光电子谱

真空蒸发沉积18烷基取代螺吡喃薄膜的光致变色及光电子谱研究

Photochromic and XPS Study of Spiropyran Films Grown by Vacuum Deposition

涂层成份及结构的X射线光电子谱分析

XPS analyses of the chemical ingredient and the phase composition of the coatings

X射线光电子谱仪故障分析与维修

Failure analysis and maintenance of X-ray electron spectroscope

用光电子谱研究在20K低温下N2，CO及O2在Ni（110）面上的吸附

Adsorption of N_2 , CO and O_2 on Ni ( 110 ) at 20K

透射电子显微镜（TEM）和X射线光电子谱（XPS）分析表明所得的碳纳米管是氮掺杂的。

X-ray photoelectron spectroscopy ( XPS ) and TEM studies revealed that the CNTs were nitrogen-doped .

采用X射线光电子谱（XPS）对BCN非晶纳米薄膜的结构进行表征。

The structure of BCN amorphous nano-films were studied by XPS .

报道了利用红外吸收谱、X射线光电子谱和表面张力测试仪对新型半导体清洗工艺进行研究的结果。

A new type technique of semiconductor cleaning is studied via infrared absorption spectra , X ray photoelectron spectra and surface tension detector .

利用X射线光电子谱仪（X-rayPhotoelectronSpectroscopy，XPS）对国内外浮法玻璃样品（样品A和样品B）下表面渗锡情况进行了对比分析。

X-ray photoelectron spectroscopy analysis ( XPS ) was used to analyze the tin ion permeation near the surface of different float glass samples .

经X射线光电子谱（XPS）研究证明，该膜就是SiOP结构。

X-ray photon spectroscopy ( XPS ) study indicates that the composition of the layer is SiOP .

应用X射线光电子谱（XPS）技术，研究了贵州岩溶地区红土中方解石及氧化铁矿物表面化学特征及吸附机理。

With the technique of x-ray photoelectron spectroscopy ( XPS ) surface chemistry and adsorption mechanism of calcite from the laterite in Guizhou have been studied .

利用透射电镜（TEM）、X射线衍射（XRD）、X射线光电子谱，表征了金纳米粉末的结构、形貌及其化学组分。

Their structure , morphology and components have been characterized using transmission electron microscope ( TEM ), X-rays diffraction ( XRD ), and X-rays photoelectron spectrometer ( XPS ) .

对抗菌膜进行了扫描电镜、X射线光电子谱和俄歇电子谱的研究与分析，发现抗菌膜中存在多种以银元素的化合物。

The chemical state of silver in the films was analyzed by X-ray photoelectron spectrum , and Auger electron spectrum was performed to determine the concentration of silver atoms in various films .

用X射线光电子谱（XPS）和俄歇电子能谱（AES）研究了Ti／Al2O3界面形成的过程。

The formation process of Ti / Al2O3 ( 1102 ) interface has been studied by X-ray photoelectron spectroscopy ( XPS ) and Auger electron spectroscopy ( AES ) .

二氧化硅薄膜的制备采用了离子束辅助沉积法，薄膜的厚度为2000左右，薄膜成分利用X射线光电子谱仪进行分析，分析结果表明薄膜成分为纯二氧化硅。

Its thickness is about 2 000 A. The ingredients of the films are analyzed by X-ray photo electro spectroscopy . Analysis result shows that the ingredient of the film is pure silica dioxide .

而样品化学计量比和缺陷类型的变化规律则通过X射线光电子谱及慢正电子束注入谱（SPIS）来揭示。

The evolution of stoichiometry and types of defects was indicated by X-ray photoelectron spectroscopy and slow positron implantation spectroscopy .

并利用X射线光电子谱和原子力显微镜等测试方法，分别比较了用两种清洗技术清洗过的硅片表面。

The cleaning effects with two techniques are compared with each other including the silicon surface chemical composition that is observed with X-ray photoelectron spectra , and the morphology observed with the atomic force microscope .

