钻蚀
zuàn shí
- undercutting
钻蚀
钻蚀[zuàn shí]
-
加入适量CHF3，可以在侧壁形成钝化层，保护侧壁不受钻蚀。
Addition of CHF 3 results in formation of side wall passivation layers , avoiding side wall undercut .
-
研究目的是优化Ni掩模PMMARIE的刻蚀参数，在氧刻蚀气体中加入表面钝化性气体CHF3，以较快的刻蚀速率获得垂直的侧壁和最小的掩模钻蚀。
The optimization of RIE parameters for Ni mask PMMA etching is studied . The CHF 3 gas of the surface passivation effect is added in the O 2 etching gas to obtain the vertical side wall and minimal mask undercut at a fast etching rate .