mpcvd

The nucleation behaviour of diamond films on Si ( 100 ) substrates is investigated with and without bias field by MPCVD .

探讨了用微波等离子体化学气相沉积法（MPCVD）在Si（100）衬底上加偏压电场和不加偏压电场情况下金刚石膜的成核行为。

The Rate of Nuclear Formation of Diamond Film by MPCVD Method

MPCVD金刚石薄膜形核率研究

Study on perturbation model of substrate heating materials ′ temperature fields in MPCVD

MPCVD中基片加热材料的温度场摄动模型研究

Application of magnetic mirror in direct coupler MPCVD diamond films device

磁镜场在直接耦合式微波等离子体CVD金刚石膜装置中的应用

A very important application areas is microwave plasma chemical vapor deposition ( MPCVD ) .

其中一个很重要的应用领域便是微波等离子体化学气相沉积（MPCVD）。

Preparation of optical level nano-crystalline diamond films on glass substrate by MPCVD method

MPCVD方法制备军用光学元件纳米金刚石膜

Numerical Simulation of Electromagnetic Field of MPCVD Reactor

MPCVD反应腔电磁场分布的数值模拟

Preparation and Characterization of Nanocrystalline Diamond Films by MPCVD Method

MPCVD法纳米金刚石膜的制备及分析

Effects of Si_3N_4 tool substrate pretreatment on quality of MPCVD diamond coating

Si3N4刀具基底预处理对MPCVD金刚石涂层质量的影响

Investigation on Traps in MPCVD Diamond Films by Thermal Stimulated Current Measurements

用热激发电流法研究金刚石薄膜中的陷阱

A Study on the Effect of MPCVD Technology of Electrical Properties of SnO 2 Thin Films

MPCVD法工艺特性对SnO2薄膜导电性的影响

An investigation of plasma spectrum in the process of diamond thin film deposited by MPCVD

MPCVD法沉积金刚石薄膜中等离子体光谱

The Influence of Hydrogen Concentration on the Chromaticity of MPCVD Diamond Films

氢气浓度对MPCVD金刚石膜色度的影响

Grow Diamond Film on Quartz Glass Using MPCVD

在石英玻璃上MPCVD制备金刚石薄膜

Composition and Structure of β - C_3N_4 Thin Films Prepared by MPCVD

MPCVD制备β-C3N4薄膜的成分和结构研究

The Effect of Experimental Conditions of MPCVD on the Field Emission Properties of Carbon Nitride Nanotube Films

MPCVD实验条件对碳氮纳米管薄膜场发射性能的影响

MPCVD single crystal diamond deposition process can be divided into two stages : nucleation and crystal growth .

MPCVD沉积单晶体金刚石的过程可以分为金刚石的成核和晶体生长两个阶段。

A Study on MPCVD of Thick Diamond Film on TWT Rod to Improve the Heat Dissipation

行波管夹持杆微波等离子体化学气相沉积金刚石厚膜改善散热性能研究

Within the layer the copper ? COPPER Growth of High Quality Diamond Films on Cu Metal Substrates by MPCVD

高质量金刚石膜在无氧铜衬底上的MPCVD

Preparation and Properties of Polycrystalline and Single-crystal Diamond by MPCVD

MPCVD法制备多晶和单晶金刚石及性质研究

An overview on using microwave plasma chemical vapor deposition ( MPCVD ) for the growth of high quality diamond films was given .

综述了微波等离子体化学气相沉积（MPCVD）法制备金刚石膜技术，表明MPCVD是高速、大面积、高质量制备金刚石膜的首选方法。

By microwave designing for substrate heating materials , the larger uniform temperature field areas than the diameter of substrate holder in MPCVD device is obtained .

通过对基片加热材料的微波设计，在MPCVD装置中获得大于基片台直径的均匀温度分布区。

Based on these results , a kinetic model for diamond nucleation in MPCVD system was proposed . The critical gas pressure corresponding to the highest nucleation density was also discussed .

在此基础上，提出一种MPCVD系统中金刚石成核的动力学模型，并指出对应于最高成核密度有一临界压强存在。

In the present work , diamond films were deposited on Co-deficient Cemented Tungsten Carbide by microwave plasma chemical vapor deposition ( MPCVD ) .

本文采用低Co硬质合金作为金刚石薄膜的基体材料，用微波等离子体化学气相沉积法（MPCVD）沉积金刚石薄膜。

Raman Spectro-analysis of MPCVD Diamond Films

MPCVD金刚石的Raman光谱分析

The [ 100 ] oriented texture growth diamond films on ( 100 ) mirror polished Si have been achieved by microwave plasma chemical vapor deposition ( MPCVD ) system .

采用微波等离子增强化学气相沉积法在（100）镜面抛光的硅片衬底上实现了金刚石薄片[100]定向织构生长。

KW antenna coupled MPCVD setup with a quartz vacuum window and water cooled stainless steel reaction chamber for higher depositing rate and lager depositing square was developed in China for the first time .

为了获得金刚石薄膜的高速率大面积沉积，在国内首次研制成功了5kW带有石英真空窗的天线耦合水冷却不锈钢反应室式MPCVD装置。

In the present work , diamond coatings were deposited on the cobalt-cemented tungsten carbide ( WC-6 % Co ) tool inserts by microwave plasma CVD ( MPCVD ) method .

本文在大量文献调研的基础上，采用微波等离子体CVD（MPCVD）法在YG6硬质合金（WC-6%Co）刀具基体上沉积金刚石涂层。

Microwave plasma chemical vapor deposition ( MPCVD ) , a kind of chemical vapor deposition method with low temperature , low intensity of pressure and clearance , is commonly used for the growth of diamond thin films .

微波等离子体增强化学气相沉积法（MPCVD法）是众多低气压下激活CVD工艺方法的一种，也是目前在国内外比较流行的制备金刚石薄膜的工艺方法之一。

A novel passivation technology of porous silicon ( PS ) surface , i.e. , depositing diamond film on the PS surface by microwave plasma assisted chemical vapor deposition ( MPCVD ) method , was developed .

提出了一种新颖的多孔硅表面钝化技术，即采用微波等离子体辅助的化学气相沉积（MPCVD）方法在多孔硅上沉积金刚石薄膜。