金属膜

从1988年起，EBG公司主要生产高可靠和高精度的精密金属膜电阻器；2000年起，EBG公司引进奥地利EBG-K公司的先进技术，开始生产高频无感厚膜大功率和高压电阻器。

From 1988 , EBG SHENZHEN LTD mainly worked for high reliable & precision metal film resistors . In 2000 EBG SHENZHEN LTD imported the high technology from EBG-K , started the products of non-inductive style thick film high power and high voltage resistors .

电解氧化腐蚀使电阻器金属膜局部或全部破坏是电阻器耐湿失效的原因。

The failure of high humidity resistance for resistor is attributed to part or complete damage of metal film on resistor by electrolytic oxidation corrosion .

分析了金属膜的成分，确定金属膜由Fe、Ni、Mn、Mg构成；

The composition of the metal film which consist of Fe , Ni , Mn , Mg , has been confirmed .

MeV重离子轰击引起金属膜抗蚀性的研究

Study on the Corrosion Resistance of Metal Film Produced by MeV Heavy Ion Bombardment

微波集成电路（MIC）中Au/NiCr/Ta多层金属膜粗糙化机理的AFM研究

Atomic Force Microscopy Study of Surface Roughening of Au / NiCr / Ta Multilayers in Microwave Integrated Circuits

采用原子力显微镜和X射线衍射仪研究了Al2O3基体上磁控溅射Au/NiCr/Ta多层金属膜基础上化学镀Au膜的生长形貌、晶体取向和残余应力，并与磁控溅射Au膜进行了对比。

Au / NiCr / Ta multi-layered metal films were deposited on Al_2O_3 substrate by magnetron sputtering and then Au film was chemically plated .

SIMS研究人造金刚石与金属膜的界面结合强度

The Study on Atomic Binding Intensity Of Artificial Diamond / Metal Film Interface by SIMS

电沉积Cu-Ni多层金属膜的结构特征及摩擦学性能

Structural and tribological characteristics of electrodeposited Cu-Ni multilayer films

本装置制作的薄膜膜厚均匀区宽、膜质好，不仅适用于ZnO薄膜的小批量生产，也可用于溅射沉积其它各种介质膜和金属膜。

This kind of sputtering equipment is not only suitable for mass production of ZnO films , but also for the sputtering deposition of other dielectric or metal films .

在PS／S膜上再淀积一层具有一定图形的铝金属膜并焊接引线，形成了M－PS－S二极管结构；

A layer of metal Aluminum is deposited on the PS / S , and leads are then welded on to give three different structures of M-PS-S diodes .

Collins于1975年提出，可以测定单面镀金属膜的驻极体的总电荷量以及它的平均位置。

Collins in 1975 , is able to determine the total charge and its mean position in one-sided metallized thin polymer electret .

激光诱导硅基Al-Ti金属膜构建各向异性表面及其浸润特性

Wettability on the anisotropic surface structure of Si-based Al-Ti layers induced by pulse laser

但是其折射率分辨率对金属膜厚度非常敏感，影响了SPR传感器的适用性。

However , this RI resolution is very sensitive to the thickness of metal films , deteriorating the adaptability of SPR sensors .

结果表明频域PTR技术可以较准确的测量金属膜材料的热扩散率。

The results show that the frequency-domain PTR method could accurately measure the diffusivity of metal film material . 3 .

采用spex8000M型高能球磨TiH2粉末和机械涂膜方法可制得最大气泡孔径为6μm，平均流动孔径为1μm的多孔金属膜。

Metal membrane is prepared by machinery .

目前广泛应用的氢分离膜就是钯基金属膜，如Pd-Ag，Pd-Cu等合金薄膜。

Pd-based membranes , such as Pd-Ag and Pd-Cu , have been widely used in the hydrogen separation industry .

实验结果表面，偏振干涉能够降低SPR光谱的最小值，提高使用非最佳金属膜的SPR传感器的折射率分辨率。

That the PI technique could reduce the minimum of the SPR spectrum is experimentally demonstrated , and the RI resolution of the sensors with non-optimal metal films is improved .

