金属靶材

长脉冲高能激光对金属靶材烧蚀实验研究

Research on Interaction of Delin with Ultra-short Pulse Laser in Laser Plasma Propulsion Ablation of metal target materials by long-pulse high energy laser

注：可按客户要求加工各种形状和尺寸的金属靶材及蒸发材料。放射治疗中呼吸运动对不同形状和大小靶区剂量分布的影响

Sputter targets and evaporation materials available upon request . Effect of Respiration on the Radiation Dose Distribution within Different Shape and Size Targets in Radiotherapy

现阶段对于激光烧蚀金属靶材的等离子体特性的研究较多，对于激光烧蚀半导体材料的研究相对较少。

At this stage for laser ablation of metal plasma characteristics of target material research is more . For the laser ablation of semiconductor materials research is relatively small .

结果表明，采用金属靶材进行射频反应溅射时，由于靶材与反应气体的反应，会出现两种溅射模式，即金属态溅射和非金属态溅射，非金属态溅射模式的沉积速率很低。

The results showed that there existed two modes of sputtering during RF reactive sputtering , i.e. , metal sputtering mode and nonmetal sputtering mode caused by the reaction between the target and reactive gas . The deposition rate was very low in the nonmetal sputtering mode .

利用Mermin型介电函数，我们将研究范围拓展到金属氧化物靶材和低速入射领域。

With this Mermin-type dielectric function , our research object can be enlarged to the cases for metal oxides or with small incident velocity .

纳米金属铜靶材的微结构与性能

Microstructure and properties of nanocrystalline copper target material prepared by flow-levitation-molding method

对于二元的金属复合靶材，足够的激光能量使得两种金属发生共同熔化和气化，形成混合蒸气，在降温过程中发生变化，得到新奇的纳米复合结构。

As for a binary metal composite target being ablated by laser with enough energy , the two constituent metals will be melted or vaporized to form a mixed vapor . And various nanocomposites with novel structures can be got during the cooling process .

以金属钛为靶材，采用射频磁控溅射方法制备纳米晶粒TiO2薄膜。

Nano-grain TiO_2 thin films are fabricated by magnetron sputtering process from a pure 99.99 % Ti disk .

由于集成电路、光碟及平面显示器等产业规模越来越大，这些高技术产业对各种超高纯金属及合金溅射靶材的需求量愈来愈多。

With the development of VLSI , CD and flat panel display ( FPD ), the demands of sputtering target materials with super high purity are greatly increased in IT .