晶面

ITO膜沿（400）晶面择优生长。

The ITO film preferred orientation of crystal face ( 400 ) .

讨论了COD的形貌、晶面电荷及其与细胞膜粘附的研究进展。

The morphology , crystal face charges and the adherence to cellular membrane of COD were also discussed .

这些不同的晶面，具有很不相同的化学性质，特别是对化学腐蚀剂的反应不一致。

The chemical properties of these surface differ considerably , particularly in their reaction to etchants .

测量单晶硅片晶面弯曲的X射线方法

Measurement method of crystal plane bow in single crystal silicon by X-ray

Si（337）&另一个较稳定的高密勒指数晶面

Si ( 337 ) - a Stable and Intriguing High Miller-Index Surface

晶面择优取向ZnO纳米棒阵列膜的制备及其光催化活性研究

Preparation and photocatalytic property of preferred-oriented ZnO nanorod array films

生长速度慢的晶面，吸附的元素Nd较少，该晶面生长速度变得相对较快。

Thus the growth rate of the crystal surface becomes relatively fast .

不同晶面与应变状态下Si／Ge应变异质界面的价带能量不连续性

Valence-band offsets at st / ge strained heterointerfaces under different strain conditions

水热法合成α-Al2O3晶体的晶面形态

Interface Morphological Forms of α - Al_2O_3 Crystal Synthesized by Hydrothermal Method

极性对重掺GaAs晶体中小晶面效应的影响

Influence of Polarity on the Facet Effect in Heavily Doped GaAs Crystals

Al的掺入使得晶面间距差别较小，掺杂没有明显改变晶格结构。

The doping did not change the lattice of structure , and the less impact on the crystal spacing .

RHEED在计算Al2O3晶面间距中的应用

Application of RHEED in the Calculation of Al_2O_3 Interplanar Distance

采用sol-gel旋涂法在抛光硅111晶面生长了高度C轴取向的ZnO薄膜。

ZnO thin films with high c-axis orientation were prepared on polished Si 111 substrates by using spin coating method .

大晶面间距X射线分光晶体马来酸氢十八酯（OHM）

X-ray Analyzing Crystal with Large Interplanar Spacing & Octadecyl Hydrogen Maleate ( OHM )

HTPB与Al不同晶面结合能和力学性能的分子动力学模拟

Molecular Dynamics Simulation on Binding Energies and Mechanical Properties of HTPB and Different Crystal Faces of Al

用微波ECR等离子体溅射法在蓝宝石（0112）晶面上生长ZnO薄膜的研究

The study of epitaxial growth ZnO thin film on a ( 0112 ) sapphire substrate

直流电弧等离子喷射CVD中控制生长（111）晶面占优的金刚石膜

Controlling Fabrication of ( 111 ) Crystal Surface Dominating Diamond Film by DC ARC Plasma Jet CVD

自然金｛110｝晶面微形貌的STM观察

STM microtopography of Au { 110 } crystal face

由此可见，辐照PA1010及M／P体系结晶辐射损伤始于晶面。

The crystalline surfaces were damaged when the system of PA 1010 and M / P were irradiated .

加入低浓度的时，生成片状、圆形的COM晶体，（020）晶面消失。

It form slice , rounded COM crystals and the ( 020 ) face of COM to disappear in low concentration .

X－射线衍射法揭示溶液中的氢氧化铝能使镀层的结晶细致，晶面择优取向程度增加。

X-ray diffraction testified that Al ( OH ) 3 colloid could make the crystal grains of the coating finer with higher degree of the preferred orientation .

XRD结果表明，薄膜为面心立方Ni基固溶体结构，并具有明显的（111）晶面择优取向。

XRD result indicated that the film , which was fcc Ni-based solid solution structure , presented an evident ( 111 ) preferred orientation .

不同邻晶面Hg（1-x）CdxTe外延薄膜的特性分析

Characterization of Hg 1 - x CD x te epitaxial films on various vicinal planes

SEM和XRD测试表明：过量的硫脲会改变铜沉积的晶面择优取向，使铜结晶粒度变大。

The test results of XRD and SEM indicate that over thiourea could change predominant crystal orientation of copper deposition and enlarge crystal granularity .

以H2为稀释气体制备的SiC涂层致密、光滑，沉积的SiC涂层全部是β-SiC，且具有非常强的（111）晶面取向，涂层中无α-SiC出现。

The coatings deposited by H_2 as diluent gas have a dense and smooth surface , and are of all β - SiC without α - SiC .

在SEM下，观察到这种胶体晶体是面心立方（fcc）密排结构，其（111）晶面平行于基底。

SEM images reveal that the SiO_2 colloidal crystal has face-centered-cubic ( fcc ) structure with its ( 111 ) planes parallel to the substrate .

从CO吸附剥离实验获得的电化学指纹判断，Pd纳米棒的形貌特征在于其侧面暴露了{110}晶面。

According to the electrochemical fingerprint obtained from CO-stripping experiments , it was proved that the morphology of Pd nanorods features the exposure of { 110 } facets .

在晶面上化学吸附的对称约化EHMO计算程序

A Symmetry-Reduced EHMO Computation Program for Homogeneous Chemisorption on Surface Lattices

结果表明：cBN晶体多为截角八面体，晶面致密光滑；

Most of cBN crystals show off trun-cated octahedral shapes , and crystal surfaces are smooth and dense .

XRD显示氮化铜薄膜择优（111）晶面生长，铁掺杂使氮化铜薄膜的结晶程度减弱。

X-ray diffraction ( XRD ) shows that the copper nitride film growth prefers ( 111 ) direction , and the Fe-doped copper nitride film is weak crystalline .