光刻

X射线光刻机中应用的精密定位工作台

Precision Location Platform Used in X-ray Photoetching Machine

光刻技术在PVDF压电薄膜电极制作中的应用

Application of photoetching technology on the fabrication electrodes made PVDF piezoelectric-film

用光刻及离子束蚀刻技术制作DNA芯片模版

DNA microarray plate in quartz glass substrate fabricated by ion beam etching

同步辐射X射线光刻掩模镀金工艺的研究

Research on Process of Mask Au-Plating in Synchrotron Radiation X-Ray Lithography

同步辐射X射线光刻中热辐射引起掩模畸变的研究

Study of Mask Distortion Caused by Thermo-Radiation in Synchrotron Radiation X-Ray Lithography

X射线镂空硅掩模在同步辐射X射线深层光刻中的应用

Application of X-ray stencil silicon mask in synchrotron radiation X-ray deep lithography

亚微米i线和g线投影光刻物镜研制

Development of submicron i-line and g-line projection lithography lens

使用平行束软X光透镜的深亚微米X射线光刻

A deep sub-micron X-ray lithography by using a soft parallel beam X-ray lens

软X射线投影光刻原理装置的设计

Development of elementary arrangement for soft X-ray projection lithography

脉冲软X射线源及光刻的初步研究

Pulsed soft X-ray source and preliminary study of lithography

X射线光刻机的开发研制

Research on the exploit of the X-ray photo-etching machine

DSP实现双面光刻底面对准系统中的图像采集与处理

Using DSP to achieve image acquisition and processing in the bottom side alignment system

~（52）Cr原子光刻制作纳米结构研究

Research on nanostructures fabricated by atom lithography with ~ ( 52 ) Cr

本文报告亚微米光刻5倍g线与i线投影光刻物镜的光学制造技术。

Optical manufacture technology for sub micro photolithographic lenses of g line and I line are reported .

紫外厚胶光刻技术在3-DMEMS电感中的应用

UV Lithography of SU-8 Photoresist and Its Application in 3-D MEMS Inductors

软X射线投影光刻技术

Soft X-ray Projection Lithography Technology

化学放大胶（ChemicallyAmplifiedResists，简称CARs）是下一代光刻技术中极具发展潜力的一种光学记录介质。

Chemically amplified resists ( CARs ) are the most promising optical recording materials for the next generation lithography .

在Si3N4膜上利用光刻和沉积等工艺手段，可以制作出铂电阻温度传感器，用于控制反应室温度。

The platinum temperature sensor is deposited on the Si_3N_4 film .

软X射线投影光刻能够制作出特征线宽小于0.1μm的线条。

Feature size of less than 0 . 1 can be produced using soft X-ray projection lithography ( SXPL ) .

采用移相掩模技术实现≤0.2μmi线光刻

0.2 μ m or Less i-Line Lithography by Phase-Shifting-Mask Technology

开发了理论模型以验证有限元方法用于X射线光刻掩模刻蚀过程数值仿真的正确性。

An analytical model is developed to verify the numerical simulation for X-ray lithography mask etching process using finite element ( FE ) .

本文介绍利用北京正负电子对撞机同步辐射软X射线光刻装置进行亚微米X射线光刻技术和深结构光刻的实验研究。

Experimental investigations on soft x ^ ray lithography technology using synchrotron radiation x-ray lithography apparatus of BEPC is presented in this paper .

ArF准分子激光光刻的研究现状

Research status of deep ultraviolet lithography with 193 nm excimer laser

用一次成型法制作了以聚酰亚胺为衬基、以Au为吸收体的X射线光刻掩膜。

The X ray lithography mask using polyamide as substrate and using Au as a absorber was fabricated by one step forming .

用于MEMS结构的光刻胶牺牲层接触平坦化技术凹面光栅型解复用器的通带平坦化设计

Contact planarization of sacrificial photoresist for MEMS application Design of the concave grating based demultiplexer with a flattened spectral response

GFP自动调焦光栅动态光刻头系统

GFP Automatic Focusing Grating Dynamic Photolithographing Head System

本文介绍一种使用空间滤波的实时单一镜头白光信息处理系统来检查IC光刻掩模缺陷的方法。

A real-time one-lens white light information processing system is described in which spatial filtering is used to spot defects on IC photomasks .

角度定量化估算软光刻PDMS印章的平面变形扭曲

Angular Quantification for Evaluating Planar Distortions of PDMS Stamps in Soft Lithography

ITO玻璃光刻工艺的研究

Photoetching Technology of ITO-coated Glass

利用MEMS（微机电系统）标准光刻、湿法腐蚀以及低温键合技术制作了微流控分析芯片。

The microfluidic chips were fabricated with standard photolithography , wet etching and low-temperature bonding techniques of MEMS ( Micro-electro-mechanical system ) .