导出了这种叠加结构介质镜的反射率公式。设计的制作流程能够兼容SOI片和普通硅片，兼容介质膜和金属膜。

The formula of reflectance of the dielectric mirror is derived . In the thesis , the fabrication processes is compatible with SOI and ordinary silicon wafer , dielectric mirror and metal mirror .

因而利用SPW技术可以精确地确定金属膜及其表面污染层的光学常数。

Thus , the optical constants of metallic films and contamination layers on its surface could be determined precisely by using the SPW technique .

利用现有的工艺条件，在MOLED的制作中采用了金属膜以替代介质膜和阳极。

In making MOLED , metal film substitutes dielectric films and anode according to technical conditions .

用于产生表面等离子体的金属膜作为电化学研究中的工作电极，在同一条件下进行现场原位电化学和SPR测试，同时获得关于电化学和光学方面丰富全面的信息。

The gold film that excites the surface plasmons is used as working electrode in the electrochemical cell . Both electrochemical and optical information are simultaneously obtained by in situ electrochemistry and SPR tests .

在半导体分析中XRF法的显著特征是能分析各种薄膜（氧化膜、硅化物膜、金属膜等）；

The prominent features of the XRF method for semiconductor analysis are as follows : ( 1 ) Many types of films such as oxides , silicides and metallic alloy films can be analyzed .

表面等离子振荡有两种耦合结构，一种是按棱镜-金属膜-空气排列的Kretschmann耦合结构，另一种是按棱镜-空气-金属排列的Otto耦合结构，实验中所采用的是Otto结构。

Surface Plasmon Resonance has two kind of modulation couple mode , one is prism-metal-vacuum Kretschmann configuration , the other is prism-vacuum-metal Otto configuration , experiment adopted Otto configuration .

考虑了光线入射到金属膜上时存在的相位变化，理论上计算了金膜的相位变化，并提出了相位匹配层（PML）。

Considering the phase change when the light reflects from the metal film , the phase change of Au film has been calculated , and a phase matching layer ( PML ) has been proposed .

此外，通过在金属膜的下表面覆盖等周期的电介质光栅，动态调节光栅的折射率，可将捕获的SPPs逐一释放。

In addition , by using another uniform dielectric grating attached to the bottom of the metal film and real-time tuning the refractive index of the grating , the trapped SPPs can be released in sequence .

用Auger电子能谱技术分别进行金刚石单晶生长界面的金属膜表面及附近碳原子的精细Auger谱分析、金刚石单晶附近及其表面的Auger谱精细结构分析。

Auger electronic energy spectrum was applied in the paper to analyze the metallic film surface of growing interface of diamond monocrystal and fine Auger spectrum of adjacent carbon atom , as well as Auger spectrum structure of the surroundings and surface of diamond monocrystal .

本文为测量金属膜的厚度提供了一种新的用双波长的测量方法，该方法测量简便、精度高，同时也适用于透明介质膜的厚度测量，测量范围从几十个波长至1cm。

A new method of measuring metal film thickness is presented in this paper . The method is simple to operate and has high accuracy . The thickness of a transparent medium film can also be measured by it .

结果表明，在硅基底上构建的Al-Ti金属膜各向异性表面表现出水滴的前进角和后退角都较大，各向异性结构对其浸润性有明显的影响。

The wettability of anisotropic surface was discussed by the measure of water contact angle ( advancing an - gle and receding angle ) between the droplet and the directional channels . The results indicate the wettability of the Si-based surface with oriented Al-Ti metal microchannels shows anisotropic anisotropy .

在立方氮化硼的合成过程中发现了金属膜；

The metal films have been discovered on synthesised cBN surface .

测量金属膜粗糙度的表面等离子激元光谱方法

Surface Plasmon Spectroscopy for Measuring the Surface Roughness of Metallic Films