氧化铝薄膜

  • 网络Alumina film;aluminum oxide film
氧化铝薄膜氧化铝薄膜
  1. 作为一种新型功能薄膜材料的氧化铝薄膜,由于具有透光率高、折射率大、绝缘性好、抗辐射能力强、耐蚀性强、硬度高等特点,有希望成为LED器件的新的钝化层材料。

    As a new type of functional thin film material , aluminum oxide film promises well as new type surface passivation of LED devices due to its high transmittance , large refractive index , good insulation , strong anti-radiation , excellent corrosion-resistance and high hardness an so on .

  2. 基于ANSYS的硬质氧化铝薄膜/铝合金基体系统热屈曲变形有限元分析

    Finite Element Analysis of Thermal flection Distortion in Hard Alumina Film / Al-allay Substrate System by ANSYS

  3. 对近十几年来Al2O3薄膜在发光方面的研究进展分4个方面进行了介绍:(1)多孔阳极氧化铝薄膜基质的光致发光(PL)及其发光机理研究;

    In this paper , the research developments on light emission properties of alumina films are introduced in four parts .

  4. 本文采用X射线光电子谱仪对阳极氧化法制备的氧化铝薄膜(厚度60nm)作了模拟研究。

    In this work , the chemical states of the aluminum oxide prepared by anodizing process with thickness of 60 nm has been investigated with X ray photoelectron spectroscopy ( XPS ) .

  5. 通过XRD,DSC-TGA以及椭圆偏振测厚仪等测量手段研究了勃姆石溶胶的制备条件,氧化铝薄膜的光学参数以及勃姆石凝胶在热处理过程中的物理变化。

    The influences of preparing conditions on sol stability , refractive index and thickness of thin film , gel physical changes during heat treated were investigated by using elliptic polariscope , XRD , DSC-TGA .

  6. 在硅单晶(100)衬底上用热氧化法氧化一层SiO2做缓冲层,在高纯铝靶上镶嵌金属Yb,Er,然后用中频磁控溅射法制备了镱铒共掺杂氧化铝薄膜。

    SiO_2 is formed on the monocrystalline silicon ( 100 ) substrate by means of high temperatare oxidation , then Yb and Er are embeded in highly pure aluminum , and Yb , Er-co-doped Al_2O_3 film is produced with middle frequeney sputter technique .

  7. 多孔阳极氧化铝薄膜光学常数的确定

    Determination of the optical constants of porous anodic aluminum oxide films

  8. 多孔纳米氧化铝薄膜上荧光分子光谱特性研究

    Photoluminescence Characteristics of Several Fluorescent Molecules on Nanometer Porous Alumina Film

  9. 对硫磷在纳米氧化铝薄膜修饰电极上的电化学行为及其测定

    Electrochemical Behaviors and Analysis of Parathion at Nano-alumina Film Modified Electrode

  10. 脉冲溅射技术在氧化铝薄膜沉积中的应用

    Application of Pulsed Sputtering Technology in Aluminum Oxide Films Deposition

  11. 多孔氧化铝薄膜的纳米结构和光谱特性研究

    Study of Nanostructures and Reflective Spectra of Porous Alumina Films

  12. 草酸电解液中制备的多孔阳极氧化铝薄膜光致发光特性

    The photoluminescence properties of AAO membrane prepared in oxalic acid

  13. 阳极氧化铝薄膜厚度测试方法的研究

    Studies on Testing Measures of the Thickness on Anodized Alumina Thin Film

  14. 氧化铝薄膜表面的钼基模型催化剂的研究

    Studies of Molybdenum - Based Model Catalysts Supported on Alumina Thin Films

  15. 铝靶脉冲反应溅射沉积氧化铝薄膜中的迟滞回线的研究

    Hysteresis in Aluminum Oxides Films Growth with Pulsed Reactive Sputtering

  16. 氧化铝薄膜在发光方面的研究进展

    The Research on Light Emitting Properties of Alumina Films

  17. 纳米多孔氧化铝薄膜厚度的反射光谱测量方法研究

    A research of thickness measurement of nano-porous alumina films based on reflection spectrum

  18. 铝基材组织结构对氧化铝薄膜纳米孔阵列结构的影响

    Effect of composition on Al matrix Nano-pore Array Structure of anodic alumina films

  19. 多孔阳极氧化铝薄膜的应用进展

    Developments in Application of Porous Anodic Oxide Aluminum Film

  20. 多孔阳极氧化铝薄膜的结构和特性

    Structure and Property of Porous Anodic Alumina Membrane

  21. 反应溅射非晶态氧化铝薄膜

    Amorphous films of alumina prepared by reactive sputtering

  22. 硅基多孔氧化铝薄膜中的裂纹

    Cracks in the Silicon-based Anodic Porous Alumina Film

  23. 氧化铝薄膜式湿度仪的在线应用

    Online Application of Thin-film Aluminium Oxide Humidity Meter

  24. 沉积金属微粒的多孔氧化铝薄膜偏光性能探讨

    Study of optical polarization properties of the electrodepositing metal in porous anodic alumina films

  25. 溶胶-凝胶法制备氧化铝薄膜

    Method of Sol-gel Making Alumina Thin Films

  26. 阳极电压对多孔阳极氧化铝薄膜光学常数的影响

    The effect of anodizing voltage on optical constants of the porous anodic aluminum oxide films

  27. 多孔氧化铝薄膜横观各向同性弹性性质的研究

    Transversely Isotropic Elasticity of Porous Alumina Film

  28. 氧化铝薄膜纳米孔的孔径对电解电压的依赖性

    Dependence of the Pore Diameter of the Alumina Film with Nano-Pore Structure on Anodizing Voltage

  29. 采用无机盐和表面活性剂的新型溶胶-凝胶法制备氧化铝薄膜研究

    Preparation of alumina films by novel sol - gel process using inorganic salt and surfactant

  30. 同时进行基底温度对沉积氧化铝薄膜影响研究。

    In addition , the different substrate temperature was also concerned with the thin film growth .