电子回旋共振

可以确信，微波电子回旋共振等离子体的发展，将把离子源技术提高到一个新的水平。

It may be sure that the technology of ion source will be put to a new level by the development of the microwave ECR plasma .

微波电子回旋共振-化学气相沉积SiNx薄膜的光学性能研究

Optical Properties of SiN x Films Prepared by Microwave ECR CVD

栅网与偏压对CHF3电子回旋共振放电等离子体特性的影响

Effect of grid and bias on the characteristic of CHF_3 electron cyclotron resonance discharge plasma

电子回旋共振（ECR）等离子体的研究和应用

Electron cyclotron resonance ( ECR ) plasma investigation and Application

使用直流辉光和微波电子回旋共振两种等离子体辅助反应蒸发法在有机玻璃基底上制备了透明导电ITO膜。

ITO films have been deposited on the polyalkylmethacrylate substrates by DC arc plasma and ECR plasma aided reactive vaporization .

该系统采用微波通过同轴开口电介质空腔产生表面波，由NdFeB永磁磁钢形成高强磁场，通过共振磁场区域内的电子回旋共振效应产生大面积、均匀、高密度等离子体。

This system generates surface wave by means of the transmission of microwave in the open coaxial dielectric chamber and high magnitude magnetic field by Nd Fe B permanent magnets .

介绍了电子回旋共振（ECR）波的传播与吸收的数值求解方法。

The numerical method for resolving the wave propagation and absorption of the electron cyclotron resonance ( ECR ) is proposed .

本文介绍一种准确测定微波电子回旋共振（ECR）等离子体法制备的负载型氧化铝基镍催化剂负载量的方法。

This paper reports a method for determining nickel content in catalysts supported on aluminum oxide prepared by Microwave electron cyclotron resonance plasma .

HL-2A装置电子回旋共振加热波迹和功率沉积剖面的分析计算

Analysis and calculation of ray tracing and wave power deposit profiles of electron cyclotron resonance heating in the HL-2A tokamak

MM-2磁镜装置上的电子回旋共振加热实验

Electron cyclotron resonance heating experiments on magnetic mirror device mm 2

本文论证了电子回旋共振离子源（ECR）的工作原理及其特点，介绍了ECR的历史现状及其发展前景。

The principle , the features , the present conditions and prospects of the electron cyclotron resonance ( ECR ) ion source are described .

HL-2A装置电子回旋共振加热的天线系统主要由天线外壳、椭球镜、平面镜、转动机构和推动机构组成。

The ECRH antenna system on the HL-2A tokamak consists of shell , ellipsoidal mirror , plane mirror , rotating and pushing mechanism .

MM-2电子回旋共振加热实验的等离子体诊断

The plasma diagnostic of the ECRH on mm-2

HL－1托卡马克准光学电子回旋共振加热（ECRH）传输系统包括φ80波导、椭球反射镜、Ta－per、准光学弯头、托卡马克顶部注入和水平注入的微波通道、窗口等。

The quasi-optical ECRH transmission system of HL-1 tokamak includes φ 80 waveguide , ellipsoidal mirrors , taper , miter bend , vertical and horizontal microwave channel of the tokamak and ceramic window etc.

另外利用微波电子回旋共振等离子体法（ECR-MW）制备了镱铒共掺Al2O3薄膜，研究了其发光特性。

In addition , the Yb / Er co-doped Al_2O_3 films are prepared by microwave electron resonance plasma source ( ECR-MW ) and the PL of it are investigated .

建立了电子回旋共振（ECR）微波放电等离子体中离子输运过程的蒙特卡罗模型。

A one dimensional Monte Carlo model to simulate the transport of ions in the downstream region of electron cyclotron resonance ( ECR ) microwave plasmas is established .

报道了退火对电子回旋共振（ECR）辅助脉冲激光溅射方法制备的CNx薄膜样品光学性质的影响。

The effect of annealing on optical properties of the CN x films prepared by electron cyclotron resonance laser pulse assisted deposition was reported .

用苯作工作气体，在一个电子回旋共振（ECR）微波等离子体化学气相沉积系统中制备了含氢非晶碳膜（a-C：H）。

Hydrogenated amorphous carbon films ( a C : H ) were prepared in an electron cyclotron resonance plasma chemical vapor deposition system with benzene as a gas source .

