刻蚀

采用深度刻蚀与XPS能谱研究缓蚀膜/镀铜层/铁基体界面成分

Study on the Compositions in the Interface of Corrosion Inhibition Membrane / Copper Plating Layer / Iron Substrate by Depth Etching and Photoelectron Spectroscopy

刻蚀深度随刻划次数的增加而增大。

The corrosion depth increases with the increasing number of scratching cycles .

ZnO/玻璃层状结构SAW器件的刻蚀工艺探索

Exploration of Etch Process for SAW Devices with ZnO / Glass Layered Structures

GaN的刻蚀、P型欧姆接触以及LED的研究

Research on Etching GaN 、 P-type Ohmic Contact and Fabrication of GaN LED

X射线光刻掩模背面刻蚀过程中的形变仿真

Simulation of X-ray Lithography Mask Distortion during Back-etching

基于刻蚀工艺的IC关键面积计算模型与实现方法

Computation Model and Realization Method of IC Critical Area Based on Etching Process

利用全息-离子束刻蚀方法研制出了聚酰亚胺薄膜为衬底的金软X射线透射光栅。

Soft X-ray gold transmission grating with polyimide membrance substrate is fabricated by holograph-ion beam etching technique .

PAN基炭纤维阳极电解表面刻蚀工艺研究

Study on anodic oxidation etching of PAN based carbon fiber

Fe刻蚀金刚石的研究

Study of diamond etching with Fe

用反应离子刻蚀技术制作Ge菲涅尔微透镜列阵

Make of ge fresnel microlens arrays using reaction ion etching technology

CPU干刻清洗工艺在金属刻蚀去胶腔上的评价及应用

The Evaluation and Application of CPU Dry Clean Process on Ash Chamber of Metal Etch

GaAs背面通孔刻蚀技术研究

A study on GaAs backside via hole etching technique

不同添加气体对SiC材料SF6干法刻蚀的影响

Effects of Different Additive Gases on Dry Etching of SiC in SF_6

空气氧化刻蚀提高PAN基炭纤维抗拉强度的研究

Study on improving the tensile strength of PAN-based carbon fiber by air oxidation etching method

激光刻蚀sol-GelTiO2薄膜的浸润性研究

Study on Wettability of Sol-gel TiO_2 Film Ablated by Laser

对Fe刻蚀金刚石过程中石墨析出的速率进行了定量的研究。

Quantitative analysis of the separating rate of graphite was made in the process of iron 's etching diamond .

InP材料UV激光直接刻蚀研究

Investigation of UV Laser Direct Etching on InP Material

发射光谱法研究CaO对等离子体刻蚀废气的吸收作用

The Absorption of CaO to Waste Gas from Plasma Etching by Emission Spectrometry

ICP刻蚀机反应腔室气流仿真研究

Gas Flow Simulation Research on Reaction Chamber of ICP Etcher

ICP刻蚀对InAsP/InP应变多量子阱的损伤

Investigation of ICP Etching Damage of InAsP / InP Strained Multiple Quantum Wells

论文第二部分建立了奇点分裂算法作为刻蚀剖面的模拟算法，采用Visualc++编程实现了干法刻蚀工艺的剖面形貌模拟。

In second part of this paper , Singular point Splitting Algorithm which can simulates the etch profile is set up by Visual C + + .

开发了理论模型以验证有限元方法用于X射线光刻掩模刻蚀过程数值仿真的正确性。

An analytical model is developed to verify the numerical simulation for X-ray lithography mask etching process using finite element ( FE ) .

激光刻蚀制备集成型a-Si太阳电池的一些问题

Some Problems in Fabricating Integrated a-Si Solar Cell with Laser Scriber

分散相形态纺程演变：经树脂包埋、冷冻切片、刻蚀后，采用SEM观察分散相形态。

After resin embedding , frozen ultrathin slicing , and etching , the morphology of dispersed phase was observed by SEM .

同时给出了用ICP刻蚀出的MEMS传感器Si基腔的表面形貌图和Cr电阻的显微镜照片。

The AFM morphology images of Si based cavity MEMS sensor and Cr resistance etched by ICP were given .

包括纳米压印、激光干涉光刻、x射线光刻、电子束光刻、聚焦离子束刻蚀等。

The novel methods include nano-imprint , laser interference lithography , x-ray lithography , electron beam lithography , focused ion beam and so on .

减小SiO2光波导表面粗糙度的ICP干法刻蚀工艺研究

Improvement of ICP etching process for reducing the surface roughness of SiO_2 optical waveguides

ICP刻蚀中等离子体分布的模拟

Simulation of Plasma Distributing in ICP Etching

HfO2在CHF3，Ar和H2的感应耦合等离子体中的刻蚀行为

Etching of HfO_2 with Inductively Coupled Plasma of CHF_3 , Ar , and H_2

PZT铁电薄膜的雾化湿法刻蚀技术研究

Research of Spray Etching of PZT Film