脉冲激光沉积

脉冲激光沉积Al膜的沉积模式及沉积速率研究

Study on deposition mode and rate in pulsed laser deposition of Al film

基片温度对脉冲激光沉积ZnO薄膜性质的影响

Affect of ZnO Thin Film of Pulsed Laser Deposition by Substrate Temperatures

脉冲激光沉积ZnO薄膜的微结构及发光性能

Surface Morphology and Photoluminescence Properties of ZnO Films Deposited with PLD

脉冲激光沉积法室温下ZnO薄膜的制备与表征

Room Temperature Growth and Characterization of ZnO Films by Pulsed Laser Deposition

氧分压强和基片温度对脉冲激光沉积的ZnO∶Al膜性能的影响

Effects of Oxygen Pressure and Substrate Temperature on ZnO ∶ Al Film by Pulsed Laser Deposition

用脉冲激光沉积法（PLD）在n型硅（111）平面上生长ZnO薄膜。

ZnO thin film was deposited on n-Si ( 111 ) substrates by PLD .

激光能量对脉冲激光沉积法制备ZnO薄膜性能的影响

Effect of Laser Energy on the Properties of ZnO Films by Pulsed Laser Deposition Method

飞秒脉冲激光沉积Si基a轴择优取向的钛酸铋铁电薄膜

A-Axis Oriented Bi_4Ti_3O_ ( 12 ) Thin Films Deposited on Si ( 111 ) by Femtosecond Laser Ablation

脉冲激光沉积制备ZnO薄膜及其发光性质研究

Study of Structure and Photoluminescence Properties of the ZnO Thin Film Deposited by Pulse Laser Deposition

主要介绍了脉冲激光沉积镀膜的原理和方法，并对X射线衍射倒易空间图技术做了详细的介绍。

Especially , the pulsed laser deposition ( PLD ) method and X-ray diffraction reciprocal space mapping are described in details .

脉冲激光沉积法在多孔铝衬底上生长的ZnO薄膜的结构与光学性质

Structural and Optical Properties of ZnO Films Deposited on Porous Anodic Alumina Substrates by Pulsed Laser Deposition

GaN薄膜制备及脉冲激光沉积法的研究进展

Research development on GaN films grown by laser deposition

沉积温度和退火处理对脉冲激光沉积的ZnO∶Al膜性能的影响

Influence of substrate temperature and post-treatment on the properties of ZnO ∶ Al thin films prepared by pulsed laser deposited

本文用脉冲激光沉积方法按照温度、频率、氧压等不同生长条件生长了ZnO薄膜。

In this paper , ZnO films were prepared at various temperatures , laser frequencies and oxygen pressures .

在室温条件下，采用脉冲激光沉积技术在玻璃衬底上生长了ZnO薄膜。

Zinc oxide thin film was synthesized on glass substrate at room temperature using the pulsed laser deposition .

ZnS薄膜脉冲激光沉积及其发光特性

ZnS thin film deposited by pulsed lasers and its luminescent characteristic

脉冲激光沉积GaN薄膜的结构和光学特性研究

Optical and Structural Properties of GaN Films Grown on Si Substrate by Excimer Pulsed Laser Deposition

本文分别利用离子枪和等离子体辅助脉冲激光沉积N掺杂ZnO薄膜。

In this work , N-doped ZnO films are grown with pulsed laser deposition ( PLD ) assisted by nitrogen ion beam or plasma .

脉冲激光沉积（PLD）铜薄膜过程的模拟研究

Simulation of the Process of Pulsed Laser Deposition of Thin Copper Film

脉冲激光沉积法制备PZT铁电薄膜及衬底温度对膜的影响

Preparation of Ferroelectric PZT Thin Films by Pulsed Laser Deposition and the Dependence of Substrate Temperature

脉冲激光沉积LiMn2O4薄膜的研究

A Study of Pulsed Laser Deposition of LiMn 2O 4 Thin Films

采用脉冲激光沉积（PLD）技术，在Si（100）衬底上制备出高度c轴取向的ZnO薄膜。

The ZnO films with c axis orientation were prepared by pulse laser deposition ( PLD ) on Si ( 100 ) substrate .

脉冲激光沉积（Pulsedlaserdeposition，PLD）是20世纪80年代发展起来的一种全新的制备薄膜技术，具有沉积速率高，再现性能好等优点。

Pulsed laser deposition ( PLD ), developed in 1980s , is a new fabricating film technology with high deposition rate and good reproducibility .

脉冲激光沉积法制备VO2热致变色薄膜研究进展

Study of VO_2 Thermochromic Thin Films Fabricated by Pulsed Laser Deposition

脉冲激光沉积（PLD）薄膜技术的研究现状与展望

Review of Pulsed Laser Deposition Film Growth Technology

对于N掺杂ZnO，我们发现N离子束或N等离子体辅助脉冲激光沉积技术都能制备出p型ZnO薄膜。

For N-doped ZnO films , we demonstrate that PLD assisted by both of nitrogen ion beam and N plasma can produce the ZnO films with p-type conductance .

使用脉冲激光沉积技术（PLD）在Si（111）单晶衬底上制备了Co纳米颗粒薄膜。

Nano Co thin films on single crystal silicon ( l11 ) were successfully fabricated by PLD in a hydrogen background gas .

ECR等离子体辅助反应脉冲激光沉积氮化碳薄膜

Carbon Nitride Films Synthesized Using ECR Plasma Assisted Reactive Pulsed Laser Deposition

脉冲激光沉积BST铁电薄膜的厚度分布

Thickness distribution of BST ferroelectric film deposited by pulsed laser

STO薄膜采用脉冲激光沉积法（PLD）制备。

STO films were deposited by pulse laser depositing ( PLD ) .