离子束溅射

离子束溅射铂膜沉积速率的温度效应

Deposition Rate of IBS Deposited Pt Films at Different Substrate Temperatures

离子束溅射沉积角对Ni／Si膜界面特性影响的研究

Effect of depositing angle in ion beam sputtering on interface character of ni / si film

离子束溅射沉积Co膜光学特性的尺寸效应研究

Size Effect of Optical Properties of Ion-beam Sputtering Deposited Co Films

离子束溅射生长非晶Si薄膜的研究

Study of amorphous Si thin films fabricated by ion-beam sputtering

双离子束溅射制备SiNx薄膜的光致发光性质

Photoluminescence of SiN_x Thin Film Prepared by Dual Ion Beam Sputtering

离子束溅射Ti和Ni薄膜的初生过程

The initial stage of ion beam depositing Ti and Ni film growth

离子束溅射沉积Ir膜真空紫外反射特性研究

Reflectance of Ir Layer in Vacuum Ultraviolet Wavelength Region Deposited by Ion Beam Sputtering

Si（111）衬底上离子束溅射沉积法生长β-FeSi2薄膜的研究

Formation of β - FeSi_2 film by deposition Fe on Si ( 111 ) substrate

我们在真空离子束溅射设备中制备了CoSiO2颗粒膜。

Co-SiO-2 magnetic granular films were prepared with ion-sputtering method .

离子束溅射生长Ge纳米薄膜的表面形貌观察

Observation on surface morphology of Ge nano-films grown by ion beam sputtering

离子束溅射沉积Ta2O5光学薄膜的实验研究

Experimental study for ion beam sputtering deposition of Ta_2O_5 optical thin film

反应离子束溅射沉积和还原退火工艺制备VOx多晶薄膜

Fabrication of Polycrystalline VO_x Films through Reactive Ion-beam Sputtering and Reductive Annealing

低束流下离子束溅射沉积Si薄膜的Raman光谱研究

Investigation of raman spectra of silicon films deposited by ion beam sputtering at low ion beam current

离子束溅射ZnO籽晶层上所生长的ZnO纳米结构形成一层致密的膜。

And the ZnO nanostructures on the ion-beam seed layer can even form a dense film .

在注入As的Si表面上，采用离子束溅射淀积Co/Ti双层金属膜。

The bimetallic layers of Co / Ti were deposited by ion beam sputtering on silicon implanted with arsenic .

在温度为400℃下，采用离子束溅射技术在Si（100）衬底上沉积Si薄膜。

The silicon films have been deposited by ion beam sputtering on the Si ( 100 ) wafer at 400 ℃ .

叙述用离子束溅射镀膜机OXFORD进行X射线长波段多层膜实验及制备X射线多层膜光学元件方面的工作。

The X-ray multilayer mirror for longer wavelength fabricated with ion-beam-sputtering deposition instrument OXFORD , is introduced in this paper .

采用离子束溅射法，在单晶Si（100）基片上制备CN薄膜。

CN films have been prepared on Si ( 100 ) substrates by using ion beam sputtering .

离子束溅射沉积制备高JcYBa2Cu3O（7-δ）超导薄膜

Preparation of high j_c yba_2cu_3o_ ( 7 - δ) superconducting thin films by ion beam sputtering deposition

讨论了离子束溅射TiO2薄膜的制备参量对薄膜消光系数的影响。

The effect of preparation parameters on the extinction coefficients of TiO_2 films deposited by ion-beam-sputtering is discussed .

离子束溅射制备Pt及Pt合金催化电极材料的电化学活性研究

Study on the Electrochemical Activities of Pt and Pt Based Alloys Catalytic Electrode Materials Produced by Ion Beam Sputtering

油酸单甘酯的RF值较棕榈酸单甘酯的略高。氩离子束溅射沉积PTFE高分子膜

RF of monoolein is slightly higher than that of monopalmitin . Forming PTFE film by Ar + sputtering deposition

用离子束溅射和离子辅助淀积技术制备DWDM滤光片的关键问题是必须获得优良的膜层厚度均匀性。

The uniformity of layer thickness of DWDM filters is a key point .

采用离子束溅射铁靶的方法在加热的Si（111）衬底上得到了不同种类的铁硅化物。

Different kinds of iron silicides were prepared at different Si ( 111 ) substrate temperatures by ion beam sputtering with an iron target .

离子束溅射和离子辅助淀积DWDM滤光片的膜厚均匀性

Uniformity of layer thickness of DWDM filters prepared by ion-beam sputtering and ion-assisted deposition

目前制备HA涂层的技术主要有等离子喷涂、电化学沉积、溶胶-凝胶法、离子束溅射等。

Recently , many methods have been applied to preparing HA films including plasma spraying , sol-gel and ion beam sputter deposition .

采用离子束溅射生长的Ni作为刻蚀掩模，刻蚀速率随ICP直流偏压的增加而增加。

Ion beam sputtering deposited Ni was used as etching mask . The measured etching rates increased with the increasing ICP dc bias .

离子束溅射BST薄膜的制备及结构分析

Microstructure of BST films by ion-beam sputtering

离子束溅射沉积Ti-Ni薄膜及其电化学性能的研究

Electrochemical characterizations of Ti-Ni thin films prepared by ion beam sputtering

用双离子束溅射法，在单晶硅、玻璃、Mo及不锈钢表面淀积了类金刚石碳膜。

The Diamond-like Carbon ( DLC ) films were deposited on Si , glass , Mo arid stainless steel substrates by dual-ion beam sputtering method .