高分辨电子显微术

Zr（Cr，V）2Laves相长周期堆垛结构的高分辨电子显微术观察

HREM observation on long-period stacking structure of zr ( cr , v ) _2 Laves phase

利用高分辨电子显微术，对高能冲击接触加载下高锰钢摩擦表面塑变诱导纳米晶生成机制进行了研究。

By means of HREM , a possible mechanism of strain-induced nanocrystalline in the worn surface of hadfield manganese steel under high impact energy was investigated ;

Al（20）Cu2Mn3相中孪晶的高分辨电子显微术研究

High resolution study of twins in al_ ( 20 ) cu_2mn_3 phase

用高分辨电子显微术直接鉴定ZnS多型体中堆垛序列和缺陷

The direct determination of stacking faults sequence in ZnS polytype by high resolution electron microscopy

Al-Cu-Mg合金中S′相生长微观机制的高分辨电子显微术研究

High-resolution electron microscopy on the microstructural growing mechanism of s ' phase in Al-Cu-Mg alloy

高分辨电子显微术（HREM）及电子衍射图（EDP）分析表明，在这种材料中存在三种相，分别用A、B、C来表示。

High resolution electron microscopy ( HKEM ) and electron diffraction pattern ( EDP ) indicated that there are three phases in the material which can be represented by Phase A , B and C , respectively .

采用高分辨电子显微术，获得了BeAl2O4∶Cr~（3+）晶体的晶格象，观察研究了晶体中的结构缺陷。

The structure defects in BeAl_2O_4 ∶ Cr ~ ( 3 + ) laser crystals were Investigated and the lattice images were obtained by high resolution electron microscopy .

Nd-Ba-Cu-O高温超导体的高分辨电子显微术研究

High resolution electron microscopy study on high t_c superconductor nd-ba-cu-o

用热化学气相合成法制备的超细SiC粉末的组织结构，保留了许多与形核生长过程直接有关的许多特点，为用高分辨电子显微术研究其形核生长过程提供了有利条件。

The structure of SiC ultrafine powder synthesised by the thermal chemical vapor-phase reaction method remains a lot of characteristics associated directly with the nucleation and crystal growth . It is favorable for the high resolution electron microscopy ( HREM ) study of the process of nucleation and crystal growth .

用电子衍射、能谱和高分辨电子显微术的进一步研究表明，电子辐射作用可使碲镉汞晶体析出CdTe；辐射还可使某些区域出现结构无序化。

A further study of EDAX , HREM and electron diffraction showed that the CdTe phase could be segregated from ( Hg . Od ) Te crystal by electron radiation , and structure disordering could occur in some areas due to the radiation .

材料表面的高分辨电子显微术

High resolution electron microscopy of surfaces in materials

利用X射线衍射（XRD）、高分辨透射电子显微术（HRTEM）和X射线能谱（EDS）研究了共溅射Cu-Ta薄膜中非晶相的形成。

Formation of amorphous phase in binary immiscible Cu-Ta thin films prepared by co-sputtering method has been investigated using X-ray diffraction ( XRD ), high-resolution transmission electron microscopy ( HRTEM ) and electron dispersive X-ray spectroscopy ( EDS ) .

电介质和庞磁电阻材料微结构的高分辨透射电子显微术研究

High Resolution Transmission Electron Microscopy Study of Microstructures of the Dielectric and Colossal Magneto-resistance Materials ; electronic microradiography