氢氟酸

研究了用HP4500型ICP-MS方法分析半导体用浓氢氟酸中的痕量杂质。

The HP 4500 ICP-MS analysis of trace impurities in concentrated hydrofluoric acid used in semiconductor production was described .

还原后得到的硫酸亚铁经过净化除杂，滴加到含有适量有机添加剂的沉淀剂NH4OH-NH4HCO3中，沉淀洗涤干燥后900℃煅烧2h，煅烧产品再用稀硝酸和氢氟酸洗涤，得到高纯球形-αFe2O3。

The FeSO_4 obtained by reduction is purified , adding to NH_4OH-NH_4HCO_3 solution containing organic additives , precipitated and finally washed and then calcined at 900 ℃ for 2 hours . The calcined product is washed using dilute nitric acid and hydrofluoric acid , obtaining high-purity α - Fe_2O_3 .

氢氟酸烷基化装置F级腐蚀性管道施工

Construction of F Class Corrosion Pipeline in HF Alkylation Unit

而一维光子晶体的制备方法包括p型和n型单晶硅在不同电流密度下阳极氧化以形成折射率交替变化的多孔硅层，并采用了不同氢氟酸浓度的腐蚀液，以获得最佳的浓度配比。

The fabrication method of ID photonic crystal includes anodization of p-and n-type silicon with various current densities under aquiferous HF solution of different concentration .

氢氟酸处理对PP和PET储电性的影响及其电荷动态特性

Effect of HF Treatment on the Charge Storage Properties of PP and PET Film and Their Charge Dynamic Characteristics

介绍了在硅微机械加工的牺牲层释放中，氢氟酸（HF）腐蚀磷硅玻璃（PSG）模型的建立过程，详细阐述了PowerLaw模型。

A basic model of sacrificial layer-phosphosilicate-glass ( PSG ) etching was introduced , and Power law model was elucidated in details .

干氧SiO2的氢氟酸缓冲腐蚀研究

Wet etching of dry thermal SiO_2 with buffered hydrofluoride acid

讨论了制备中氢氟酸（HF）浓度、电流密度和光照等因素对材料形成的影响。

The effects of HF concentration , current density and light illumination on material formation were also discussed .

经氢氟酸刻蚀后得到含偶氮苯的PAA中空微球。

After etching by hydrofluoric acid , PAA hollow microspheres were obtained .

NiMo型的HastelloyB合金用于氢氟酸介质中具有优良的耐蚀性能，但成本较高。

Ni-Mo type Hastelloy B alloy has good corrosion resistance in the hydrofluoric acid medium , but it is costly .

氢氟酸溶样ICP-AES法测定出口磷矿石中氧化铁和氧化铝

Determination of Iron Oxide and Alumina in Export Phosphorus Rock by ICP-AES of Dissolving Sample with Hydrofluoric Acid

介绍了氢氟酸烷基化装置、甲基叔丁基醚（MTBE）装置及气分装置等的DCS的设计。

The design of DCS in HF Alkylation unit , MTBE unit and Gas Separation unit is introduced .

选择30个氢氟酸（HF酸）浓度－时间搭配点，测试瓷贴面复合体整体粘结抗剪强度。

After HF acid etching under 5 different HF concentrations and 6 exposing times , shear bonding strength of porcelain to enamel were tested .

Al（NO3）3的存在，将铍的灰化温度提高到1600°C，且消除溶解所引入的大量剩余氢氟酸干扰。

In the presence of Al 2O 3 and HF , the ashing temperature is raised to 1600 ° C , where the interference of HF is expelled .

氢氟酸改性USY分子筛催化合成乙基叔丁基醚的研究

Synthesis of ETBE catalyzed by HF modified USY zeolites

方法：健康大鼠随机分为氢氟酸烧伤组、汽油烧伤A组和B组、正常对照组。氢氟酸烧伤组致2%Ⅲ度烧伤。

Method : Healthy Wistar rats were randomly divided into four groups : hydrofluoric acid burn group , gasoline burn group A , gasoline burn group B , and normal control group , 18 rats in each group .

钢铁样品用硝酸、盐酸、氢氟酸在电热板上加热或微波消解，溶液经稀释后未经基体分离，未加内标直接用电感耦合等离子体质谱法（ICP-MS）测定。

Steel samples were dissolved with nitric acid , hydrochloric acid and hydrofluoric acid by electrothermal heating or microwave digestion .

