激光光刻

激光光刻与相移掩模

Laser photolithography and phase & shifting mask

用于KrF准分子激光光刻的衰减相移掩模

The Attenuated Phase-Shifting Mask for KrF Excimer Laser Photolithography

直接标刻采用的是非接触激光光刻，自动识别技术应用的是条码技术：一维条码选用code39码，二维条码选用矩阵式二维条码DataMatrix。

Directly mark adopt the non-contact laser mark technology meanwhile automatic identification use the bar code technology , 1D bar code adapt the code 39 , 2D bar code use the Data matrix .

ArF准分子激光光刻的研究现状

Research status of deep ultraviolet lithography with 193 nm excimer laser

基于SLM的三维图像激光光刻系统的研制

Fabrication of 3D Image Laser Printing System with SLM

用于100nm节点ArF准分子激光光刻的相移掩模技术

Phase-shifting mask for 100 nm node ArF excimer laser lithography

本文简述了准分子激光光刻的研究现状和光纤布拉格光栅的应用，详细介绍了利用紫外激光制作FBG的技术和相应准分子激光光源关键技术的发展。

This paper briefly introduced lithography status and applications of FBG , and discussed the formation technology of FBG with UV source and the crucial technological development trends about excimer laser .

利用方光点激光光刻系统分别制作了两台阶和四台阶的倾斜多焦点Fresnel二元光学元件，给出了实验结果并进行了分析。

We fabricate the tilted multi-focus Fresnel binary optical elements of two phase levels and four phase levels using square-shaped spot photolithographic systems . The experimental results are given .

随着深紫外准分子激光光刻技术的发展，所用CaF2光学晶体镜头材料的加工对传统的冷加工技术提出了挑战。

With the development of far UV laser lithography technique , the processing of CaF2 single crystals lens material challenged traditional cool procession technique .

准分子激光光刻是21世纪提高超大规模集成电路（VLSI）集成度的一项关键技术，而近年来基于准分子紫外光源制作光纤布拉格光栅元件（FBG）的技术日益成为国内外的研究热点。

Excimer laser lithography is the key technology to improve VLSI integrity scale in 21 century , and fabrication of Fiber Bragg Grating ( FBG ) based on excimer laser irradiation become the research hotspot in home and abroad .

激光光刻中的超分辨现象研究

Research on Phenomenon of the Super Resolution in Laser Lithography

激光光刻机是一种矮科技的制卡和会员卡制作摆设。

Laser etching machine is a high-tech business card printing and membership card .

研制了大幅面激光光刻系统，给出了实验结果。

The large format laser lithographic system has been fabricated and the result is given .

深亚微米激光光刻研究

Deep Submicron Excimer Laser Lithography

激光光刻是加工微光学及二元光学掩模的主要手段。

Laser lithography is one of the main methods for manufacturing micro-optical and the binary optical masks .

研制了一种在衍射光变图像器件上进行信息存储的新型数字化激光光刻系统。

A novel digital laser lithographic system has been fabricated for storing optical information on the diffractive optical variable image device ( DOVID ) .

介绍了激光光刻、激光和各向异性腐蚀相结合加工硅三维结构、激光化学处理加工金属微型结构和激光沉积技术。

Laser-beam lithography , combination of laser machining and following anisotropic etching to fabricate 3D structure , micromachining of metals by laser chemical processing in liquids and laser deposition technology are presented in this paper .

包括纳米压印、激光干涉光刻、x射线光刻、电子束光刻、聚焦离子束刻蚀等。

The novel methods include nano-imprint , laser interference lithography , x-ray lithography , electron beam lithography , focused ion beam and so on .

准分子激光深层光刻蚀在LIGA工艺中的应用

The Application of Excimer Laser Deep Lithography in LIGA Process

KrF准分子激光移相光刻在HEMT栅加工中的应用

KrF Excimer Laser Phase-shifting Lithography in HEMT Fabrication

紫外激光曝光光刻SU-8胶的工艺研究

Research of SU-8 Resist Lithography Using Ultraviolet Laser

第四章介绍了激光LIGA光刻实验装置的总体设计以及各单元部件的研制情况。

In chapter four , the system design of Laser LIGA Lithography Apparatus and unit design are introduced .

采用梯形棱镜波前分割的激光干涉光刻技术

Laser Interferometric Lithography with Wavefront Divided by a Trapezoidal Prism

激光直接光刻制作微透镜列阵的方法研究

Microlens Array Fabrication by Using Laser Direct Lithography System

研究表明，激光干涉光刻具有大视场和分辨率高和视场宽等优点。

The re search shows that laser interferometric lithography has high resolution and large field .

最后在单一改变能量密度变量的条件下，对激光干涉光刻的极限尺度进行了研究。

The limiting feature sizes of laser interference lithography were investigated by changing the variable of energy density .

无掩模激光干涉光刻中的分束方法一般有波前分割和振幅分割。

The beam division method in maskless laser interference photolithography can be divided into wave-front division and amplitude division .

制备金属光子晶体方法包括：电子束刻蚀结合后续剥离法、激光干涉光刻结合干刻蚀技术等。

The fabrication methods of MPC include electron beam lithography with subsequent evaporation and lift-off , interference lithography with dry-etching technology etc.

研究结果将有利于获得理想图形所需干涉系统的设计和校准，尤其在激光干涉光刻方面的应用。

The results will be useful for the design and alignment of laser interference systems to obtain the desired patterns , in particular for laser interference lithography applications .

介绍激光干涉光刻的基本原理，对几种光束组合干涉方法给出了理论推导结果，并进行了计算机模拟。

The basic principle of laser interference photolithography is introduced in the paper . The theoretical derivative results for several beam combined interference methods are given and the computer simulation is carried out .