刻蚀系统

铁电材料激光刻蚀系统中的PID微机控制技术

PID Control Technology in the Laser Etching System for Ferroelectric Materials

简单介绍了ICP刻蚀系统和刻蚀原理。

The ICP etching system and principle were introduced .

微波ECR等离子体刻蚀系统

Microwave Electron Cyclotron Resonance Plasma Etching System

本论文中，首先对微通道的应用以及相关原理进行了阐述，在经过广泛调研的基础上自行设计了硅/HF的电化学刻蚀系统，并通过上述系统对n型硅进行了刻蚀实验。

Firstly , on the application of micro-channels as well as the related principles are described . After extensive investigation , I designed a silicon / HF electrochemical etching system by myself , and etched n-type silicon through the above-mentioned system .

在一台自行研制的电子回旋共振（ECR）刻蚀系统中用CF4、O2气体实现了Si3N4材料的微细图形刻蚀。

A novel technique has been developed to achieve sub micron etching of silicon nitride films with the plasma of CF 4 and O 2 gas mixture generated by a lab made electron cyclotron resonance ( ECR ) .

高密度等离子体刻蚀系统中诊断模型的初步分析

Primary Analysis for Diagnostic Models Used in High Density Plasma Etching Tools

本文基于光子晶体实验研究的目的，研究设计了一套适用于加工光子晶体的化学辅助离子束刻蚀系统。

In order to fabricate and study the photonic crystal in the laboratory we design a CAIBE system .

作者在研制激光数字点阵全息图的基础上，尝试使用电子束刻蚀系统制作数字像元全息图以期用于防伪和保密模压全息图的制作。

Trial fabrication of digital pixel hologram which are recorded by an electronic beam lithography system to apply to fabrication of embossing hologram for anti counterfeiting and security is described .

分析了用反应离子刻蚀（RIE）系统刻蚀多层难熔金属的可行性。

Refractory metals multilayer , grown on silica coated Si wafer , was etched by reactive ion etching ( RIE ) .

微加工中一种新型刻蚀深度实时检测系统

A Novel Real Time Etching Depth Testing System for Micro Fabrication

通过正交试验，模拟出刻蚀工艺的理想系统参数，该系列参数可以加工出极致的深宽比，同时还能够很好的控制侧壁的垂直度。

And using a set of system process parameters based on the orthogonal test , we can fabricate perfect aspect ratio and control the sidewall verticality well .