氮化

本文主要研究立方氮化硼的制备、性质和n型掺杂等内容。

In this paper we mainly study preparation , properties and n-type doping of cubic boron nitride thin films .

电阻率测试表明，氮化碳薄膜的电阻率值达到1012～1013Ω·cm。

The resistivity of carbon nitride films is 10 12 Ω· cm to 10 13 Ω· cm .

叠氮化铜不溶于水。

Cupric azide is insoluble in water .

研究了一种筛片的软氮化工艺

This paper deals with a nitempering process of sifter mesh .

纯铁离子氮化后时效的x射线衍射分析

The X-ray diffraction analysis of pure iron aged after ion-nitriding

用连续波CO2激光对氮化硅陶瓷打孔的实验研究

Experimental investigation on laser drilling of si_3n_4 ceramics with CW co_2 laser

氮化增加合金中的-αFe含量。

Nitrogenation process increases the content of α - Fe in nitrides .

用于软X射线显微术的氮化硅窗口的研制

Fabrication of Si_3N_4 Windows for Soft X-Ray Microscopy

复合助剂Y2O3-CaC2对氮化铝陶瓷热导率的影响

Influence of compound additive Y_2O_3-CaC_2 en the thermal conductivity of AIN

含Ti不锈钢中氮化钛夹杂的研究

On titanium nitride inclusions in Ti-STABILIZED stainless steel

氮化硅陶瓷高温蠕变行为及Y2O3和CeO2的影响

High Temperature Creep Behavior of Si_3N_4 Ceramics and Effect of Y_2O_3 and CeO_2

GaAs表面的室温光致氮化

Photon - Induced Nitridation of GaAs Surface at Room Temperature

氮化碳（C3N4）的研究进展

The development of research on the carbon nitride

高剂量N~＋注入碳膜形成氮化碳CNx的研究

Formation of carbon nitride CN _x by high dose nitrogen implantation into carbon film

Fe2O3在煤矸石碳热还原氮化合成SiAlON时的作用

Effect of Fe_2O_3 on Synthesis of SiAlON from Coal Gangue by Reduction-Nitridation Process

用连续称重法研究了钛白粉被活性碳还原氮化合成氮化钛粉末的还原氮化反应机理，并进行了反应的热力学、反应产物的显微结构以及X-ray衍射分析。

The formation mechanism of titanium nitride powders by reduction of carbon and nitridation was researched by method of continuous weighing .

利用SEM，XRD，XPS研究氮化层的显微组织、表面成分、结构。

The microstructure , surface composition and structure were investigated by SEM , XRD and XPS .

氮化工艺对GaN缓冲层生长的影响

Influence of Nitriding Technology on Growth of GaN Buffer

通过扫描电镜、X射线衍射、粒径分析及化学成分分析等检测手段对氮化产物进行表征。

The character of products was determined by means of electron microscopy , X-ray diffraction , granularmetric analysis and chemical composition analysis etc.

1研究了氮化钛电极在pH11-14范围内对pH的响应。

The TiN electrode showed a linear response in the pH range of 11-14 with a response slope of - 60 mV / pH.

覆盖Si3N4层和栅氧化物氮化对晶体管的影响

Effect of Capping Silicon Nitride Layer and Nitrided Gate Oxide on Hump of Transistors

热灯丝辅助射频等离子体CVD法生长立方氮化硼膜的研究

Study on cubic boron nitride films deposited by thermal filament assisted RF plasma CVD

SiO2负载的氮化钼催化剂的合成与表征

Synthesis and characterization of sio_2 supported molybdenum nitride hydrodenitrogenation catalysts

在高岭土和碳的混合物中，加入适量氧化铁作催化剂，在N2气氛下，通过还原-氮化反应，制得β-sialon粉料。

β - sialon powder was synthesized by adding ferrous oxide as a catalyzer in the mixture of kaolin and carbon black through carbothermal reduction-nitridation reaction .

详细研究了工艺因素对TiO2碳热还原氮化过程的影响；

The influences of technique factors on the process were discussed in detail .

TiO2碳热还原氮化反应的热力学分析

Thermodynamic analysis for carbothermal reduction and nitridation of TiO_2

初步分析和探讨氮化硅薄膜的力学性能对RFMEMS开关器件性能的影响。

The effect of silicon nitride film mechanical properties on the performances of RF MEMS switch device was researched .

氮化铝（AlN）陶瓷的特性、制备及应用

Properties , Fabrication and Application of Aluminum Nitride ( AlN ) Ceramis

用AES表面分析技术研究了热氮化二氧化硅膜的结构。

The structure of the films was analyzed byz the surface analysis method of AES .

关于NO氮化SiO2超薄栅介质膜的研究

Study of Ultra Thin Gate Dielectrics Prepared by NO Nitridation of SiO 2