用光电子谱（XPS与UPS）和俄歇直读谱峰形分析研究了Si（111）早期氧化和Si-O成键过程。

The initial oxidation and Si-O bonding process on Si ( 111 ) surface are investigated by photoemission spectra ( XPSand UPS ) and AES lineshape analysis .

利用高强度的同步辐射光及光电离质谱和阈值光电子谱，研究了O2分子的真空紫外光电离，获得了许多Rydberg态的信息。

Photoionization of oxygen is performed by using a time-of-flight mass spectrometer and a threshold photoelectron analyzer with synchrotron radiation vacuum ultraviolet photons .

对辐照前后的样品进行俄歇电子能谱（AES）、扫描电镜（SEM），X射线光电子谱（XPS）和X射线衍射谱（XDS）分析。

Samples were analysed with AES ( auger electron spectroscopy ) , SEM ( scanning electron microscopy ), XPS ( X-ray photoelectron spectroscopy ) and XDS ( X-ray diffraction spectroscopy ) .

利用X射线微区衍射，X射线光电子谱（XPS）及激光拉曼光谱等分析，对高温高压下以金刚石微粉为原料的多晶金刚石烧结过程中，金刚石晶粒表面石墨化现象进行了考察。

The surface graphitization of diamond grains , which is induced in the process sintering polycrystalline diamond under high pressure , is studied . The results of analysis by micro-area X-ray diffraction , XPS and laser Raman spectrum etc.

利用X射线光电子谱（XPS）初步探讨了氮化条件对热氮化SiOxNy薄膜中N含量的影响，并分析了膜层中N与SiO2的键合方式。

The dependence of nitrogen content in SiO_xN_y films on nitridation conditions was investigated by X-ray spectrograph ( XPS ) . The bonding mode of N with SiO_2 in the films was also analyzed .

n-GaAs（100）表面及Na/n-GaAs（100）界面的光电子谱研究

Study of the n-gaas ( 100 ) surface and na / n-gaas ( 100 ) interface by photoemission

本文采用X射线光电子谱仪对阳极氧化法制备的氧化铝薄膜（厚度60nm）作了模拟研究。

In this work , the chemical states of the aluminum oxide prepared by anodizing process with thickness of 60 nm has been investigated with X ray photoelectron spectroscopy ( XPS ) .

利用光致发光谱、X射线光电子谱和俄歇电子谱等技术研究了（NH4）2Sx和P2S5/（NH4）2S5化学钝化GaAs（100）表面。

Using photoluminescence ( PL ), X-ray photoelectron spectroscopy ( XPS ) and Auger electron spectroscopy , we have analysed GaAs ( 100 ) sarfaces passivated with ( NH4 ) 2Sx and P2S5 / ( NH4 ) 2Sx .

本文通过扫描电镜、X射线衍射分析、X射线光电子谱（XPS）及断续切削实验，研究了硬质合金基体含Co量对金刚石薄膜成核、生长及附着强度的影响。

This paper studies the influences of Co content of carbide substrate on the forming nucleation , the growth and adhesive strength of diamond film by scanning electron microscopy , X-ray diffraction analysis , X-ray photo electron spectrum ( XPS ) and interrupted cutting experiment .

用35MeVu的Ar离子室温下辐照多层堆叠的半晶质的聚酯（PET）膜，采用X射线衍射技术和X射线光电子谱仪分析研究了辐照引起的表面结构和组分的变化。

Semicrystalline polyethylene terephthalate ( PET ) film stacks were irradiated at room temperature with 35MeV / u Ar ions . Ion beam induced structural and compositional modifications were studied by means of X-ray diffractometer ( XRD ) and X-ray photoelectron spectroscopy ( XPS ) techniques .

Au/TiO2（110）模型体系的光电子谱研究

Photoelectron Spectroscopy Study of Au / TiO_2 ( 110 ) Model System

t′次近邻跃迁对角分析光电子谱的影响

Effect of next nearest neighbor hopping on the angle-resolved photoemission

光电子谱与新材料的电子结构

Photoemission spectroscopy and the electronic structure of new materials

量子阱态光电子谱研究的理论模型

Theory models for quantum well states in photoemission spectroscopy