激光气相沉积

脉冲激光气相沉积技术现状与进展

Pulsed Laser Vapor Deposition Technology : Current Status and Research Progress

CO2激光化学气相沉积a-Si：H薄膜

CO_2 laser chemical vapor deposition of a-Si : H film

阐述了CO2激光化学气相沉积a-Si：H薄膜的机理。

The chemical vapor deposition mechanism of a-Si : H film is described .

激光物理气相沉积Al2O3薄膜

Laser Physical Vapour Deposition of Al_2O_3 Film

激光化学气相沉积TiC、TiN类陶瓷薄膜概况

The summarization of laser chemical vapor deposition of TiC , TiN Ceramic Film

本文报道了CO2激光化学气相沉积非晶硅的实验结果，硅薄膜的沉积速率与硅烷气压、基片温度和激光光强密切有关。

The experimental results on amorphous silicon growth by the process of CO2 laser chemical vapor deposition were reported . The deposition rate of silicon film strongly depends on silane pressure , substrate temperature and laser intensity .

用XeCl紫外与CO2红外复合激光化学气相沉积方法，在340℃硅衬底上沉积成高纯金刚石膜。

Diamond films have been synthesized by LCVD through combined effect of ultraviolet XeCl laser and infrared CO2 laser . The substrates are Si wafers . A special apparatus has been developed .

激光化学气相沉积非晶硅

Laser chemical vapor deposition of amorphous silicon

激光诱导化学气相沉积制备SiC、Si3N4超细粉末

SiC and Si_3N_4UItrafine Powder Made by Laser-Induced CVD Process

本研究自行设计制作了激光诱导化学气相沉积（LICVD）纳米硅粉制备设备，并对关键部件的设计思路进行了阐述。

In this study we designed and made the preparation equipment of nano-silicon powder by LICVD ( laser induced chemical vapor deposition ), and introduced the designing thought of key parts .

激光辅助化学气相沉积金刚石薄膜实验研究

Synthesis of Diamond Films by Laser assisted Chemical Vapour Deposition

通过激光诱导化学气相沉积来制造微碳柱的研究

Investigation on the Fabrication of Micro Carbon Pillar by Laser-induced Chemical Vapor Deposition

激光诱导化学气相沉积法制备纳米氮化硅及粉体光谱特性研究

Research on Preparation of Silicon Nitride Nano-powders with Laser Induced Chemical Vapor Deposition and Optical Characteristics of Powders

采用双光束激励的激光诱导化学气相沉积法是制备高纯度纳米氮化硅粉体的理想方法。

The laser induced chemical vapor deposition method with double beam optical stimulation is a preferable way to synthesize silicon nitride nano-powder of high purity .

本文论述了激光诱导化学气相沉积法制备纳米氮化硅的工作原理，提出了减少游离硅的措施；

In this article , the general principles of LICVD ( Laser Induced Chemical Vapor Deposition ) are investigated and measures to reduce dissociated Si are put forward .

对制备纳米材料的激光方法-激光诱导化学气相沉积法、激光高温烧灼法、激光分子束外延、激光固相蒸凝法等作了简要介绍。

The paper makes a brief review of nano-materials by laser induced chemical vapor deposition , laser ablation , Laser-MBE Method , laser heating gas-evaporation method .

介绍近年发展起来的激光诱导沉积技术，包括激光化学气相沉积、激光物理气相沉积、激光增强电镀和激光诱导化学镀等。

The recently developed laser induced deposition technologies were introduced , including laser chemical vapour deposition , laser physical vapour deposition , laser enhanced electroplating and laser induced electroless plating etc.

介绍了激光掩模投影直刻技术，聚焦激光束光栅扫描技术及激光辅助化学气相沉积等在微机械加工技术中的应用。

This paper introduces the application of laser ablation with mask exposure , laser writing with raster scanning and LCVD techniqe in three dimensional micromachining for MEMS .