电子回旋共振（ECR）等离子体由于具有工作气压低、等离子体密度高等优点，广泛应用于微电子刻蚀、薄膜材料沉积、材料加工、材料表面技术中。

Electron cyclotron resonance ( ECR ) plasma is widely used in microelectronics etching , materials processing and low temperature surface technology due to producing high-density plasma at lower pressure .

使用三氟甲烷和苯的混合气体，利用微波电子回旋共振等离子体增强化学气相沉积法制备了F/C比在011&062之间的αC∶F薄膜。

Amorphous fluorinated carbon (α C ∶ F ) films with F / C ratios between 0.11 and 0.62 are prepared by microwave electron cyclotron resonance plasma enhanced chemical vapor deposition using trifluoromethane ( CHF 3 ) and benzene ( C 6H 6 ) as source gases .

最近，应用微波电子回旋共振（ECR）等离子体溅射法沉积成高性能、高沉积速率和低基片温度的ZnO薄膜。

Recently , the microwave electron-cyclotron-resonance ( ECR ) plasma sputtering method has been employed to deposite ZnO thin film , which possesses some advantages of high performance , high depositing rate and low substrate temperature .

本文采用微波电子回旋共振化学气相沉积（MW-ECR-CVD）、射频耦合等离子体增强化学气相沉积（PECVD）及射频磁控溅射技术制备出完全取向生长的h-BN薄膜。

The oriented h-13N films were prepared by MW-ECR-CVD , RadioFrequency ( RF ) coupled PECVD and RF magnetron sputtering technologies .

利用电子回旋共振（ECR）微波等离子体辅助化学气相沉积技术、工作气氛为丙酮，在光学玻璃衬底上得到了光滑、致密、均匀的类金刚石薄膜。

Smoothing , dense and uniform nano crystalline diamond like carbon films are prepared by using electron cyclotron resonance ( ECR ) microwave acetone plasma chemical vapor deposition ( CVD ) method .

采用发射光谱（OES）技术系统地研究了电子回旋共振（ECR）微波等离子体基低能离子注入的等离子体特性。

The plasma characteristics of electron cyclotron resonance ( ECR ) microwave plasma_based low_energy ion implantation have been systematically studied by the optical emission spectroscopy ( OES ) technique .

在MM-2单磁镜装置上完成了电子回旋共振加热实验。

The electron cyclotron resonance heating experiments have been carried out on a simple magnetic mirror device ( MM-2 ) .

以SF6和SF6+Ar为刻蚀气体，采用电子回旋共振等离子体刻蚀工艺成功地对溶胶-凝胶工艺制备的锆钛酸铅铁电薄膜进行了有效的刻蚀去除。

Electron cyclotron resonance ( ECR ) etching of the lead zirconate titanate ( PZT ) ferroelectric thin films produced via sol-gel process has been performed in SF_6 and the SF_6 + Ar mixtures .

本文计算了在CT-6托卡马克上进行电子回旋共振加热实验时对应不同窗口、不同入射角的反常波轨迹。

The traces of the geometrical optics rays in the electron cyclotron frequency range in CT-6 have been obtained numerically .

用电子回旋共振等离子体增强的化学汽相沉积法，在单晶硅衬底上外延生长出了近于100μm2的单晶金刚石薄膜。

The monocrystalline diamond film about 100 μ m 2 in size has been carried out on Si substrate using an electron cyclotron resonance plasma enhanced chemical vapor deposition ( ECR CVD ) from the gas mixture of methane and hydrogen .

近年来，微波电子回旋共振（ECR）等离子体源越来越受到人们的关注，因为它能在低气压下产生高密度、高电离度、大体积均匀的等离子体。

Microwave electron cyclotron resonance ( ECR ) plasma has attracted a lot of attention as they can generate uniform plasma on large area with high degree of ionization and high density at low-operating pressure .

介绍了电子回旋共振加热（ECRH）系统，重点阐述了ECRH控制系统的结构组成和功能。

Electron-cyclotron-resonance heating ( ECRH ) system is introduced in this paper , especially the detail of the configuration and function of the control system is shown .