离子束溅射
- 网络ion beam sputtering;IBS;DIBS
![离子束溅射](../cache/1406731.jpg)
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离子束溅射铂膜沉积速率的温度效应
Deposition Rate of IBS Deposited Pt Films at Different Substrate Temperatures
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离子束溅射沉积角对Ni/Si膜界面特性影响的研究
Effect of depositing angle in ion beam sputtering on interface character of ni / si film
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离子束溅射沉积Co膜光学特性的尺寸效应研究
Size Effect of Optical Properties of Ion-beam Sputtering Deposited Co Films
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离子束溅射生长非晶Si薄膜的研究
Study of amorphous Si thin films fabricated by ion-beam sputtering
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双离子束溅射制备SiNx薄膜的光致发光性质
Photoluminescence of SiN_x Thin Film Prepared by Dual Ion Beam Sputtering
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离子束溅射Ti和Ni薄膜的初生过程
The initial stage of ion beam depositing Ti and Ni film growth
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离子束溅射沉积Ir膜真空紫外反射特性研究
Reflectance of Ir Layer in Vacuum Ultraviolet Wavelength Region Deposited by Ion Beam Sputtering
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Si(111)衬底上离子束溅射沉积法生长β-FeSi2薄膜的研究
Formation of β - FeSi_2 film by deposition Fe on Si ( 111 ) substrate
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我们在真空离子束溅射设备中制备了CoSiO2颗粒膜。
Co-SiO-2 magnetic granular films were prepared with ion-sputtering method .
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离子束溅射生长Ge纳米薄膜的表面形貌观察
Observation on surface morphology of Ge nano-films grown by ion beam sputtering
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离子束溅射沉积Ta2O5光学薄膜的实验研究
Experimental study for ion beam sputtering deposition of Ta_2O_5 optical thin film
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反应离子束溅射沉积和还原退火工艺制备VOx多晶薄膜
Fabrication of Polycrystalline VO_x Films through Reactive Ion-beam Sputtering and Reductive Annealing
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低束流下离子束溅射沉积Si薄膜的Raman光谱研究
Investigation of raman spectra of silicon films deposited by ion beam sputtering at low ion beam current
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离子束溅射ZnO籽晶层上所生长的ZnO纳米结构形成一层致密的膜。
And the ZnO nanostructures on the ion-beam seed layer can even form a dense film .
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在注入As的Si表面上,采用离子束溅射淀积Co/Ti双层金属膜。
The bimetallic layers of Co / Ti were deposited by ion beam sputtering on silicon implanted with arsenic .
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在温度为400℃下,采用离子束溅射技术在Si(100)衬底上沉积Si薄膜。
The silicon films have been deposited by ion beam sputtering on the Si ( 100 ) wafer at 400 ℃ .
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叙述用离子束溅射镀膜机OXFORD进行X射线长波段多层膜实验及制备X射线多层膜光学元件方面的工作。
The X-ray multilayer mirror for longer wavelength fabricated with ion-beam-sputtering deposition instrument OXFORD , is introduced in this paper .
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采用离子束溅射法,在单晶Si(100)基片上制备CN薄膜。
CN films have been prepared on Si ( 100 ) substrates by using ion beam sputtering .
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离子束溅射沉积制备高JcYBa2Cu3O(7-δ)超导薄膜
Preparation of high j_c yba_2cu_3o_ ( 7 - δ) superconducting thin films by ion beam sputtering deposition
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讨论了离子束溅射TiO2薄膜的制备参量对薄膜消光系数的影响。
The effect of preparation parameters on the extinction coefficients of TiO_2 films deposited by ion-beam-sputtering is discussed .
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离子束溅射制备Pt及Pt合金催化电极材料的电化学活性研究
Study on the Electrochemical Activities of Pt and Pt Based Alloys Catalytic Electrode Materials Produced by Ion Beam Sputtering
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油酸单甘酯的RF值较棕榈酸单甘酯的略高。氩离子束溅射沉积PTFE高分子膜
RF of monoolein is slightly higher than that of monopalmitin . Forming PTFE film by Ar + sputtering deposition
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用离子束溅射和离子辅助淀积技术制备DWDM滤光片的关键问题是必须获得优良的膜层厚度均匀性。
The uniformity of layer thickness of DWDM filters is a key point .
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采用离子束溅射铁靶的方法在加热的Si(111)衬底上得到了不同种类的铁硅化物。
Different kinds of iron silicides were prepared at different Si ( 111 ) substrate temperatures by ion beam sputtering with an iron target .
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离子束溅射和离子辅助淀积DWDM滤光片的膜厚均匀性
Uniformity of layer thickness of DWDM filters prepared by ion-beam sputtering and ion-assisted deposition
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目前制备HA涂层的技术主要有等离子喷涂、电化学沉积、溶胶-凝胶法、离子束溅射等。
Recently , many methods have been applied to preparing HA films including plasma spraying , sol-gel and ion beam sputter deposition .
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采用离子束溅射生长的Ni作为刻蚀掩模,刻蚀速率随ICP直流偏压的增加而增加。
Ion beam sputtering deposited Ni was used as etching mask . The measured etching rates increased with the increasing ICP dc bias .
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离子束溅射BST薄膜的制备及结构分析
Microstructure of BST films by ion-beam sputtering
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离子束溅射沉积Ti-Ni薄膜及其电化学性能的研究
Electrochemical characterizations of Ti-Ni thin films prepared by ion beam sputtering
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用双离子束溅射法,在单晶硅、玻璃、Mo及不锈钢表面淀积了类金刚石碳膜。
The Diamond-like Carbon ( DLC ) films were deposited on Si , glass , Mo arid stainless steel substrates by dual-ion beam sputtering method .