辉光

H2辉光放电清洗时轰击器壁的离子能量测量与分析

Measurement of the energy of ions bombarding the wall during glow discharge cleaning

D2及高浓度H2/CH4辉光放电

D_2 and high concentration h_2ch_4 glow discharges

常压辉光放电等离子体转化CH4制C2烃的研究

Glow Discharge Plasma Conversion of Methane to C_2 Hydrocarbons at Atmospheric Pressure

双层辉光离子渗Cr合金层组织和性能

Structure and property on chromium alloy layer by double glow discharge technology

大气压反常辉光放电下CO2重整CH4制合成气的实验研究

CO_2 Reforming of CH _4 by Atmospheric Pressure Abnormal Glow Plasma

石墨电极加弧辉光渗镀Ti抗蚀性能的研究

Study on Corrosion Resistance of Graphite Anode by Arc-added Glow Discharge Ion Titanizing

氮直流辉光放电活性粒子（N~+，N）的产生率

Creation rates of active species ( n ~ + , n ) in a nitrogen direct current glow discharge

本文简要叙述了HL－1M的DC辉光放电清洗技术和放电结果。

The paper gives a brief description of the DC glow discharge cleaning in the HL 1M tokamak .

等离子体辉光溅射反应复合渗镀合成TiN的研究

Growth of TiN by Plasma Glow Discharge Sputtering , Diffusion and Ion Surface Alloying

采用X射线衍射和辉光放电光谱分析了渗碳层的相组成及C元素分布；

The phase compositions and C distribution of the carburized layer were determined by means of X-ray diffraction and glow discharge spectrometry .

本文叙述用辉光放电分解SiF2和H2的混合物形成无定形a-Si：F：H薄膜。

We have developed a-Si formed by glow discharge decomposition of SiF and H mixture .

本文测定了催化剂、pH值对接触辉光放电等离子体降解水体中邻氯苯酚降解效率的影响；

Effects of catalyst and pH value on the degradation of o-chlorophenol in aqueous solution with contact glow discharge electrolysis plasma were studied .

基片温度对直流辉光等离子体辅助反应蒸发法沉积的ITO膜性能的影响

Effect of Substrate Temperature on Properties of ITO Film

研究了TiAl基合金的辉光离子渗氮。

The plasma nitridation process of TiAl based alloys has been investigated .

本文介绍了SiH4/PH3混合气体的高频辉光放电法，在硅、玻璃衬底上淀积的掺P氢化非晶硅膜的结构和特性，并对样品作了高温退火试验。

The P - doped a-Si : H film is deposited on substrate of silicon and .

网状阴极辉光放电法在钛合金表面渗镀Ta的应用

Application of Net - shape Cathode Glow Discharging on the Surface of Titanium Alloy by Tantalizing

TiAl基合金的辉光离子碳氮共渗研究

Study of Plasma Carbo-nitriding Process of TiAl Based Alloys

用扫描电镜（SEM）、X射线衍射（XRD）和辉光放电光谱（GDS）分析涂层的成分和微观结构。

The composition and microstructure of the coating layer are analyzed by means of SEM , XRD and GDS .

大气压反常辉光放电下CH4/CO2制合成气的数值模拟分析

CO_2 Reforming of CH_4 to Synthetic Gas by Abnormal Glow Discharge at Atmospheric Pressure : Model Study

在直流辉光放电等离子体装置上，利用不同直流功率和工作气压下产生的氧等离子体对CVD金刚石厚膜的表面进行了刻蚀。

Polycrystalline diamond films are etched at different etching parameters in oxygen plasma produced by DC glow discharge .

以黄铜为样品，瞬短脉冲辉光放电的瞬时溅射率达到24.4μg／s·mm2。

The transient sputtering rate of μ s-pulse mode is 24.4 μ g / s. mm2 for brass samples .

在外极管式电容偶合辉光放电装置中，进行了聚乙烯的四氟化碳（CF4）等离子体表面氟化。

Surface fluorination of polyethylene with CF_4 plasma was carried out in a capacitivelycoupled tubular reactor with external electrodes .

加弧辉光离子Ni-Cr共渗层相结构的研究

Phase Structure of Nickel-Chromizing Layer by Glow-Discharge Ion Surface Alloying with an Arc Source

通过X射线衍射、辉光放电光谱、扫描电镜等分析手段，对锌镍合金镀层的成分变化规律、微观形貌和结构以及腐蚀产物进行研究。

The coating components , microcosmic appearance , structure and corrosion products of zinc-nickel alloy had been analyzed by means of XRD , Glow Discharge Optical Emission Spectrometry and SEM .

Grimm辉光放电光源对钢中碳的分析

Spectrometric determination of carbon in steel with Grimm discharge light source

利用辉光放电技术，将C2H2/CO2/H2的等离子体聚合物沉积处理聚氯乙烯商品膜表面进行改性。

In glow discharge , conventional polyvinylchloride ( PVC ) membrane is modified by depositing plasma polymer of C_2H_2 / CO_2 / H_2 onto PVC membrane surface .

讨论了用射频辉光放电装置制备的掺氮非晶硅（a－Si＿（1－x）N＿x：H）光敏薄膜材料的光电特性。

Here is reported an experimental research on the photoelectric characteristics of a-Si_ ( 1-x ) Nx : H photosensitive film which is prepared by using radio frequency glow discharge divices .

利用扫描电镜、电子探针、X射线衍射和辉光质谱等现代理化测试分析手段，率先完成了对花岗石材高光泽饰面层理化结构的综合测试分析研究工作。

Comprehensive analysis including the physical and chemical characteristics and microstructure of high glossiness granite surfaces are analyzed by employed the SEM , electron probes , XRD and glow mass spectrogram .

硫蒸气辉光放电合成表面润滑材料（FeS）的性能及其应用

Properties and Applications of a Lubricant Layer of FeS by the Glow Discharge Technology in Sulphur Vapour

根据CO2激光器气体辉光放电的负阻特性，研究设计了一种新型零电流准谐振高压激励电源。

According to the negative resistance characteristics of glow discharge of CO 2 laser , a novel zero current quasi-resonant high voltage excitation power supply is researched and designed .