石英玻璃

石英玻璃的抗辐射能力随着掺F量的增加而增加。

Consequently , the radiation resistance properties of silica glass will be improved with the increase of the Fluorine doped quantity .

通过对比实验表明，掺入适量的CeO2等杂质的掺铈石英玻璃管可以吸收氙等离子体的320nm左右的近紫外辐射，改善脉冲氙灯的辐射光谱。

By comparative experiments it is found that silica glass doped with proper amounts of CeO 2 can strongly absorb ultraviolet radiation of xenon plasma at 320 nm and improve the radiation spectra of xenon flashlamps .

CO2激光作用下运动石英玻璃的温度分布

Temperature distribution of moving quartz glass heated by CO_2 laser

Zn离子注入石英玻璃纳米颗粒的形成及演化

Fabrication and Thermal evolution of Nanoparticles in SiO_2 by Zn Ion Implantation

腐蚀法研究掺Er熔融石英玻璃的真空热极化

Etching Study of Thermally Poled Er-doped Fused-silica Under Vacuum

石英玻璃与HF酸反应动力学的研究

Study on reaction kinetics between silica glasses and hydrofluoric acid

Cu离子注入石英玻璃及退火后的透射率研究

A Transmittivity Study of the Influence of Ion Dose and Annealing Temperature in SiO_2 Glass Implanted with Cu

采用溶胶-凝胶法在石英玻璃衬底上使用旋转涂覆技术生长了ZnO薄膜。

Zinc oxide films are prepared on quartz substrates by the sol-gel process using a spinning-coating technique .

微波等离子CVD法在石英玻璃上生长金刚石薄膜

Diamond Films Growth on the Quartz Glass by MWCVD

结果表明，加入适量的H3BO3或H3PO4有助于试样的烧结，随着烧成温度的提高，加入物可抑制石英玻璃的析晶。

The results indicated that the additives H_3BO_3 and H_3PO_4 promoted the sintering of quartz , but inhibited the crystallization of quartz glass .

石英玻璃中顺磁缺陷中心的ESR成像

ESR Imaging of Paramagnetic Defect Centers in Quartz Glass

Ag，Cu离子注入石英玻璃光学吸收谱研究

Theoretical Simulation and Experimental Research of the Optical Absorption Spectra of Ag , Cu Ion Implantation in Silica Glasses

采用将反应物沉淀后涂层及高温固相反应，在石英玻璃衬底上沉积了Cu/Al原子比不同的p型透明导电铜铝氧化物。

P-type transparent conducting copper aluminum oxide samples with different Cu / Al ratio were prepared by the sedimentation of cupric acetate and aluminum acetate at high temperature and solid-phase-reaction .

采用射频磁控溅射方法，在石英玻璃基片上制备了Ge2Sb2Te5相变薄膜。

Using a radio-frequency magnetron sputtering method , Ge_2Sb_2Te_5 films were grown on quartz substrates at room temperature .

CVD技术也是石英玻璃生产、试验过程中所采用的重要方法之一。

CVD technology is also a significant method in the production , testing process of quartz glass .

为控制石英玻璃与HF酸的反应，实现石英玻璃精密元件的化学蚀刻，系统研究3类石英玻璃与HF酸反应的动力学过程。

The kinetic mechanism of the reaction between three kinds of silica glasses and HF acid solution was investigated systematically .

利用干法真空石英玻璃管合成实验方法成功地构筑了CuBiTe三元系400℃时的相平衡图。

Studies of phase diagrams of the Cu-Bi-Te system were conducted under dry experiment conditions by evacuated silica tube technique at 400 ℃ .

通过对铅玻璃和石英玻璃的X射线光电子能谱的详细研究，发现硼离子注入后氧和硅的结合能峰稍有位移。

Based on the study of X-ray photoelectron spectroscopy of lead glass , it is found that the binding energy peaks of oxygen and silicon slightly shifted after implantation .

采用溶胶-凝胶法于ITO导电玻璃和石英玻璃基底上制备了均匀透明的TiO2多孔纳米薄膜。

The uniform transparent porous nanocrystalline TiO_2 films were prepared on ITO conductive glass and quartz glass substrates by sol-gel method .

用ESR成像方法探测了石英玻璃杜瓦受紫外光辐照后产生的局部晶格缺陷&F心的空间分布情况。

The spatial distributions of paramagnetic defect centers F centers in quartz Dewar after UV-irradiation were detected by ESR imaging method .

用椭偏仪和透射光谱分别测量并计算了制备在Si（111）、石英玻璃基片上薄膜的折射率。

The refractive index of the films fabricated on the Si ( 111 ) and fused quartz glass was measured and calculated by the ellipsometry and optical transmission spectra respectively .

石英玻璃衬底有利于紫外光发射，Si衬底有利于蓝光发射，薄膜的发光由缺陷能级引起。

Quartz glass substrate is conducive to UV light emission , Si substrate is conducive to blue light emitting and the luminescence of thin film caused by the defect levels .

利用溅射-气体-聚集（SGA）共沉积法，分别在方华膜和光学石英玻璃衬底上制备了Cu团簇嵌理在CaF2介质中的Cu／CaF2复合团簇镶嵌薄膜样品。

The Cu / CaF_2 composite cluster embedded films were grown on both formvar foil and quartz glass sub-strates respectively with sputter-gas-aggregation ( SGA ) co-deposition .

在石英玻璃上MPCVD制备金刚石薄膜

Grow Diamond Film on Quartz Glass Using MPCVD

K9玻璃与熔石英玻璃中纵向受激布里渊散射的脉宽压缩和能量提取效率

Experiments of Stimulated Brillouin Scattering for Pulse Compression and Energy Reflectivity in K9 Glass and Fused Silica

采用射频共溅射技术在石英玻璃和硅片衬底上制备出GeSiO2复合薄膜，然后在真空气氛中进行热处理。

Ge SiO 2 composite films have been prepared on quartz glass substrates and silicon ( 100 ) wafers by rf cosputtering technique and post annealing treatment in vacuum atmosphere .

经过在光滑的石英玻璃表面（载玻片）吸附聚四氟乙烯（PTFE），可以将水润湿性的石英表面的接触角从15。增大到138。

The smooth surface of quartz glass ( glass slide ) was absorbed with polytetrafluoroethylene ( PTFE ), whose contact angle increased from 15 ° to about 138 ° .

利用溶胶-凝胶法在石英玻璃表面制备出一层折射率可调的SiO2-TiO2光催化薄膜。

The SiO_2-TiO_2 thin films were prepared by sol-gel dip coating .

通过CO2激光器熔融不同直径的熔锥光纤以得到相应直径的石英玻璃微球，利用此微球和熔锥光纤，构造了球微腔耦合系统。

The quartz microspheres with different diameters are fabricated by melting the taper fibers with corresponding diameters using CO2 laser . The spherical microcavity coupling system is constructed with taper fiber and the quartz microsphere .

通过X射线衍射分析了样品薄膜的结构和结晶情况，结果表明，本实验在硅片和石英玻璃衬底上制备的Er掺杂ZnO薄膜具有高度C轴择优取向性。

We analysis of the structure and crystallization of the sample film with X-ray diffraction , the result indicates that Er-doped ZnO thin films prepared on silicon and quartz glass substrate have a high degree of C-axis preferred orientation .