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zrn

  • 网络氮化锆;氮化锆陶瓷靶材;原点回归;回参考点;原点复归
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  1. Study of the erosion and friction properties of ZrN films

    氮化锆薄膜腐蚀和摩擦性能的研究

  2. At present there has a lot of deposited methods about ZrN .

    目前关于氮化锆薄膜的制备方法很多,直流反应溅射技术由于存在着阳极消失和迟滞效应的缺陷,严重的影响了薄膜的沉积速率。

  3. Chromatic prediction model based on artificial neural network for ZrN films

    基于人工神经网络的氮化锆薄膜颜色预测模型

  4. Influence of Copper Sputtering on Thermal Stability of ZrN Diffusion Barrier

    溅射Cu膜方式对ZrN扩散阻挡层热稳定性的影响

  5. Effect of Nitrogen Partial Pressure on Color of ZrN

    氮分压对氮化锆薄膜颜色的影响规律研究

  6. Process and Property of the ZrN Coating Made by Vacuum Arc Ion Plating

    真空电弧离子镀ZrN涂层的工艺与性能

  7. Preparation and Performance of the ZrN Films on Dental Materials

    口腔材料表面氮化锆薄膜制备工艺与性能

  8. And the deposition rates of both TiN and ZrN also change .

    TiN和ZrN层的沉积速率随调制周期的变化而变化。

  9. Effect of Solid Particles Erosion on Erosion Resistance of ZrN Coated Titanium Alloy

    固体颗粒冲蚀对钛合金ZrN涂层抗冲蚀性能的影响

  10. Influence of Substrate Direction on Properties of Multi-arc Ion Plating ZrN Coatings

    基片方向对多弧离子镀ZrN涂层性能的影响

  11. The Effects of Negative Substrate Bias Sputtering on the Characterization of ZrN Film

    衬底负偏压溅射对ZrN薄膜性能的影响研究

  12. Colority and technological parameters in preparation of ZrN thin films

    氮化锆薄膜色度特性与工艺参数研究

  13. ZrN Films Deposited by the Technology of The Intermediate Frequency Reactive Magnetron Sputtering

    采用中频反应磁控溅射技术沉积氮化锆薄膜

  14. Effect of the Diluent on the Combustion Synthesis of ZrN

    稀释剂对燃烧合成ZrN的影响

  15. Tribological Performance of ZrN Ceramic Thin Films with Ti Additions

    掺杂不同钛含量氮化锆薄膜的制备及其摩擦性能研究

  16. Research on Microstructure and Property of ZrN Film on HSS Surface by Vacuum Arc Depositing

    高速钢表面真空电弧沉积ZrN薄膜的组织与性能研究

  17. Effect of interface and preferred orientation on the hardness of TiN / ZrN multilayers

    界面和择优取向对TiN/ZrN纳米多层膜硬度变化的影响

  18. The air oxidation experiments revealed that yttrium ion implantation could greatly the oxidation resistance of ZrN coatings .

    钇离子注入能够改善ZrN膜层的抗氧化性能。

  19. ZrN / Si_3N_4 multilayers with different Si_3N_4 thickness were synthesized by reactive magnetic sputtering .

    一系列不同Si3N4层厚度的ZrN/Si3N4纳米多层膜通过反应磁控溅射法制备。

  20. All multilayered coatings had lower compressive stress than the average value of ZrN and W monolithic coatings .

    多层膜的压应力都低于两单质薄膜应力的平均值。

  21. Synthesis of Multilayered Gradient CrN / ZrN Film s

    CrN/ZrN多层梯度薄膜的合成

  22. TiN / ZrN multilayers with different modulation periods were grown by reactive RF magnetron sputtering .

    利用射频反应磁控溅射方法,设计并制备了一系列不同调制周期的TiN/ZrN纳米多层膜。

  23. The results show that ZrN / n-GaAs Schottky bar-riers have excellent electrical characteristics and thermal stability .

    结果表明ZrN/GaAs势垒有良好的电特性和高温稳定性。

  24. It was found that ZrN coating is mainly composed of ( 111 ) preferred orientation of ZrN phase ;

    结果表明,ZrN涂层成分主要为(111)择优取向的ZrN相;

  25. Corrosion behavior of ZrN gradient and Zr / ZrN multilayer coatings deposited by cathodic arc ion plating

    阴极电弧离子镀ZrN梯度膜和Zr/ZrN多层膜的腐蚀特性

  26. Multilayered gradient CrN / ZrN films were synthesized by means of DC magnetron stuttering .

    利用直流磁控溅射技术,应用双靶轮流反应溅射工艺,制备了CrN/ZrN多层梯度薄膜。

  27. Crystallization of Si_3N_4 and superhardness effect of ZrN / Si_3N_4 nano-multilayers

    Si3N4的晶体化和ZrN/Si3N4纳米多层膜的超硬效应

  28. Cu film deposited on ZrN and TaN diffusion barriers is annealed in vacuum and H2 , N2 mixed gas respectively .

    沉积在ZrN,TaN阻挡层上的Cu膜分别在真空和氢气、氮气的混合气氛下退火。

  29. Characteristics of ZrN / n-GaAs Schottky Barriers

    ZrN/n-GaAs肖特基势垒特性研究

  30. When the temperature is lower than 500 ℃, both TiO_2 / ZrO_2 and TiN / ZrN can be found in the multilayer .

    当退火低于500℃时,多层膜表面的几层被氧化成TiO2/ZrO2多层膜,但内层仍为TiN/ZrN多层膜;