抛光

副镜在磨制和抛光过程中必须与此新形状相适应。

The secondary mirror must be adapted during the process of grinding and polishing to this other form .

许多这些产品都含有微量的腐蚀剂，化学物或抛光剂。

Many of these products contain mild abrasives , chemicals or polishing agents .

牙医为我刮除牙石，抛光了牙齿。

The dentist scaled and polished my teeth .

抛光后的深色木料像玻璃一样熠熠闪光。

The dark polished wood shone like glass .

这件木工品的抛光和做工均属上乘。

The finish and workmanship of the woodwork was excellent .

木头最近经过抛光又恢复了光泽。

The wood had been recently polished to bring back the shine .

经过大量的抛光和擦拭，黄铜光亮如新。

It took a considerable amount of polish and elbow grease before the brass shone like new .

较新的材料，如syton这种化学·机械抛光剂正开始使用。

Newer materials , such as syton , are chemo-mechanical and are beginning to be used .

最普通的精加工工序是用机械的方法，如研磨，磨削或用磨料抛光。

The most common finishing operations are mechanical , such as milling , grinding , or polishing with abrasives .

Pawdicure（宠物美甲）指针对宠物进行的精致舒适的足部护理，包括足部按摩、指甲润泽、修剪、抛光及彩绘，程序与人类足部护理一样。

Pawdicure refers to the elaborate pampering and moisturized and their nails clipped , polished and painted , just like a human pedicure .

H分量反映的才是颜色的种类，因此选用H分量进行瓷质抛光砖的颜色检测。

So H weight is the basis of analyzing the color of ceramic tile .

利用真空蒸发法制备ZnO薄膜，衬底材料是镜面抛光石英片。

The ZnO films were synthesized by vacuum evaporation on mirror-polished quartz substrates .

用锡盘抛光α-Al2O3单晶的初步实验研究

Preliminary Study of Superpolishing Sapphire Single Crystal Using Tin Lap

流延法制备95Al2O3瓷基板的研究高铝瓷质抛光砖的研制

Tape Casting of 95 Alumina Substrates Study on High Alumina Porcelain Tile

结果：SEM观察表明抛光组的平滑度与自上釉相似。

Results : SEM observation revealed that polishing produced similar surface roughness to self glazing did .

CVD金刚石膜等离子体弧抛光的机理研究

The Research about Mechanism of Plasma arc Polishing CVD Diamond Films

GaAs抛光片腐蚀过程初步研究

Primary Study of Etching Process for Polished GaAs Wafers

用于GaN生长的蓝宝石衬底化学抛光研究

Chemical Polishing of Sapphire for Growth of GaN

抛光垫是CMP系统的重要组成部分，也是CMP的主要消耗品。

Polishing pad is the main consumables of the CMP .

CVD金刚石膜抛光技术

Polishing Technology of CVD Diamond Films

InP（100）的化学减薄与化学抛光

Chemical Thinning and Polishing of ( 100 ) lnP

CdSe探测器晶片化学机械抛光工艺研究

Study on Chemical Mechanical Polishing Technology for CdSe Wafer for Detectors

应用计算流体力学（CFD）方法分析了磁射流抛光技术的材料去除机理。

The mechanism of material removal in MJP is studied by the method of Computational Fluid Dynamics ( CFD ) .

ULSI电路层间SiO2介质CMP工艺与抛光液

Processes and Slurries in ULSI SiO_2 , ILD CMP

化学机械抛光（CMP）技术的发展、应用及存在问题

Advances and Problems on Chemical Mechanical Polishing

马尔文纳米激光粒度分析仪在测定高浓度化学机械抛光（CMP）浆料粒度分布中的应用

Determining the Particle Size Distribution of Chemical-mechanical Polishing Slurries by Malvern HPPS Particle Size Analyzer

氧化铈纳米颗粒的合成及其化学机械抛光性能钛锆掺杂CeO2磨料的制备及其化学机械抛光性能

Synthesis of CeO_2 Nanoparticles and its Chemical Mechanical Polishing Performance Preparation of Ti or Zr-doped Ceria Abrasives and Their Chemical Mechanical Polishing Performance

本文采用氩离子束轰击法，对不同晶体学表面形貌的CVD金刚石膜进行抛光处理。

To improve the surface roughness of CVD diamond films , ion beam milling was used to polish the film .

ULSI制造中铜化学机械抛光的腐蚀磨损机理分析

Corrosive Wear Analysis of the Copper Chemical-mechanical Polishing in ULSI Manufacturing

用SEM、TEM观察了复合材料表面抛光组织、断口形貌、裂纹扩展和微观结构。研究了ZrO2含量对复合材料的力学性能的影响。

Surface polished structure , fracture morphology , crack propagation and substructure of the composites were observed with SEM and TEM .