曝光机

电子束和接触式曝光机的混合曝光技术

Electron Beam / Optical Stepper Mixed Lithography

本文介绍了DY－5型亚微米电子束曝光机的主要技术性能：最细特征线宽0.4μm；

The technical specifications of Type DY-5 submicron electron beam exposure machine are introduced .

基于FPGA的电子束曝光机工件台控制器设计

E-beam Lithography Stage Controller Design Based on FPGA

LaB6阴极在电子束曝光机中的应用研究

Applicaton of lab_6 cathode in electron beam lithography systems

介绍了nm级电子束曝光机激光定位精密工件台系统的结构组成、各部分技术措施及总体性能指标。

The configuration , technology solutions and all performances of laser stage system for E-beam lithography machine were described .

本文介绍了应用于亚微米电子束曝光机电源系统中的FIR滤波器。

The FIR filter used in the power supply of submicron E beam lithography system is described .

系统介绍了亚微米电子束曝光机激光工件台控制系统的结构组成以及工件台自校正PID定位控制系统的设计。

The constitution of the control system for laser positioning stage used in sub micron E beam exposure machine and the design of PID positioning and control system for automatic correction of the stage are presented in the paper .

DJ-2型可变矩形电子束曝光机电子光学设计

Electron optical column for variable rectangular-shaped beam lithography system DJ-2

本文介绍了应用现行的PSPICEV5.0软件和CAD优化技术，对亚微米电子束曝光机高速偏放电路的VMOSFET参数进行处理。

The analysis and synthesis on the parameters of VMOSFET in high speed deflection circuit of submicron EB exposure machine by PSPICE V5 . 0 program and CAD optimum technique are introduced .

EBES-40A型电子束曝光机的软件开发

Software development for ebes-40 a electron beam lithography system

高速数据传送系统（HSDTS），相当于可变矩形电子束曝光机控制曝光用的专用计算机。

HSDTS is a special purpose computer that is used in the Variable-Shaped electron beam lithography system .

本文介绍了为新型电子束曝光机研制的高精度30kV高压稳压电源。

A high-precision regulated power supply for a new type electron beam lithography system with 30 kV high voltage is recommended .

在此基础上使用SDS-II型曝光机在20kV的加速电压、2μC/cm2的曝光剂量下，对经真空挥发处理过的三羟甲基丙烷三丙烯酸酯（TMPTA）液态低聚物进行了曝光试验，得到了固化结构。

An experiment has been made to cure oligomer Trihydroxy Methyl Propane Tri Acrylate ( TMPTA ) in SDS-II at ( 20 kV ) and 2 _C / cm ~ 2 dose .

研究了常用的国产BP212正型紫外光刻胶和光学曝光机在利用剥离工艺制备电极中的适用性。

The availability of the domestic positive resist BP212 and optical exposure equipment in fabricating the electrode of MEMS device using lift-off process is discussed .

通过对液态低聚物辐射固化条件和SDS-II型曝光机的加速电压、曝光剂量等曝光参数的分析研究，得出SDS-II型曝光机可以用于液态低聚物辐射固化的结论。

Based on the studies of oligomer curing conditions and accelerating voltage , exposure dose of SDS-II electron beam exposure system , a conclusion is achieved that SDS-II is suitable for curing oligomer .

以SDS-3电子束曝光机为基础，用折板结构静电偏转替代直板结构静电偏转，探讨了电子束曝光机折板静电偏转场的电子轨迹与电位分布应满足的要求。

Based on the SDS-3 E-beam lithography machine , the electrostatic deflection of the folded plate structure was used instead of the electrostatic deflection of the plate . The requirements that the electron trajectories and potential distribution must realize for electrostatic deflection of folded plate sturcture were discussed .

电子束曝光机偏转系统及可动物镜分析

Deflecting System and Moving Objective Lens in Electron Beam Exposure Machine

DB&5型光栅扫描电子束曝光机真空系统

Vacuum system of model DB-5 raster scanning electron beam exposure machine

曝光机是图形转移中的重要设备。

Exposure machine is a key equipment in the graphic transitions .

曝光机双玻璃晒架及其真空系统的设计

The Design of Exposure Machine with Glass-glass-frames and its Vacuum System

亚微米电子束曝光机镜筒光路与结构

Columm Optics And Mechanism of a Submicron Electron Beam Lithography System

亚微米电子束曝光机数控电流源系统

Digital-control current source system for sub-micrometer electron beam lithography system

电子束曝光机磁复合偏转系统的研究

A Study On Magnetic Deflection System In Electron Beam Machine

缩小投影电子束曝光机的调试技术

Technology of Adjusting the Projection Electron-beam Lithography with Demagnification Imaging

可变矩形束曝光机的曝光方式和曝光数据调度

Exposure mode and data dispatching of a variable-shaped rectangular beam lithographic system

变形电子束曝光机成形偏转器的设计和性能

Design and performance of shaping deflectors for variable shaped electron beam lithography

可变矩形电子束曝光机真空系统的完善

Improvement of evacuation system used for variable shaped electron beam exposure machine

一种新的电子束曝光机中间图形及其数据格式

A New Intermediate Pattern of Electron Beam Lithography and Its Data Format

电子束曝光机背散射电子检测电路的研究

Research on Backscattered Electron Detecting Circuit of Scanning-electron-beam Lithography System

提高电子束曝光机分辨率的探讨

Study on improving resolution of electron beam lithography machines exposure