研磨液

  • 网络slurry;CMP Slurry;CMP;abrasive slurry
研磨液研磨液
  1. 无菌条件下采集产蛋下降病鸭卵巢、输卵管等组织制成研磨液,过滤除菌。

    Collected ovaries and fallopian tubes of low-laying-rate ducks under sterile conditions , made then into slurry , filter sterilization .

  2. 分析讨论了工况参数对最小油膜厚度的影响,表明最小油膜厚度随着走丝速度及研磨液粘度的增加而增加,随着锯丝转角的增加而减小。

    The effects of machining parameters were discussed , result shows that the minimum film thickness increases with the increase of wire speed and slurry viscosity , while decreases with the increase of wire bow .

  3. 实验采用含多种添加剂的纳米二氧化硅(SiO2)胶体作为研磨液在双面抛光机上对镍磷敷镀铝镁合金基片进行精抛光。

    The experiment adopt a slurry of nano-SiO_2 colloid containing a variety of additives to polish the Mg-Al disk which two surfaces plated by a coat of Ni-P on two-side polishing machine .

  4. 强烈的机械振动研磨液相合成文石和洞穴文石后,DSC实验表明:随着时间的延长,文石→方解石的相变具有一定的规律性。

    As ground time prolongs , synthetic aragonite in liquid and cavernous aragonite monitored by DSC show some regularity in phase transformation from PV nacreous layer to calcite under intensive vibrating mill . At the beginning , it is observed that the phase transformation is endothermic ;

  5. 介绍了化学研磨液的配方、性能及使用方法。

    Formula , properties and usage of the chemical rubbing solution were introduced .

  6. 硅单晶片研磨液的研究

    Study on Grinding Fluid for Silicon Wafer

  7. 大蒜研磨液可以作为植物性农药应用在蔬菜等农作物的生产上。

    The garlic grinding solution could be applied as botanical pesticide in the production of crops such as vegetable .

  8. 结果表明,接种实验感染蚊虫研磨液和来亨鸡血液样本的C6/36细胞出现细胞融合、空泡形成的病变效应;

    The cell pathological effects such as cell fusion and cavitation were observed in C6 / 36 inoculated experimentally infected samples .

  9. 超声研齿的材料去除以塑性流动去除为主,机理可归结为磨粒锤击微切削、弹跳冲击与研磨液空化效应。

    The material removal during the course of ultrasonically lapping the gears is dominated by plastic flow removal , and its mechanism is abrasives that hammer micro-cutting , bouncing impact and slurry cavitation effects .

  10. 在CMP技术中纳米研磨粒子在液相介质中的充分分散是保证抛光质量的前提,本文研究了纳米CeO2在不同条件下水相体系中表面电性及分散性。

    In CMP technology , abrasive particles which disperse fully in the liquid is the premise to ensure the quality of CMP .

  11. 硅片研磨和研磨液作用的分析

    Silicon Polishing and the Analysis of Slurry Effect

  12. 研究确定了较为合理的研磨工艺及加工参数:(1)磨液:水基研磨液;

    The reasonable lapping process and parameters can be fixed as follows : ( 1 ) The lapping fluid can be chosen as water-based fluid ;

  13. 通过实验研究了光纤连接器端面研磨时,在研磨界面上引入超声波的情况下研磨压力和研磨液对材料去除率和表面粗糙度及连接器性能的影响规律。

    Under the condition of introducing ultrasonic , this paper analyzed the influences of different grinding forces and coolants on the removal of the material , surface roughness and the performance in grinding fiber optic connectors .