溅射

射频磁控溅射GaP薄膜的光学性能

Optical Properties of Gap Film Prepared by RF Magnetron Sputtering

B掺杂对Ni原子溅射产额的影响

Effect of addition of Boron on sputtering yield of nickel

激光溅射下原子团簇生长的非平衡动力学（II）

Non-equilibrium Kinetics of Clusters Growth under Laser Ablation ( II )

溅射（Ti，Al）N薄膜的机械性能

Mechanical properties of sputtered ( ti , al ) n thin films

射频溅射a&Si：F，H中载流子的低温传导

Carrier conduction at low temperature in radio frequency sputtered a-si : f , h

磁控溅射制备参数对ZnO∶Al光学性能的影响

The Effect of Magnetron Sputtering Growth Parameters on Optical Properties of ZAO

Ni基体磁控溅射离子镀Al膜的电镜观察

TEM observation of ion-plated Al film on Ni Substrate

对向靶溅射TiN薄膜的结构和物性

Structure and properties of TiN films prepared by facing targets sputtering

磁控溅射和热氧化法制备ZnO纳米颗粒

Synthesis of ZnO Nanoparticles by Magnetron Sputtering and Subsequent Thermal Oxidization

RF磁控溅射制备Al2O3薄膜及其介电性能研究

Dielectric Properties of Alumina Films Prepared by RF Magnetron Sputtering

多元分层动态靶溅射的快速MonteCarlo模拟计算

High-speed Monte Carlo simulation of sputtering for multicomponent multi-layer dynamic targets

磁控溅射TiN界面结合强度的压痕法测试

Measurement of Bonding Strength of Magnetic Sputtered TiN Coatings by Indentation Method

双靶磁控溅射制备掺W氧化钒薄膜的研究

Study on W-doped vanadium oxide thin films prepared by double targets magnetron sputtering

Si（111）衬底上离子束溅射沉积法生长β-FeSi2薄膜的研究

Formation of β - FeSi_2 film by deposition Fe on Si ( 111 ) substrate

射频溅射法生长ZnO薄膜的参数研究

Study on the Parameter of ZnO Thin Films Deposited by RF Magnetron Sputtering

采用壳层效应屏蔽长度MonteCarlo方法计算溅射产额

Sputtering yield calculation by Monte Carlo simulation with screening length of shell effects

离子源辅助磁控溅射沉积SiOx阻隔薄膜的研究

Study on SiO_x Coating Deposition by Magnetron Sputtering with Ion Beam Assisted

反应溅射Al2O3膜对TiAl抗高温氧化性能的影响

Effect of reactively-sputtered al_2o_3 films on oxidation resistance of TiAl

等离子体辉光溅射反应复合渗镀合成TiN的研究

Growth of TiN by Plasma Glow Discharge Sputtering , Diffusion and Ion Surface Alloying

衬底温度对中频磁控溅射ZnO∶Al透明导电薄膜性能的影响

Substrate Temperature Dependence of the Properties of ZnO ∶ Al Thin Films Prepared by Mid-frequency Sputtering

ZnO掺杂Li~+陶瓷靶及溅射膜制备工艺研究

The experimental investigation on preparation of Li-doped ZnO ceramic targets and sputtering thin films

袖珍溅射PIG离子源

A compact sputtering PIG ion source

反应溅射TiO（2-x）Nx膜的可见光吸收性能

Absorption property in visible region of TiO_2-xN_x films prepared by reactive sputtering

用新局域模型计算高Z靶的溅射产额

Calculations of sputtering yield of high Z materials target using a new local model

RF溅射ZnO薄膜工艺与结构研究

Research of Deposition Condition and Structural Properties of ZnO Films Grown by RF Magnetron Sputtering

介绍了基于FPGA的太阳能真空集热管磁控溅射镀膜机控制系统的整体设计和工程实现过程。

This paper introduces an integrated design and implementation of the SCS control system based on FPGA .

反应磁控溅射MgO薄膜溅射模式的分形维表征

Sputtering mode transition of MgO thin film characterized by surface fractal

RF溅射碳化硅薄膜的结构研究

Structural Research of RF-Sputtered Silicon Carbide

Er离子注入Si和SiO2/Si溅射和外扩散对浓度分布的影响

Influence of sputtering and out-diffusion in Er implanted SiO_2 / Si on depth profile

射频磁控溅射法制备Cu3N薄膜及其性能研究

Properties of Cu_3N Films Prepared by Reactive Radio-frequency Magnetron Sputtering