蚀刻液

  • 网络etchant;ETCHING LIQUID
蚀刻液蚀刻液
  1. 微电子封装中FeCl3蚀刻液沉淀失效及再恢复

    The Research on Deposition Failure and Regeneration of FeCl_3 Etchant in Microelectronics Packaging

  2. 以(NH4)2S2O8为主蚀刻剂的印制板蚀刻液浅谈

    Talking about PCB Etching Solution with ( NH_4 ) _2S_2O_8 as Major Etchant

  3. 采用酸碱两种不同的化学蚀刻液对单晶硅表面进行蚀刻,通过扫描电镜(SEM)对其形貌进行了表征,考察了蚀刻液浓度、蚀刻时间及温度对表面形貌的影响。

    Acid-etching and alkali-etching methods were used to etch on single-crystalline silicon slice and the influence of temperature , time and solution concentration on the surface morphology was explored .

  4. 从电路板蚀刻液回收硫酸铜及制作再生蚀刻液进行了工艺探索,得出中和法可从蚀刻液中脱除约90%的铜,沉淀氢氧化铜的最佳pH值为56~60。

    The recovery of copper sulfate and making a regenerated etching solution from spent etching solution were studied . About 90 % copper can be removed from the spent etching solution by neutralization .

  5. FeCl3蚀刻液的再生研究

    A Study of the Regeneration of FeCl_3 Etching Solution

  6. 中国PCB工业通过PCB生产废水处理回用、PCB铜蚀刻液零排放和废气处理后排放等措施,可使我国PCB工业走上清洁生产与可持续发展的道路。

    As long as the industry assures the treatment and recycling of waste water , elimination of the copper etching solution waste in drainage and proper treatment of exhausting emission , Chinese PCB industry will stride the road of clean production and sustained development .

  7. 从废蚀刻液中回收资源的应用研究

    Study on the recovery of resource from spent etching solution

  8. 酸性氯化铜蚀刻液中铜的回收研究

    Recovery of copper from acidic copper chloride etching solution

  9. 研究了沉淀母液中残余铜的除去方法,使之再生,可回用于碱性蚀刻液的生产。

    Researches on the removal methods of remaining copper in the mother liquor are conducted , making it rise again and utilizing it .

  10. 介绍了新型离心萃取机的工作原理、特点及其在碱性蚀刻液再生循环中的应用状况及前景。

    The working principle , characteristics and application status and trend of a new type of centrifugal extractor in alkaline etching solution recycling were introduced .

  11. 运用络合平衡和沉淀平衡的理论,对酸性氯化铜蚀刻液的蚀刻过程进行研究,提出以铜废料作还原剂,回收蚀刻液中铜。

    Based on application of theories of complexing and precipitation equilibriums and study of etching process using acidic copper chloride etching soln. , a new method of recovering Cu in etching soln.

  12. 论文分别就蚀刻液中各成分的作用,硝酸蚀刻液能提高蚀刻因子的原因,废液废气的回收系统进行了研究。

    The roles of each component in solution , the reasons that the nitric acid etching solution can improve the etching factor and waste gas and solution recovery system in exhausted solution were described .

  13. 将电路板厂废弃的蚀刻液,经氢氧化铜沉淀法回收大部分铜后,再采用水合肼还原,进一步除铜。

    E waste etching liquor discharged by a circuit plate factory was treated first by precipitation to recover most of copper in form of copper hydroxide , and then treated by adding hydrazine hydrate to remove further copper .

  14. 以氯化铜蚀刻液废液、粗铜粉等为原料,在常温下反应制备氯化亚铜,工艺简单,操作简便,产品质量好,具有显著的经济效益和环境效益。

    The preparation of cuprous chloride from etching waste liquor of cupric chloride and crude copper powder was studied . The result showed that this method had many advantages , including simple process , easy operation and good quality of product , therefore it had remarkable economic and environmental benefits .

  15. 报道了聚乙烯对苯二酸酯(简称PETP)固体核径迹探测器时裂变碎片记录性能的实验研究.在改变温度、蚀刻时间和蚀刻液浓度等条件下测量了裂变碎片径迹平均直径的变化。

    The characteristics of polyethyleneterephthalate ( PETP ) solid state nuclear track detector on registering fission fragment tracks are studied . The variations of average diameter of fission fragment tracks with etching temperature , etching time and etchant concentration were measured .

  16. 阐述了在微带精密蚀刻过程中影响蚀刻速率变化的诸多因素,探讨了酸性氯化铜蚀刻液工艺控制应该注意的问题和解决办法。

    The paper introduces many influencing factors such as Cl ~ - , Cu ~ ( 1 + ), Cu ~ ( 2 + ) concentration of microstrip fine etching process and discusses the problems and solutions that should be regarded during controlling acidic copper chloride corrosion solution .