俄歇电子

利用俄歇电子能谱仪研究Al焊垫表面的F腐蚀

Study on Fluorine Induced Aluminum Bonding Pads Corrosions Using Auger Electron Spectroscopy

TINx薄膜的特性和俄歇电子能谱分析

Characteristics of TiN_x Film and Analysis by Auger Electron Spectroscopy

Au/a-Si：H界面X射线光电子能谱和俄歇电子能谱研究

XPS and AES study for au / a-si : h interface

用俄歇电子能谱研究薄膜Cu2S/CdS太阳能电池

A study of cu_2s / cds solar cell by AES

Pd/W/Si（111）双层膜界面X射线光电子能谱与俄歇电子能谱研究

XPS and AES study for pd / w / si ( lll ) bilayer interface

合成TiN膜的俄歇电子能谱研究

Study on the Composition TiN Film by AES

XPS光电子峰和俄歇电子峰峰位表

Tables of Peak Positions for XPS Photoelectron and Auger Electron Peaks

二次发射体MgO薄膜的俄歇电子能谱的研究

Study on secondary electron emitter MgO thin film with Auger electron spectroscopy

俄歇电子能谱（AES）及其在超导材料分析中的应用

Auger electron spectroscopy ( AES ) and it 's application in superconducting materials analysis

在Si（100）基底上制备了Ti/TiN和Ni/TiN两种多层膜以及TiN单层膜，利用X射线衍射，WYKO表面形貌仪，俄歇电子能谱等对薄膜进行了分析。

Ti / TiN and Ni / TiN multilayered films and TiN single film were prepared on Si ( 100 ) wafers .

对材料的特性进行了俄歇电子能谱、低角度X射线衍射、光荧光及拉曼光谱等分析测试。

Auger electron energy spectra , low angle X-ray diffraction , photo-luminescence and Raman spectra were measured to confirm the quality of the SLSs .

介绍了一台用于表面分析的俄歇电子能谱仪（AES）系统。

A system of Auger electron spectroscopy ( AES ) for surface analysis was presented .

通过X射线衍射（XRD）和俄歇电子能谱（AES）分析研究了薄膜的微结构；

Microstructures of thin films are characterized by X-ray Diffraction ( XRD ) and auger Electron spectroscopy ( AES ) .

AlxGa（1-x）As的俄歇电子谱定量分析

Quantitative Auger Electron Spectroscopy ( AES ) Analysis of Al_xGa_ ( 1-x ) As

利用X射线衍射（XRD）和俄歇电子衍射（AES）观察了表面膜的化学成分及结构。

The structure and chemical compositions of the surface oxide film were investigated by XRD and Auger electron spectrometry ( AES ) .

液相外延生长的AlxGa（1-x）As/GaAs异质结构的俄歇电子能谱

Auger Electron Spectra of Al_xGa_ ( 1-x ) As / GaAs Heterostructure Grown by LPE

利用俄歇电子能谱（AES）进行氧化膜元素深度剖析发现，在含0.3%铍的镁合金液表面生成的氧化膜可以分为3个亚层：最外层为氧化镁层；

AES depth profile analysis showed that the surface oxide film could be divided into three sub layers .

采用俄歇电子能谱（AES）和X射线光电子能谱（XPS）研究其协合润滑机理。

Auger electron spectroscopy ( AES ) and X ray photoelectron spectroscopy ( XPS ) are employed to study the synergistic mechanism .

利用俄歇电子能谱研究了Cr／SiO2薄膜在热处理过程中的界面扩散反应机理、界面反应动力学过程及界面反应产物。

The mechanism , kinetic and reaction species on the interface reduction of Cr / SiO2 film have been studied using AES .

其他原子电子壳层的电子将填补这些空穴，其原子电子位置将重排，并发射X射线和俄歇电子。

The vacancies in atomic shells give rise to rearrangements in the shells which are accompanied by the emission of X ray and the ejection of Auger electrons .

沿垂直膜面俄歇电子（AES）逐层分析证明，优化溅射工艺制备的薄膜化学成分分布均匀。

The results of AES analyses proved that the optimized composition is uniform along the cross-sections of the film .

利用在位俄歇电子能谱（AES）分析了薄膜表面的组分。

In-situ film composition analysis was carried out in the analysis chamber with Auger electron spectroscopy ( AES ) .

利用俄歇电子能谱、SEM及X射线衍射能谱进行了生长薄膜微结构分析。

The most suitable growth conditions are found through analysis of films ' crystallinity and chemical components measured by X-ray diffraction , SEM and Auger energy patterns .

用AES（俄歇电子谱）及Kelvin探头对Gap（111）表面吸氧进行了研究。

The investigation of oxygen adsorption on GaP ( 111 ) surface by AES and CPD-SPV measurements using Kelvin Probe is reported .

用磁控溅射方法完成软X射线多层膜制备，X射线衍射、卢瑟福背散射、俄歇电子谱和反射率的相对测试用来表征多层膜结构和特性，所得结果说明多层膜的结构完整，周期参数正确。

The characterization of multilayers by small angle X-ray diffraction , Auger electron spectroscopy , Rutherford back scattering spectroscopy and reflectivity illustrated the multilayers had good structures and smooth interlayers .

用针盘摩擦磨损实验机测定了注入样品的耐磨性能，用俄歇电子能谱仪（AES）测量注入样品成分深度分布，并检测了样品硬度。

The frictional properties of the implanted samples were assessed using a pin-on-disk tester and the elemental depth profiles were measured .

用俄歇电子谱（AES）分析了铀试样处理前后表层的成分变化。

The composition of surface layer of uranium and treated uranium have been analyzed respectively by Auger Electron Spectroscopy ( AES ) .

对抗菌膜进行了扫描电镜、X射线光电子谱和俄歇电子谱的研究与分析，发现抗菌膜中存在多种以银元素的化合物。

The chemical state of silver in the films was analyzed by X-ray photoelectron spectrum , and Auger electron spectrum was performed to determine the concentration of silver atoms in various films .

实验采用的是分子束技术，以及俄歇电子能谱（AES），四极柱质谱（QMS）和X射线光电子能谱（XPS）等表面分析技术。

The experimental works were carried by using the molecular beam technique and the surface analysis technique ( AES , QMS , XPS ) .

HL-1装置石墨孔栏杂质收集探针的俄歇电子能谱及孔栏表面分析

AES analysis of collector probe with graphite limiter and limiter surface analysis in the HL-1 TOKAMAK