同金属基材间的接触界面与表面特性

The Contact Interface and Surface Characters between Multiarc Ion Plating TiN and Different Base Materials

不同偏压下铀表面多弧离子镀TiN薄膜性能研究

Properties of TiN Films on Uranium Surface by Arc Ion Plating under Different Bias Voltages

空心阴极与多弧离子镀TiN薄膜的表面形貌及性能

Surface morphology and properties of the hollow cathode ion-plating and multi-arc ion plated TiN film

低温磁控溅射与普通多弧离子镀TiN薄膜的摩擦学性能比较

A Comparison of the Tribological Properties Between Low Temperature Magnetic Sputtering and Multi-arc Ion Plating TiN Films

Cr在多弧离子镀（Ti，Cr）N复合膜中的作用

Effect of Cr element on properties of ( Ti , Cr ) N composite films prepared by multi-arc ion coating

多弧离子镀CrNx涂层的工艺与摩擦磨损性能

Preparation Parameters and Tribological Properties of Multi-ion Plated CrN_x Coatings

采用多弧离子镀的方法在Ti50.6%（原子分数）Ni形状记忆合金表面沉积了钽镀层。

Tantalum coating was obtained on the surface of Ti-50.6at % Ni shape memory alloy by multi-arc ion plating method .

多弧离子镀IGBT逆变弧焊电源

IGBT Arc welding Inverter for Multi-Arc Ion Plating

在多弧离子镀设备上沉积了TiN涂层，研究了不同沉积温度下TiN涂层的表面硬度及与基体的结合力。

This paper studied the hardness and the adhesion of TiN coatings by multi arc technique with different deposition temperatures .

空心阴极与多弧离子镀TiN涂层高速钢摩擦磨损特性的比较研究

Study on Comparison of Properties of Friction and Wear of TiN Coating on HSS by Methods of IP with HCD and ARC

氮分压对多弧离子镀TiN涂层相结构及性能影响的研究

Study on the Resistivity of Phase Structures and Properties of TiN Coating of Ion Plating with Multiple Arc Sources by N_2 Partial Pressure

采用DC反应磁控溅射和多弧离子镀相结合的方法，在高速钢基体上沉积C3N4/TiN复合超硬薄膜。

By combination of DC reaction magnetron sputtering with multiple arc ion plating , the superhard C 3N 4 / TiN compound film is deposited onto HSS base .

基片方向对多弧离子镀ZrN涂层性能的影响

Influence of Substrate Direction on Properties of Multi-arc Ion Plating ZrN Coatings

分别采用多弧离子镀和直流磁过滤弧源沉积两种成膜方法在齿轮和试块表面覆氮化钛（TiN）陶瓷涂层和C：N超硬涂层。

TiN and C : N coatings , deposited by Multi-arc Ion Plating technology andDFAD ( Direct Current Filtered Arc Deposition ) , are coated on gears and specimen .

本研究采用多弧离子镀技术在制备TiN薄膜的基础上获得TiN/AlN纳米多层膜，并对TiN/AlN纳米多层膜的性能做了初步探讨。

Furthermore properties of TiN / AlN nano-multi layers were also studied preliminarily . The first part of this paper is the study of preparation of TiN films using multi-arc ion plating .

双层辉光等离子多元共渗源极成分设计硬质合金表面多弧离子镀（Ti，Al，Zr，Cr）N多元氮化物膜

Source cathode composition design in multi-element surface alloying by double glow plasma technique Multi-component ( Ti , Al , Zr , Cr ) N films deposited on cemented carbide by multi-arc ion plating technology

多弧离子镀Ti-N镀膜的扩散屏障作用

Role of multi-arc plated Ti-N film as a diffusion barrier

使用多弧离子镀在铜基镀Cr的衬底上制备TiN薄膜，借助表面分析技术研究了不同温度下离子镀TiN与Cr/Cu接触的界面与表面性质。

TiN films were prepared on copper based Cr substrates by multi arc ion plating . Interface of TiN in contact to Cr / Cu and surface properties were investigated by surface analysis technique .

利用脉冲多弧离子镀技术在硅基底上沉积类金刚石薄膜.喇曼光谱和X射线衍射分析表明：类金刚石薄膜是无定形结构；

Diamond like carbon ( DLC ) films have been prepared on silicon by pulse arc plasma deposition . The structure of DLC films were investigated by Raman spectrum and X ray diffraction , which show amorphous structure .