掩模

介绍了金刚石膜在下一代X射线光刻掩模中应用的必要性；

Diamond films are essential to next generation X-ray lithography mask .

X射线镂空硅掩模在同步辐射X射线深层光刻中的应用

Application of X-ray stencil silicon mask in synchrotron radiation X-ray deep lithography

同步辐射X射线光刻掩模镀金工艺的研究

Research on Process of Mask Au-Plating in Synchrotron Radiation X-Ray Lithography

同步辐射X射线光刻中热辐射引起掩模畸变的研究

Study of Mask Distortion Caused by Thermo-Radiation in Synchrotron Radiation X-Ray Lithography

X射线光刻掩模后烘过程的瞬态热分析

Transient Thermal Analysis of X-ray Lithography Mask during Post-exposure baking

X射线光刻掩模背面刻蚀过程中的形变仿真

Simulation of X-ray Lithography Mask Distortion during Back-etching

用白光空间滤波系统检查IC掩模缺陷

Spotting IC Photomask Defects by Using White Light Spatial Filter Processor

具有交替型相移掩模技术的CAD系统

CAD System Adopting Alternating Phase-Shift Mask Technology

IC掩模的频谱分析及方向性空间滤波器

Frequency analysis of IC photomask and directional spatial filter

Cr掩模在硅湿法刻蚀中的应用研究

Application of Cr Mask in Si Wet Etching

利用单频时间掩模函数降低OFDM的功率峰均比

Reduction of peak-to-average-power ratio in OFDM systems using the single-frequency-temporal mask function

基于非线性反锐化掩模算法的CR图像边缘增强

Non-linearity edge enhancement method of CR image

采用该掩模，可进一步解决深X射线光刻中的重复对准多次曝光问题。

The overlay or multi exposure in deep X ray lithography could be well solved using the mask .

在常规PID控制系统基础上增加了掩模台精动滑模同步控制器。

A sliding mode synchronization controller of the reticle stage was added to the conventional PID control system .

利用相同的有限元技术，对X射线光刻掩模的背面开窗、Si片刻蚀过程进行数值仿真。

The same FE technique was used for the simulation of backside window-opening process and Si wafer back-etching process .

这种研究方法对其他同步辐射光源和等离子脉冲X射线作用下的掩模畸变研究都是普遍适用的。

This research approach is applicable to the mask distortions caused by the other synchronous radiation sources and plasma source .

阐述了X射线镂空硅掩模的研制及其在同步辐射深层光刻中的应用。

The fabrication of X-ray stencil silicon mask and its application in X-ray deep lithography are presented in this paper .

采用移相掩模技术实现≤0.2μmi线光刻

0.2 μ m or Less i-Line Lithography by Phase-Shifting-Mask Technology

把Laws掩模和花纹图像卷积后计算的能量作为纹理描述的一个特征量，实现初步的鞋印纹理分类。

The initial classification is made according to the Laws energy characteristic quantity calculated from the convolution of the template and the shoe print image .

在LiNbO3∶Fe晶体中，采用相位掩模对部分空间非相干和相干暗光伏孤子进行了实验研究。

Spatially partially incoherent and coherent dark photovoltaic solitons are comprehensively experimentally studied with phase masks in LiNbO_3 ∶ Fe crystals .

MEMS器件设计流程中，为优化MEMS器件，常常需要对MEMS掩模进行精化设计。

To optimize MEMS devices , incremental refinement of the MEMS masks is needed in MEMS design .

一种基于CMOS工艺的掩模ROM设计

A mask ROM design based on CMOS technology

开发了理论模型以验证有限元方法用于X射线光刻掩模刻蚀过程数值仿真的正确性。

An analytical model is developed to verify the numerical simulation for X-ray lithography mask etching process using finite element ( FE ) .

具有高透明SiO2移相器的新的移相掩模

New Phase-Shifting Mask With Highly Transparent SiO_2 Phase Shifters

与传统方法相比，直写技术（DirectWriting）由于具有无掩模、高柔性化、加工精度高、速度快、可靠性程度高、成本低以及适用的材料范围广泛等优点而倍受人们的重视。

In compare , direct writing technology has attracted great attention for the virtues of maskless , high-flexibility , high-precision , fast-fabrication , high-reliability , low-cost and wide-adaptability to materials .

STEPPER通用测试掩模的设计及使用

Design and Usage of STEPPER Universal Test Mask

本文介绍一种使用空间滤波的实时单一镜头白光信息处理系统来检查IC光刻掩模缺陷的方法。

A real-time one-lens white light information processing system is described in which spatial filtering is used to spot defects on IC photomasks .

对于分块DCT编码，提出了一个基于掩模插值的图像块修复算法。

For block - based DCT coding , an error concealment algorithm based on masked shift interpolation is proposed .

着重介绍了LIGA工艺中X射线光刻掩模的制作步骤和方法。

The paper introduces emphatically the making step and method of X - ray lithograph etching in LIGA technology .

SiO2作掩模时，在一定的条件下，CH4会与SiO2或者真空硅脂发生反应，生成聚脂薄膜。

Under certain condition , methane can reacts with SiO_2 or high vacuum grease , generating Mylar Polyster .