介质膜

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  • dielectric film;dielectric layer;dielectric coating
介质膜介质膜
  1. 文中对此法作了分析并以多层介质膜和铝膜反射镜为例子进行了讨论。

    Taking multi-layer dielectric coating and Al coating as examples , the method is analysed and discussed .

  2. 本文从理论上分析了介质膜对半导体激光器外特性如阈值电流、外量子效率和最大输出功率等的影响。

    Some theoretical analyses and experimental studies on the effect of dielectric coating on semiconductor laser performances are presented .

  3. 在此基础上用正弦函数的高次幂作为光栅的槽形函数编写了介质膜光栅衍射效率计算程序,数值计算结果表明了C方法在计算介质膜光栅衍射效率的可行性。

    The feasibility of calculating the diffraction efficiency of dielectric reflection grating with C method are proved with computation results .

  4. 多层金属/介质膜系中Al层的作用分析

    Role of Al layer in metallic-dielectric multiplayer

  5. 非线性介质膜波导中高阶TE模的色散特性

    Dispersion properties of high-order TE modes in nonlinear dielectric film waveguides

  6. 运动电极直接发射光谱法&ZnS光学介质膜中Zn、S原子比的测定

    The Zn-to-S-atomic Ratio Measurement in the ZnS Optical Film Using Direct Emission Spectrum of a Movable Electrode

  7. 用于VLSI的新型介质膜界面陷阱的特征

    Features of interface trap of new dielectric film used for VLSI

  8. CdTe钝化介质膜的溅射沉积及其X射线光电子能谱研究

    The Sputtering Deposition and the X-ray Photoelectron Spectroscopy Study for the CdTe Thin Film

  9. ACPDP介质膜的实验研究

    Experimental Study of Dielectric Film for AC PDP

  10. Ta2O5介质膜性能对液体钽电容器性能的影响

    Influence of Capability of Ta_2O_5 Dielectric Film on Performance of Wet Tantalum Electrolytic Capacitor

  11. 具有优良绝缘性能的Ta2O5介质膜

    Ta_2O_5 Dielectric Films with Excellent Insulating Properties

  12. 基于AlxNy绝缘介质膜的新型窗口大功率半导体激光器

    High Power Semiconductor Lasers of New Window on Insulation Film of Al_xN_y

  13. 实验结果表明:SixOyNz是一种有希望的介质膜。

    The experimental results indicate that Si_xO_yN_z is a promising dielectric film .

  14. 介质膜波导中的非线性TEm模

    Nonlinear TE_m mode in dielectric film waveguides

  15. Si(Ge)/SiC/SiO2多层介质膜红外空芯传能光纤的研究

    The Studies of Si ( Ge ) / SiC / SiO_2 Infrared Transmitting Energy Hollow Fiber with Many Medium Film

  16. 关于NO氮化SiO2超薄栅介质膜的研究

    Study of Ultra Thin Gate Dielectrics Prepared by NO Nitridation of SiO 2

  17. 非对称型Kerr类介质膜漏波导中的非线性导波

    Nonlinear guided wave in asymmetric Kerr-type dielectric film leaky waveguide

  18. 介质膜性质及表面处理对GaNHEMT特性的影响

    Effect of Dielectric and Surface Treating on the Characteristic of GaN HEMT

  19. GeO2介质膜红外空芯传能光纤模式特性的实验研究

    Experimental Study on Mode Character in GeO_2 Dielectric Hollow Waveguides

  20. 对介质膜进行了透射光谱、扫描电子显微镜(SEM)、X-ray粉末衍射谱、X射线光电子能谱(XPS)等实验研究。

    The ZnS film is studied using scanning electron microscope ( SEM ), X-ray diffraction , X-ray photoelectron emission spectra ( XPS ) .

  21. 多层介质膜MIM薄膜二极管的I-V特性研究

    I-V Character of MIM Thin Film Diode with Multilayer Insulator Film

  22. Ta2O5介质膜和Ta2O5-SiO双层介质膜绝缘特性的实验研究

    Experimental Study of Insulating Properties of Ta_2O_5 Dielectric Films and Ta_2O_5-SiO Doubly Stacked Dielectric Films

  23. ZrO2介质膜的光热吸收研究

    Photothermal Absorption Research of ZrO_2 Dielectric Thin Film

  24. 利用扫描电子显微镜(SEM)分析了阳极氧化后及产品失效后阳极钽芯表面介质膜的微观结构,并对液钽电容器失效机理进行了探讨。

    The surface microstructure of anodic tantalum core was analyzed by scanning electron microscope ( SEM ), and then analyzed the failure mechanism of wet tantalum capacitor .

  25. 快速热氮化SiOxNy薄介质膜的电荷特性与光学性质

    Charge Characteristics and Optical Properties of Rapid Thermal Nitride SiO_xN_y Thin Dielectric Film

  26. PECVD法低温制备富氮的SiOxNy栅介质膜及其特性

    Nitrogen-rich sio_xn_y gate dielectric film preparation by Low Temperature PECVD method and its characteristics

  27. 本文研究了特定边界条件下非对称型Kerr类介质膜漏波导中TE0光波的传播特性。

    The propagation characteristics of TE_0 modes is studied in an asymmetric leaky waveguide of Kerr-type dielectric film under certain boundary condition .

  28. 设计的制作流程能够兼容SOI片和普通硅片,兼容介质膜和金属膜。

    In the thesis , the fabrication processes is compatible with SOI and ordinary silicon wafer , dielectric mirror and metal mirror .

  29. 本装置制作的薄膜膜厚均匀区宽、膜质好,不仅适用于ZnO薄膜的小批量生产,也可用于溅射沉积其它各种介质膜和金属膜。

    This kind of sputtering equipment is not only suitable for mass production of ZnO films , but also for the sputtering deposition of other dielectric or metal films .

  30. PECVD法低温形成纳米级薄介质膜击穿特性的实验研究

    Experimental study of breakdown characteristic of thin dielectric film in nanometre range formed by low temperature PECVD