反应溅射

直流反应溅射Al2O3膜工艺探讨及应用

DC Reactive Sputtering Process for Al_2O_3 Film Deposition and Its Applications

反应溅射制备非晶Al2O3薄膜的介电特性

Dielectric Characteristics of Amorphous Alumina Film Fabricated by Reactive Sputtering

反应溅射的PID神经网络控制仿真

Simulation of Proportion Integration Differentiation Neural Network Control of Reactive Sputtering

DC反应溅射时防止异常放电的电源（A~2K）

Abnormal Discharge Protection Power Supply in DC Reactive Sputtering . ( A ￣ 2K )

低真空射频反应溅射Al2O3薄膜

Al_2O_3 Thin Films Deposited with Reactive r-f Sputtering Technique in Low Vacuum

直流二极反应溅射沉积透明ZnO薄膜

Transparent Zinc Oxide Thin Films Prepared by DC Diode Reactive Sputtering

离子束反应溅射ZnO薄膜的晶体结构及光学、电学性质研究

Structures and Properties of ZnO Films Grown by Ion Beam Sputtering

用射频反应溅射法制备了含Ti量高低不同的两种FeTiN合金薄膜。

The Fe-Ti-N films of different Ti concentration have been prepared by reactive sputtering .

反应溅射制备TiN薄膜的靶中毒模型研究

Study on target poisoning model of tin film deposited by reaction sputtering

射频磁控反应溅射法制备Y2O3薄膜的工艺研究

Preparation Process of Y_2O_3 Thin Film Using RF Magnetron Reactive Sputtering

RF反应溅射法制备高度取向生长的透明多晶ZnO薄膜

Highly oriented and transparent polycrystalline ZnO films prepared by RF actively sputtering technique

沉积条件对RF反应溅射多晶ZnO薄膜结构的影响

Effect of deposition condition on structure of RF reactively sputtered polycrystalline ZnO films

反应溅射法制备掺硼的a&Si：H（B）薄膜的ESR研究

ESR Study of B-doped a.Si : H ( B ) Thin Films prepared by Reactive-Sputtering

直流反应溅射制备NiOx薄膜及其电致变色机理研究

Electrochromic Property and Mechanism of NiO_x Film Fabricated by DC Sputtering

超硬薄膜CNx直流磁控反应溅射法的制备及性能研究

Studies on Preparation and Properties of CN_x Films by DC Magnetron-reactive-sputtering Deposition

反应溅射Al2O3膜对TiAl抗高温氧化性能的影响

Effect of reactively-sputtered al_2o_3 films on oxidation resistance of TiAl

反应溅射Al2O3薄膜研究之进展

Research Progress in Reactively Sputtered Al_2O_3 Film

RF反应溅射法制备NiFe/Al2O3/Co磁性隧道结研究

Fabrication of NiFe / Al_2O_3 / Co magnetic tunneling junction by RF reactive sputtering

反应溅射TiO（2-x）Nx膜的可见光吸收性能

Absorption property in visible region of TiO_2-xN_x films prepared by reactive sputtering

用于LCD的氧化铝阻挡层的射频反应溅射沉积及其特性

Preparation and Properties of Al_2O_3 Barrier Layers for LCD by RF Reactive Sputtering

不同氧分压下直流反应溅射ZnO薄膜的结构和光学特性

Structure and Optical properties of ZnO Films DC Reactively Sputtered at Different Oxygen Partial Pressure

反应溅射（Al，Ti）（O，N）涂层的微结构与力学性能

Microstructure and mechanical properties of ( Al , Ti )( O , N ) coatings synthesized by reactive sputtering

氮气流量、基体温度对反应溅射（Ti，Al）N成膜影响

Effects of N_2 Flow Rate and Substrate Temperature on ( Ti , Al ) N Films Deposited by Reactive Sputtering

采用射频磁控反应溅射方法在SiO2衬底上制备了纳米ZnO镶嵌SiO2薄膜。

Nano-size ZnO embedded in SiO_2 layers were grown by radio-frequency magnetron sputtering .

用于太阳电池吸收层CuInS2薄膜的RF反应溅射制备及其表征

Preparation and characterization of the cuins_2 thin files deposited by RF reactive sputter for solar cell absorber

采用RF反应溅射法在普通玻璃衬底上制备了具有良好c轴取向性的透明多晶ZnO薄膜。

Highly oriented and transparent polycrystalline ZnO films have been prepared by RF actively sputtering technique on normal glass wafer .

反应溅射Nb2O5光波导及其应用

Reactive sputtered nb_2o_5 optical waveguide and Its Applications

通过射频反应溅射法在硅衬底上制备了具有c轴择优取向和小晶格失配的In掺杂ZnO薄膜。

Indium-doped zinc oxide films with c-axis preferred orientation and small lattice mismatch are deposited on silicon substrates by RF co-reactive sputtering .

磁控反应溅射TiO2薄膜的实验研究

Experimental investigation on TiO_2 thin films prepared via reactive magnetron sputtering

Mo电极上磁控反应溅射AlN薄膜

Study of AlN Thin Films Deposited on Mo Electrode by Reactive Magnetron Sputtering