因此，用此二酸、二乙烯基醚和产酸剂可组成一种正型的光致抗蚀剂，当用254nm的低压汞灯曝光时，其感度在30mJ/cm2以下。
A positive photoresist could be formed by the diacid , divinyl ether and PAG . The measured photosensitivity is less than 30 mJ / cm ~ 2 when exposed to low pressure Hg lamp ( 254 nm ) .
二乙烯基醚