zygo

HfO_2 films were prepared by electron beam evaporation . The residual stress was measured by ZYGO interferometer .

用电子束蒸发方法制备了HfO2薄膜，根据镀膜前后基片曲率半径的变化，用Stoney公式计算了薄膜应力，讨论了沉积温度对薄膜残余应力的影响。

The feasibility of the virtual grating phase-shifting moire fringe method is achieved by comparing the results with those of ZYGO 's.

对实际干涉图进行了处理，并与ZYGO的测试结果进行比对，结果吻合，从而证实了这种方法的可行性。

We constructed the standard plane wave system to test the system of radial shearing interferometer and compare with the Zygo light source , got similar results .

构建了标准平面波系统，对径向剪切干涉系统进行了测试研究，并使用ZYGO干涉仪光源进行了对比得到了相近的结果。

Based on frequency domain theory , local errors with different apertures are fitted using Zernike polynomials and experiments on optical elements are made using Zygo interferometer .

基于频域分析理论，利用泽尼克多项式对不同口径局部误差进行了拟合，并利用齐戈（Zygo）干涉仪对带有不同面形误差的光学元件进行了试验分析。

Compared with the results of ZYGO interferometer , an error less than 1 / 15 λ for both peak-valley and root mean square value , is gained with good repeatability .

检测结果与ZYGO数字波面干涉仪进行了比对，峰谷值、均方根值均优于1/15λ，并具有很好的可重复性。

ZYGO profiler indicates that , with the prepared colloidal SiO_2 slurry , the average roughness of the polished glass substrate surface can be decreased to about 0.5 nm .

ZYGO形貌仪表明，采用纳米氧化硅抛光液，可以使玻璃表面粗糙度达到0.5nm左右。

After two times of ageing of 200 ℃ high temperature and - 40 ℃ low temperature for two years , the RMS error of the φ 200mm lightweight quartz mirror has been tested by ZYGO Mark ⅳ interferometer .

φ200mm轻型石英反射镜经两次高温200℃，低温－40℃实验及两年时效研究，用ZYGOMarkⅣ干涉仪测量均方根误差及变化。

An aberration plate containing random static wavefront aberrations was measured with a Hartmann Shack sensor and a ZYGO interferometer respectively , then the modal wavefront reconstruction error of Hartmann Shack sensor while using different Zernike polynomials was obtained . The experimental results were analyzed and compared with theoretical calculations .

用哈特曼夏克传感器测量一个像差板的随机静态像差，通过与ZYGO干涉仪的测量结果比较，得到不同泽尼克模式复原阶数下的波前复原误差的实验结果，并与理论计算结果进行了对比。