光学薄膜

  • 网络Optical Film;film;Optical coating
光学薄膜光学薄膜
  1. 用于二极管泵浦的Nd∶YAG激光器上的光学薄膜

    Optical Film for Nd ∶ YAG Laser Pumped by LD

  2. ZrO2光学薄膜的激光热冲击效应

    Thermal Shock Effect on Optical Film Damage Induced by High Power Laser

  3. 可扩展光学薄膜Mapping测量平台的设计与实现

    Design and Realization of Extensive Optical Thin Film Mapping Measurement Platform

  4. CAD在光学薄膜设计和生产中的应用

    Application of CAD in Design and Manufacture for Optical thin Films

  5. CO2连续激光预处理基板对光学薄膜损伤阈值的影响

    Effect of co_2 laser irradiated substrates on damage threshold of optical coatings

  6. 由于斜入射时,光学薄膜存在一定的偏振效应,将产生S和P偏振光的光谱分离。

    Optical thin films exhibit inevitable polarization effects at oblique incidence , which leads to the spectral splitting of s-and p-polarization components .

  7. 多层光学薄膜周期厚度的双晶X射线掠入射研究

    Study of periodic thickness of multilayer optical thin films by double crystal grazing incident X ray

  8. 介绍了一种高性能的多通道光学薄膜膜厚监控系统的设计与制作,系统使用了CCD作为线阵探测器。

    A high performance multi channel optical monitor for coating has been designed and fabricated .

  9. 离子束溅射沉积Ta2O5光学薄膜的实验研究

    Experimental study for ion beam sputtering deposition of Ta_2O_5 optical thin film

  10. 合成一种新的推拉型偶氮化合物并将掺入PMMA中制成光学薄膜器件。

    The new push-pull azobenzene compound was synthesized and doped into PMMA films .

  11. 溶胶-凝胶法制备SiO2基片Er~(3+)∶Al2O3光学薄膜

    Er ~ ( 3 + )∶ Al_2O_3 Optical Films on SiO_2 Substrate Prepared by the Sol-Gel Method

  12. 退火对TiO2和Ta2O5光学薄膜的结构和光学性质的影响

    Effect of Annealing on the Structure and Optical Properties of the TiO_2 and Ta_2O_5 Optical Films

  13. 红外光学薄膜材料ZnS靶材的研制

    A new technique for the preparation of an infrared optical film material-ZnS target

  14. 在光学薄膜制备中,TiO2是常用的高折射率材料。

    TiO_2 is often used as high refractive index material in optical thin film preparation .

  15. 用X-射线电子能谱仪分析TiO2光学薄膜

    X-ray photoelectron spectroscopy of TiO_2 films

  16. 光学薄膜技术改善分布反馈(DFB)激光器的光谱特性

    Coating Optical Films Improved Spectral Characteristics of DFB Laser

  17. 利用Pb(1-x)GexTe材料的折射率异常性质改善红外光学薄膜的低温性能

    Improving low-temperature performance of infrared optical coatings utilizing the abnormal refractive index of Pb_ ( 1-x ) Ge_xTe

  18. 在高能脉冲TEACO2激光系统中,光学薄膜的性能是限制激光功率提高和光束质量改善的关键技术问题。

    In high power TEA CO2 laser systems , optical coatings performance is a key technical problem which restricts the increase of the laser power and the laser beam quality .

  19. 光学薄膜BRDF五参数模型的粒子群优化

    Five Parameters Optimization of BRDF Model of Optical Film by Particle Swarm Algorithms

  20. 高重复频率DPL激光辐照光学薄膜元件温升规律实验研究

    The temperature rise of optical films under DPL-pulsed laser irradiation of high repetition rate

  21. 本文作者用浸镀法制备SnO_2:TiO_2气敏光学薄膜,薄膜质量有所提高。

    In this paper we introduce that the SnO_2 : TiO_2 gas-sensing film is made by using immersion-plating method .

  22. 光学薄膜向XUV区的扩展

    The Extending of Optical Films to XUV Region

  23. 利用光学薄膜原理,计算了采用晶片键合技术来提高以GaAs为衬底的立方相GaN的出光效率的理论可行性。

    The feasibility of improving the light extraction efficiency of GaN / GaAs optical devices by using wafer bonding technique is calculated by the principles of optical thin films .

  24. 本文基于光学薄膜干涉理论成功地设计出一种线性度好和动态范围宽的非对称F-P腔。

    Based on optical thin film characteristic matrix theory , an asymmetric F-P interferometric cavity with good linearity and wide dynamic range is designed .

  25. 讨论了二极管泵浦Nd∶YVO4激光器中使用的一系列光学薄膜,膜系类型涉及截止滤光片、增透膜等。

    A series of optical thin films for diode pumped Nd ∶ YVO 4 Lasers are discussed in the paper , including edge filters and antireflection coatings .

  26. 原子尺度上的ALD过程仿真对深入了解原子层沉积机理,改进和优化薄膜生长工艺,提高薄膜质量,改善光学薄膜性质具有重要意义。

    Simulation of ALD process in atomic scale is of great significance to understand deposition mechanism , optimize film growth processes , and improve quality of films .

  27. 等离子体辅助沉积HfO2/SiO2减反、高反光学薄膜

    Deposition of HfO 2 / SiO 2 antireflective and high reflective optical thin film by plasma IAD

  28. 本文探讨了抑制Rugate光学薄膜通带内反射次峰的各种方法。

    In this paper some methods to suppress the rugate filter sidelobes have been discussed .

  29. 非理想参数下193nm光学薄膜的设计

    Design of 193 nm Optical Thin Films under Practical Structure and Optical Parameters

  30. 研究了沉积时真空室真空度、基片温度和沉积速率对常用电子束蒸发非晶硅(a-Si)光学薄膜的折射率和消光系数的影响。

    The paper investigated the effect of the process parameters , such as chamber pressure , substrate temperature and deposition rate , on the optical characteristics of electron beam evaporation deposited amorphous silicon optical film .