电子束蒸镀

电子束蒸镀制备的Mg-Zr-O复合介质保护膜结晶取向的研究

Preferred Crystal Orientation of Mg-Zr-O Composite Protective Layer Prepared by E-beam Evaporation

本文采用电子束蒸镀技术制备了Fe/Mo金属多层膜，利用TEM等手段研究了Fe与Mo层厚度对薄膜微结构应力的影响。

Fe / Mo multilayer films with varying Fe and Mo layer thickness were grown by electron beam evaporation .

用电子束蒸镀法制备S－H（LH）~p膜

S-H ( LH )￣ P Films Prepared by Electron-Beam Evaporative Deposition

快速热退火对电子束蒸镀的ITO膜光电特性影响采用溶液沉积及快速退火制备LiMn2O4薄膜的研究

The effect of RTA process on optical and electrical characters of E-beam evaporated ITO films Characterization of Solution-deposited LiMn_2O_4 Thin Films with Different Thickness Heat-treated by Rapid Thermal Annealing

本文采用真空电子束蒸镀技术在多谱段ZnS衬底上沉积了适合金刚石膜沉积的致密陶瓷过渡层，并利用微波等离子体CVD金刚石膜低温沉积技术进行了金刚石膜沉积研究。

In the present investigation , a ceramic interlayer suitable for diamond film deposition on multi-spectra ZnS substrate was prepared by electron beam evaporation . Diamond film deposition was conducted using microwave plasma CVD method and the low temperature deposition technique .

用电子束蒸镀CoCr制备垂直磁化膜时发现膜成分受众多因素影响，而成为CoCr膜实现垂直磁化的首要问题。

When using electron beam evaporates CoCr for preparing perpendicular magnetization films , it is found that the content of the film is influenced by many factors , and it is the most important problem for obtaining perpendicular magnetization for the CoCr films .

电子束蒸镀氧化铟透明导电薄膜

Transparent conductive in_2o_3 thin films by electron-beam evaporation

金刚石膜上电子束蒸镀Ti/Ni/Au多层膜

Ti / Ni / Au Multi-layer Growth on Surfaces of Chemical Vapor Deposited Diamond Films

本文在实验室原有电子束蒸镀设备的基础上，对其进行改造添加了射频线圈。

In this paper , a self-design coil was added to the original laboratory equipment .

超高真空电子束蒸镀Fe/Ru多层膜的结构和磁性

Structural and magnetic properties of Fe / Ru multilayers prepared by ultra-high vacuum electron-gun evaporation

并对电子束蒸镀用陶瓷靶材的制备做了初步的研究。

And a preliminary study was made for the ceramic target used by electron beam evaporation .

着重讨论了电子束蒸镀法与磁控溅射法的区别以及电子束蒸镀法的各种影响因素。

Focused on the distinguish of electron beam vapour deposition and magnetron sputtering , and the impact of various factors of electron beam vapour deposition .

为了克服电子束蒸镀技术存在的不足，提高蒸镀薄膜与基体的膜基结合力，从而扩大电子束蒸镀技术的应用范围。

In order to overcome the shortcomings of electron beam evaporation technique and improve the adhesion strength between the film and substrate , thereby increasing the electron beam evaporation technology applications .

在已开发的众多生长技术中，磁控溅射、金属有机物气相沉积、脉冲激光沉积、分子束外延、电子束反应蒸镀法是生长出高度c轴择优取向优质薄膜的主要方法。

ZnO films can be deposited by a variety of deposition techniques . Magnetron sputtering , metal-organic chemical vapor deposition , pulsed laser deposition , molecular beam epitaxy and reactive e-beam evaporation are main methods for the preparation of high-quality ZnO films with strong c-axis orientation .

本论文采用离子束辅助反应电子束真空蒸镀法，以Ti为膜料，纯度为99.99%的O2为反应气体，通过电子束蒸发，在玻璃衬底上反应生成TiO2薄膜。

In this article , TiO_2 films are prepared on glass substrate by ion beam assistant thermal oxidative electron beam evaporation . Ti ( AT2 ) is used as the evaporated material and high purity O_2 ( 99.99 % ) is used as the thermal oxidative gas .

真空电子束熔炼和蒸镀用的环状阴极电子枪的设计

Design of annular cathod gun used to electron beam melting and evaporation deposition