预先用浓氢氟酸将硼转化成氟硼酸根，然后在pH4用氟硼酸根离子选择电极进行测量。

Boron convert into BF4 ~ with concentrated hydrofluoric acid in advance .

分析了氢氟酸腐蚀原因，把Ni-P化学镀用在烷基化装置上，从而解决了腐蚀问题。

The causes of HF corrosion were analyzed . The corrosion problem was solved after the application of electroless of Ni-P plating in the alkylation unit .

结论：9.6%氢氟酸酸蚀20s能使IPS-Empress2陶瓷与树脂之间达到最大粘结强度。

Conclusion : The bond strength between IPS-Empress 2 dental ceramic and resin can reach the maximum when etching for 20 seconds .

回收样品在440K左右经9～10h与氢氟酸反应处理后，c–Si3N4粉体的纯度接近100%。

The purity of c – Si3N4 reached 100 % after the recovered samples were treated with hydrofluoric acid at 440 K for 9 ― 10 h.

采用高温灰化植物样本，氢氟酸盐酸硝酸硫酸一次溶解植物灰分，电感耦合等离子体质谱法（ICPMS）同时测定15种稀土元素。

The hydrofluoric acid-hydrochloric acid-nitric acid-vitriol ( HF-HCl-HNO_3-H_2SO_4 ) system was used for the determination of 15 rare earth elements in the ash of plant by inductively coupled plasma mass spectroscopy ( ICP-MS ) .

实验发现兔抗小鼠IgG抗体检测的灵敏度与多孔硅基底制备时所采用的腐蚀电流密度、腐蚀时间、氢氟酸浓度有关。

We found that the detection sensitivity of the mouse IgG microarray was dependent on preparing conditions of porous silicon substrate including etching current density , etching time , and concentration of HF .

设计了1种新型填料―PTFE阶梯拉西环并应用在无水氢氟酸装置的洗涤塔中，分析了该填料的特性。

A new type filler , PTFE ladder Rasching ring is designed and used in the washing tower of anhydrous hydrofluoric acid equipment , properties of this filler is also analyzed .

以天然粉石英为基本原料，通过氢氟酸与盐酸混合酸溶蚀技术和机械强力搅拌处理，制备了高纯球形-准球形亚微米晶质SiO2材料。

High purity spherical-normal spherical submicron crystal silica is prepared by using technique of mixing acid corrosion ( anhydrofluoric acid and sulphuric acid ) and method of mechanical stir from raw powder quartz .

基于多孔硅生长过程中阳极化电流，氢氟酸（HF）含量与多孔硅微结构的关系，提出一个改进的多孔硅生长模型，并进行了计算机模拟。

A modified model for porous silicon formation is proposed and computer simulation has been carried out based on the dependence of the porous silicon microstructure on anodic current and HF concentration during porous silicon formation .

建立了硝酸盐酸氢氟酸微波消解样品，氢化物发生ICPAES法测定煤中痕量砷的方法。

A method for the determination of trace As in coal by microwave digestion and hydride generation ICP-AES has been reported . The digestion system of HNO_ ( 3 ) - HCl-HF was evaluated .

开路TSD电流谱的研究结果表明，经萃取、氧化和氢氟酸处理的PP孔洞膜的电荷稳定性得到显著的提高，而氢氟酸处理的PET膜的电荷稳定性较原膜显著地降低。

It has been indicated by TSD current spectra that the charge stability of the chemically treated PP films by extraction , oxidation , and HF solution is significantly improved while that of the HF-treated PET films becomes bad .

综述中国石油某石化公司氢氟酸烷基化装置，在运行过程中HF对人身体和周边环境产生的危害，对HF的危险性和污染源做出分析并提出具体的预防措施。

Harm of HF to human health and environment during the operation of HF alkylation units in PetroChina Dalian Petrochemical Company are summarized , the hazard and pollution source of HF are analyzed , and specific preventive measures are put forward .

以乙醇和叔丁醇为原料、氢氟酸改性USY分子筛为催化剂合成乙基叔丁基醚，建立了反应动力学模型。

A reaction kinetic model for synthesis of ETBE from ethanol and tertiary butyl alcohol , catalyzed by HF / USY modified by hydrofluoric acid , was established .