sputtering

美 [ˈspʌtərɪŋ]英 [ˈspʌtərɪŋ]
  • v.气急败坏地说;(引擎、灯或火)发噼啪声;急促而语无伦次地说
  • n.噼啪声
  • sputter的现在分词
sputteringsputtering

sputtering

频次

  • 1
    VERB (发动机)发出噼啪声;(火焰)发出毕剥声
    If something such as an engine or a flame sputters, it works or burns in an uneven way and makes a series of soft popping sounds.

    The truck sputtered and stopped...

    卡车噼啪响了几声停下了。

  • 2
    VERB (过程、行动或事态)缓慢不稳地进行,慢慢结束
    If a process, action, or state of affairs sputters, it progresses slowly and unevenly or starts to end.

    The economy is already sputtering, with low or no growth...

    经济发展速度已经放慢,增长率很低,或者根本没有增长。

  • 3
    VERB (尤指因生气、震惊或激动)结结巴巴地说话,语无伦次地说话
    If you sputter, you speak with difficulty and make short sounds, especially because you are angry, shocked, or excited.

    Stunned, I sputtered, 'What do you mean?'...

    我大吃一惊,结结巴巴地问道:“你是什么意思?”

noun

1
the noise of something spattering or sputtering explosively
he heard a spatter of gunfire
Synonym: spatter spattering splatter splattering sputter splutter

数据来源:WordNet

  1. The economy is already sputtering , with low or no growth

    经济发展速度已经放慢,增长率很低,或者根本没有增长。

  2. A wick was sputtering feebly in a dish of oil .

    瓦油灯上结了一个大灯花,使微弱的灯光变得更加阴暗

  3. Trend in development and applications of sputtering target materials

    溅射靶材的应用及发展趋势

  4. Calculations of sputtering yield of high Z materials target using a new local model

    用新局域模型计算高Z靶的溅射产额

  5. Research of Multiple Hollow Cathode Sputtering Target and Its Application

    多重空心阴极溅射靶及其应用

  6. Bonding of Target Material and Backing Plate for 9900 Sputtering System

    9900型靶材与靶托的连接技术

  7. Studies on Optimum Process Parameter of Magnetic Control Sputtering from Stainless Steel Target Material

    磁控溅射最佳工艺参数的研究

  8. The sputtering technology comes into the art of vacuum coating widely .

    溅射技术广泛的应用于真空镀膜中,以孪生溅射靶作为真空镀膜机中的电极(被镀物质),是镀膜生产中的一种新工艺。

  9. The study of ion sputtering mechanism on Cu - Au alloy

    关于Cu-Au合金溅射机制的研究

  10. Process of making sputtering target materials and the main applied cases are briefly discussed .

    本文简介溅射靶材的制造及主要应用情况。

  11. A Study of the High Rate Sputtering Type ECR Microwave Plasma Apparatus

    微波ECR等离子体高速溅射装置的研制

  12. Effects of nitrogen pressure on TiN films in three electrode reaction sputtering

    氮分压对三极反应溅射氮化钛膜的影响

  13. Structure and properties of TiN films prepared by facing targets sputtering

    对向靶溅射TiN薄膜的结构和物性

  14. Studying on Manufacture and Application of Sputtering Target Materials

    溅射靶材的制备及应用研究

  15. Research on Structure and Property of Si-Based Films Using Magnetron Sputtering

    磁控溅射法制备硅基薄膜的结构与性质研究

  16. A new Method of Saving GoLd & a combination of electroplating and sputtering

    一种新的节金方法&电镀与离子溅射相结合

  17. Sputtering mode transition of MgO thin film characterized by surface fractal

    反应磁控溅射MgO薄膜溅射模式的分形维表征

  18. Uses : sputtering target , physical vapor deposition , high temperature alloys .

    溅射靶材、物理气相沉积、高温合金。

  19. The kinetic process of reactive magnetron sputtering has been studied .

    研究了反应磁控溅射的动力学过程。

  20. The Effect of Magnetron Sputtering Growth Parameters on Optical Properties of ZAO

    磁控溅射制备参数对ZnO∶Al光学性能的影响

  21. Effect of addition of Boron on sputtering yield of nickel

    B掺杂对Ni原子溅射产额的影响

  22. Sputtering Effect on Life - time of Titanium Tritide Target

    离子溅射对氚钛靶寿命的影响

  23. Ion Collection Simulation by j × B Scheme With Collision and Sputtering

    考虑溅射和碰撞损失的j×B离子引出收集

  24. Study on the hysteresis effect in the reactive magnetron sputtering technics

    反应磁控溅射工艺中的滞后效应研究

  25. Deposition rate is an important parameter in magnetron sputtering and influenced by many factors .

    沉积速率是磁控溅射镀膜技术中的一项重要指标,它由许多因素决定。

  26. Sputtering yield calculation by Monte Carlo simulation with screening length of shell effects

    采用壳层效应屏蔽长度MonteCarlo方法计算溅射产额

  27. A New Method to Increase the Utilization Factor of Target by DC Planar Magnetron Sputtering

    提高DC平面磁控溅射中靶材利用率的新方法

  28. Preparation of Al-doped zinc oxide sputtering target materials and thin films

    氧化锌铝溅射靶材及其薄膜的制备

  29. Optical Properties of Gap Film Prepared by RF Magnetron Sputtering

    射频磁控溅射GaP薄膜的光学性能

  30. Deposition technology and properties of chromium oxide coatings by RF reactive sputtering

    射频反应磁控溅射制备氧化铬薄膜技术及性能