nisi
- 网络硅化镍;镍硅;硅化物;日本耐司;国家信息安全基础设施
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The period between the decree nisi and the decree absolute was six weeks .
离婚判决令和最终判决之间的期限当时为六个星期。
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Analysis on Phonon Modes ' Symmetry Properties of NiSi / Si ( 001 ) Film
NiSi/Si(001)声子模式对称性分析
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Solid Phase Reaction of Ni / Pd / Si ( 100 ) and Enhancement of NiSi Thermal Stability Study
Ni/Pd/Si固相反应及NiSi热稳定性增强研究
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Sliding wear behaviors of Mo_2Ni_3Si / NiSi composite coating
Mo2Ni3Si/NiSi复合材料涂层的滑动磨损行为
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Structure design , manufacturing and fixing of the NiCr / NiSi thin film thermocouple temperature measuring cutter are completed .
NiCr-NiSi薄膜热电偶测温刀头的结构设计、加工制作与安装;
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Enhanced Effects of Pt Layer on Thermal Stability of NiSi Thin Film by Solid Phase Reaction of Ni / Si ( 100 ) System
Pt层对Ni/Si(100)固相反应NiSi薄膜高温稳定性的增强效应
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Cloning of Nisin resistent gene nisI from Lactococcus lactis and its application as a food grade selection marker
乳酸乳球菌Nisin抗性基因nisI的克隆及作为筛选标记
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The study on solid phase reaction in Ni / Si ( 110 ) system and the characteristics of NiSi / Si ( 110 ) Schottky contact .
Ni/Si(110)的固相反应特性及肖特基结电学特性研究。
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The influence of the substrate doping and annealing process ( one-step RTP and two-step RTP ) on the NiSi / Si interface is investigated .
还研究了硅衬底掺杂和退火过程对NiSi/Si界面的影响。
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The wear mass loss of the Mo2Ni3Si / NiSi silicide composite coatings increases very slowly with increasing wear test load under room-temperature sliding wear test conditions .
在常温滑动磨损条件下,Mo2Ni3Si/NiSi金属硅化物复合材料涂层的质量损失随着载荷的增加缓慢增加;
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NiCr / NiSi thin films are plated on the insulated HSS cutter . Static calibration of the thin film thermocouple is carried out .
采用多弧离子镀方法在镀有绝缘膜的高速钢基体上制备NiCr、NiSi热电偶薄膜,并分析了薄膜成分;
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It is shown by the experiment and analysis that there is lower SBH and larger ideality factor for NiSi / Si ( 110 ) contact . 2 .
实验数据和分析结果表明NiSi/Si(110)接触具有较低的肖特基势垒和较大的理想因子。
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Microstructure , mechanical properties and electrical conductivity of copper based alloys with additions of Ni / Si , Mn / NiSi , and Ti have been investigated by optical microscope and scanning electron microscope .
利用合金化方法,并借助金相、SEM等测试分析手段研究了Ni/Si,Mn/NiSi和Ti对纯铜显微组织、力学性能和导电性能的影响。
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The heat-reaction characteristics of Ni / Si and TiN / Ni / Si structure and the regularity for forming the NiSi film have been studied deeply and formed the excellent Ni-salicide shallow junction diode .
文中对Ni/Si和TiN/Ni/Si的热反应特性以及NiSi薄膜的形成规律进行了详细的研究。制备了优质的Ni硅化物浅结二极管。
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I make an order nisi that the Applicant is to pay costs of all the Respondents in the present case ( including costs in instructing Counsel ), such costs to be taxed on High Court scale if not agreed .
如与讼双方未能议定讼费的款额,则该款额以高等法院的讼费水平为基准由法庭评定。
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Because the formation temperature of NiSi is low enough and Ni atoms are always the dominating diffusion species during Ni / Si reaction , a single-step rapid thermal process ( RTP ) is accepted as one of its advantages in early studies .
由于NiSi形成温度低,硅化反应过程中Ni始终是主导扩散粒子,因此早期研究都认为只要使用单步快速热处理工艺(RTP)即可。
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Using data from the National Survey of Family Growth , the sociologist pinpoints an age window between mid to late twenties in which saying ' I do " is said to lead to a happily ever after rather than a decree nisi 。
这位社会学家利用《全国家庭成长调查》的数据确定了(结婚)最佳年龄是在25岁到29岁之间,在这个年龄段说出“我愿意”会使人幸福美满,而不是最终换来一纸离婚判决书。
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A sensitive electrical characterization method of Schottky Barrier Characterization combining with Schottky Barrier Hight ( SBH ) fitting and inverse current testing was also introduced to indirectly perceive the influences of copper through the diffusion barrier and NiSi layer on the interfacial characteristics .
引入了较为灵敏的肖特基势垒特性测试,结合肖特基势垒高度拟和和反向漏电流测试来观察Cu经过扩散阻挡层、NiSi后对界面特性的影响。