磁控溅射镀膜

磁控溅射镀膜是工业镀膜生产中最主要的技术之一，尤其适合于大面积镀膜生产。

Magnetron Sputtering has been developed as one of the most important technologies in industrial coating , especially for large area deposition .

基于工控机和PLC的真空磁控溅射镀膜设备控制系统设计

Design of the Control System of Vacuum Magnetron Sputtering & Coating Equipment Based on Industrial Computer and PLC

专家PID温度控制在高真空磁控溅射镀膜机中的应用研究

Study On Expert PID Temperature Control in High Vacuum Magnetron Sputtering Coating Machine

介绍了基于FPGA的太阳能真空集热管磁控溅射镀膜机控制系统的整体设计和工程实现过程。

This paper introduces an integrated design and implementation of the SCS control system based on FPGA .

介绍基于FPGA的太阳能真空集热管磁控溅射镀膜机参数设定和调用模块的设计过程。

This paper introduces the design course of the parameter setting and transferring module of the SCS based on FPGA .

通过蒸发和磁控溅射镀膜的方法，交替沉积C60和金属Pd膜，制备了不同周期和厚度比的C60／Pd多层膜。

C 60 / Pd multilayers with various periods were prepared in vacuum by evaporating and sputtering alternately .

真空磁控溅射镀膜生产线作为目前主流的Low-E玻璃生产设备，在国内拥有广阔的应用和发展空间。

Magnetron sputtering vacuum coating production line as the current mainstream Low-E glass production facilities , has wider application and development in China .

根据电磁场理论，推导出求解带电线圈所产生的磁场的计算模型，利用基于有限元法的ANSYS软件对非平衡磁控溅射镀膜机中线圈所产生的磁场分布进行了数值模拟。

Based on the theory of electromagnetic-field , the calculation model of magnetic-field generated by live coil had been deduced and with the ANSYS based on finite element method , the magnetic-field distribution caused by the coil in non-balance magnetron sputtering coating equipment was simulated .

活性涂层钎料是运用真空磁控溅射镀膜技术，在一定的溅射电压、溅射电流和溅射时间条件下，在Ag-Cu钎料箔片表面溅射活性元素Ti。

Using technology of magnetron sputtering in vacuum , we prepared the active coated brazing filler metal : Ti was sputtered onto the Ag-Cu alloy foil under proper sputtering voltage , sputtering current and sputtering time .

采用多弧-磁控溅射镀膜机在不锈钢2Cr13衬底上沉积CNx/TiN多层复合涂层。

The CN_x / TiN multilayer composite coatings were deposited onto stainless steel substrates by combination of DC reaction magnetron sputtering deposition with multi-arc plating .

利用微颗粒磁控溅射镀膜设备，在直径为1~3mm的发泡聚苯乙烯（EPS）颗粒和轻质擦镜纸表面镀金属铜、镍和银薄膜。把镀膜样品进行3mm电磁波的静态和动态衰减试验研究。

Cu , Ni and Ag films were coated on the surface of many light materials ( expanded polystyrene particles , cenosphere and lens papers ) using magnetron sputtering equipment The static and dynamic attenuation capability in 3 mm wave band of different metal coated samples were studied .

采用SP0806AS中频磁控溅射镀膜机，在硅（100）和高速钢基体上，采用双石墨靶在不同功率下沉积了类金刚石薄膜。

Diamond-like carbon ( DLC ) thin films were deposited onto Si ( 100 ) and high speed steel substrates by mid-frequency magnetron sputtering system ( SP0806AS , Beijing Power tech Co.

KZC&磁控溅射镀膜机电源的研究

Study on the Power Supply of Magnetron Sputtering Coater - KZC

直流磁控溅射镀膜在玻璃涂层技术中的应用

Application of DC Magnetron Sputtering Coating in the Glass Coating Technique

一种磁控溅射镀膜电源的设计方法

A Design of Electric Power Supply for Magnetic Control Sputter Coating

蒸发镀膜机改制平面磁控溅射镀膜机的研制

The Fabrication of Plane Magnetic Control Machine from Evaporation Coating Machine

三柱靶磁控溅射镀膜机在工艺品装饰镀中的应用

Application of magnetron sputtering plant with three cylindrical targets to decoration coating

双室旋转磁控溅射镀膜机的研制

Study on the Rotary Magnetron Sputtering Coater of Double Chambers

海绵卷绕真空磁控溅射镀膜过程中的传动控制

Transfer motion control of sponge coil during vacuum magnetron sputtering film coating

磁控溅射镀膜机真空室改进设计

Ameliorating the design of the chamber of magnetron sputtering

磁控溅射镀膜用灭弧电路

The electric circuit of arc avoidance magnetron sputtering coating

研究了磁控溅射镀膜的原理和工艺流程；

Study the flow of RF magnetron sputter .

该电源为磁控溅射镀膜设备实现自动控制提供了方便。

The power supply will be convenient for controlling the magnetron sputtering coater automatically .

泡沫塑料表面的磁控溅射镀膜技术研究

Study on Magnetic-control Sputtering on Foam Plastic Surface

沉积速率是磁控溅射镀膜技术中的一项重要指标，它由许多因素决定。

Deposition rate is an important parameter in magnetron sputtering and influenced by many factors .

提高太阳能集热管磁控溅射镀膜沉积速率的研究

Deposition Rate Enhancement of Magnetron-Sputtered Al-N / Al Films Used in Solar Thermal Collector Tube

磁控溅射镀膜中工作气压对沉积速率的影响

Influence of the working gas pressure on the deposition rate in magnetron sputtering for thin coating

超高真空射频磁控溅射镀膜机（双室三靶）及其应用

Ultra-high Vacuum RF Magnetic Sputtering Plant ( Double Chambers and Three Targets ) and its Applications

它可广泛应用于磁控溅射镀膜技术领域。

The utility model can be widely applied to the technical field of magnetic control spluttering coating .

磁控溅射镀膜机以其高速、低温等特点，广泛应用于工业镀膜中。

Magnetron Sputtering Coating Machine is widely used in industrial plating for its high-speed , low temperature and other characteristics .