淀积

物理喷束淀积技术制备的C（60）薄膜的光学性质

Optical properties of c_ ( 60 ) film fabricated by physical jet deposition

用逐层淀积法制备a－Si∶H薄膜

A-Si : H Thin Films Prepared by Layer-by-Layer Deposition

讨论了制备高电导宽带隙p型Si：H膜的淀积条件。

Technological condition for preparing high conductivity wide optical bandgap p-type film is reported .

氧气放电辅助激光淀积原位制备高Tc超导薄膜

In situ preparation of high To superconductive films using plasma assisted laser ablation

图形衬底上硅区双离子束选择淀积Co研究

Selective Deposition of Cobalt on Patterned Substrate by Dual Ion Beams Techniques

计算中用了格林函数方法和平均T-矩阵近似，结果表明：（I）在Cu衬底上淀积Ni薄层，化学吸附加强；

The Green function method and the average T-matrix approximation are used .

物理喷束淀积制得的C（60）、C（70）等薄膜的拉曼和荧光光谱研究

Raman and Fluorescene Spectra of C_ ( 60 ), C_ ( 70 ) Film Fabricated by Physical Jet Deposition

空心阴极离子淀积TiN薄膜特性研究

Properties of TiN Films Prepared by a Hollow Cathode Discharge System

淀积在不同小倾角蓝宝石衬底的n型GaN的研究

Investigation of n-type GaN deposited on sapphire substrate with different small misorientations

低温等离子复合技术淀积Al2O3膜的研究

Study of Al_20_3 Films by Low-Temperature Plasma Multiple-Unit Technology Deposition

原子层淀积Al2O3薄膜的热稳定性研究

Thermal Stability of Atomic Layer Deposition Al_2O_3 Thin Films

原子层淀积Al2O3薄膜表面自组装Au纳米颗粒及其热稳定性

Self-assembly growth and thermal stability of Au nano-particles on atomic-layer-deposited Al_2O_3 film

A-Si∶O∶H薄膜的淀积速率及折射率

The deposition velocity and reflection index of a-Si : O : H

聚乙烯醇缩甲醛膜上淀积Au，Pd和Ag薄膜的显微结构研究

The Microstructure Investigation of An , Pd and Ag Films on Polyvinyl Formal

PECVD法低温淀积SiCx薄膜的防水汽扩散性能研究

Moisture-Resistance Properties of SiC_x Thin Films Deposited by PECVD at Low Temperature

Ta2O5和Al2O3薄膜的离子辅助淀积

Ion-assisted deposition of Ta_2O_5 and Al_2O_3 thin films

在GaAs上用电子束蒸发淀积LaB6薄膜及其界面的电学特性

Lab_6 film deposited on GaAs by electron beam evaporation and its interface electronic characteristics

CVD钨的淀积和性质研究

Study of the Deposition Technique and Properties of CVD Tungsten Films

淀积大晶粒Pb膜的研究

Deposition of large grain lead films

Si3N4膜气相淀积的最佳工艺条件的选择和应用

Choice and Application of Optimal Technical Parameters in Preparing CVD Si_3N_4 Films

GaAs化学汽相淀积的热力学分析&Ga/AsCl3/H2/IG系统

Thermodynamic Analysis for GaAs CVD : Ga / AsCl_3 / H_2 / IG System

蒸发淀积Al和TeflonAF薄膜间的相互作用

Interaction between aluminum deposited by evaporation and Teflon AF film

理论分析表明，其生长规律与注入过程的能量淀积密度Δv有关，当Δv很大时x∝（？）

By theoretic analysis . We found that it 's growth rule is related with energy deposited density Δ _v .

InSb上化学汽相淀积SiO2界面形成的X射线光电子谱研究

XPS study of interface formation of CVD SiO_2 on InSb

Se低能中性团簇束流淀积

Low energy se cluster beam deposition

RF溅射淀积Ce∶YIG磁光薄膜的热处理结晶化研究

A Study on Recrystallization-annealing of RF-sputtering Deposited Ce ∶ YIG Magneto-optic Thin Films

低温Hg敏化光化学气相淀积Si3N4薄膜

Low-temperature Hg sensitized photochemical vapor deposited si_3n_4 films

常压CVD淀积非晶硅薄膜的研究

The Studies on the Amorphous Silicon Thin Films Deposited by CVD at Atmosphere Pressure

硼预淀积对自组织生长Ge量子点尺寸分布的影响

Effect of boron pre-deposition on size distribution of self-assembled Ge islands fabricated by UHV / CVD

铌硅锰非均匀形核表面淀积掺杂PTC陶瓷

Barium titanate based PTC ceramics doped by Nb-Si-Mn heterogeneous nucleation surface deposition method