可制造性设计

用在可制造性设计中的光刻规则检查

Litho - Rule Checking Insertion into DFM Flow

可制造性设计是一种新颖的设计方法。

DFM is a novel design method .

IC可制造性设计基础与统计最优化方法

IC manufacturability design foundation and statistical optimization method

通孔插装PCB的可制造性设计

DFM of THT Processing Technology on PCB Designs

超大规模集成电路（VLSI）中的参数成品率最优化问题一直是集成电路可制造性设计的重点研究问题。

The maximum problem of parametric yield in VLSI is always an important issue in design for manufacturing ( DFM ) .

针对光刻的可制造性设计（DFM）在深亚纳米尺寸设计中已经广泛应用。

Litho-related design for manufacturing ( DFM ) has been widely used in nanometer scale .

本课题对亚微米MOS器件工艺、器件物理特性和可制造性设计与优化进行了深入探讨，为深亚微米层次的SOC一体化仿真与优化研究打下基础。

The thesis goes deep into the process , device physical characteristics , manufacturable design and optimization of sub-micron MOS devices . Prepares for the research of system-on-a-chip ( SOC ) integrative simulation and optimization in deep sub-micron process .

从可制造性设计（DFM）的定义和trilogy5000软件开始，说明了印制电路板（PCB）板级DFM的必要性。

In view of the definition of design for manufacture ( DFM ) and the valor software trilogy 5000 this paper explained the necessity of the DFM of printed circuit board ( PCB ) .

故该项研究为国内AlGaN/GaNHFET器件及相关集成电路的可制造性设计与优化研究开创了一定的工作基础，本项研究的水平位于国内同类研究的前沿。

Therefore , the work makes a certain basis of the DFM for AlGaN / GaN HFET and correlative integrated circuits , the work is at the forefront in the domestic similar studies .

面向产品生命周期的电子产品可制造性设计

Design for Manufacturability of Electric Product Oriented to Product Life Cycle

集成电路可制造性设计中器件参数的提取

The Device Parameter Extraction in the IC Design for Manufacturability

超深亚微米与纳米级标准单元的可制造性设计与验证技术

Design for manufacturability of sub - 100 nanometer standard cells

纳米级电路光刻建模及可制造性设计研究

Research on Optical Lithography Simulation and DFM for Nano-scale Circuits

用于纳米集成电路可制造性设计的测试结构版图生成器设计

Design of Test-Structure Layout Generator for Nanometer IC Design for Manufacturability Use

亚100纳米级标准单元的可制造性设计

Design for Manufacturability of Sub-100 Nanometer Standard Cells

描述了一种采用分辨率提高技术后用于可制造性设计的验证方法。

We describe a post resolution-enhancement-technique verification method for use in manufacturing data flow .

印制电路板可制造性设计评价模型与知识库

Evaluation Model & Knowledge-Base of PCB DFM

基于可制造性设计研究及测试芯片设计

DFM Based Research and Test Chip Design

微波印制板可制造性设计问题探讨

Design for Manufacturability of Microwave Printed Boards

表面贴装领域中的可制造性设计技术

Design for Manufacture Technology in SMT

插装线路板的一些可制造性设计考虑

Manufacturing Design Consideration for PC Board

军用加固计算机电子模块的可制造性设计

Strengthening Military Computer Module DFM

介绍了以RET/OPC为核心的可制造性设计。

Design for manufacturing by the core for resolution enhancement technology / optical proximity effect correction is introduced .

针对零件的可制造性设计，研究制造信息的获取与表达方法。

According to design for manufacturability of the parts , the method was studied to access representation of manufacturing information .

讨论了90/65nm芯片设计采用可制造性设计的必要性和优势。

In this paper , necessity and benefit to adopted design for manufacturing in 90 / 65 nm chip design are discussed .

可制造性设计技术是连接设计和制造的桥梁，通过这个接口，原本棘手的影响成品率的问题正在被一一解决。

DFM is a bridge connecting both design and manufacturing . Based on this interface , some problems really affecting yield are being solved .

基于该设计流程，分析总结了一些纳米级工艺条件下适合在成品率较低的工艺初始阶段应用的可制造性设计规则。

Based on this framework , some recommended design rules which are fit on the beginning of low yield process in nanometer process are summarized .

随着工艺节点的推进，可制造性设计中的版图热点管理技术越来越受到业界的重视。

As the technology node moves forward , hotspot management , one of Design for Manufacturability ( DFM ) techniques , gets more and more attentions .

在确定性最优化框架下，该模型为统计最优化和集成电路可制造性设计的进一步发展开辟了新途径。

Based on the frame of deterministic optimization method , the general statistical optimization method can be improved further by the model proposed in this paper .

硅片上互连线几何变异提取对于超深亚微米工艺节点下集成电路可制造性设计研究开发极其关键。

Interconnect geometric variation extraction is a key factor for the integrated circuit design for manufacturability research and development , under ultra deep sub-micro process nodes .