duv

The design of a new kind of UV or DUV lithography lenses is described in this paper .

设计了一种新的紫外或深紫外光刻物镜。

Compared with other UV or DUV lithography lenses , this lens can meet the needs of higher numerical aperture and full use of its field .

该物镜与国内外现有的紫外或深紫外光刻物镜相比，既能满足大数值孔径的需要，又能充分利用物镜的视场。

Real-Time Exposure Dose Control Algorithm for DUV Excimer Lasers

深紫外准分子激光实时曝光剂量控制算法研究

Optical constants of fluoride films in the DUV range

氟化物材料在深紫外波段的光学常数

Application of DUV deep lithography in LIGA process

深紫外深度光刻蚀在LIGA工艺中的应用

The experiments on DUV coating deposited by ALD are carried out .

对ALD制备深紫外薄膜进行了研究。

A real-time exposure dose control algorithm for DUV excimer lasers in a step and scan projection lithography is presented .

提出了一种面向步进扫描投影光刻机的深紫外准分子激光实时曝光剂量控制算法。

The Development of DUV Resist

DUV光致抗蚀剂的研究进展（Ⅰ）&主体成膜高分子部分

KrF DUV Light Source Trends-Versatility & Extendibility for 2005 and Beyond

2005年及以后KrF深紫外线光源的发展趋势&多功能和可扩展性

Synthesis and Growth of a DUV NLO Crystal KBe_2 ( BO_3 ) F_2

深紫外倍频晶体KBe2（BO3）F2的合成与生长

Exposure latitude improvement , enhanced critical dimen-sion ( CD ) control , elimination of reflective notching , and protection of DUV resist from substrate poison-ing .

曝光宽容度的改善，提高了关键尺寸的控制，消除了反射凹口，防止远紫外抗蚀剂由基底毒化。

Coherent light sources in the deep and vacuum UV ( DUV and VUV ) spectral regions become more important with the development of photolithography , laser micro-machining as well as laser spectroscopy .

随着光刻、激光微加工以及激光光谱仪的发展，紫外与深紫外光谱区的相干光源变得越来越重要。

The review will briefly introduce how to use the anionic group theory to develop new borate-based DUV and VUV nonlinear optical crystals . Meanwhile , The basic linear and nonlinear optical properties of these borate-based crystals are systemically reviewed .

本文简要地回顾了使用阴离子基团理论发展新型硼酸盐系列紫外与深紫外非线性光学晶体的历史，同时系统地介绍了这些硼酸盐系列晶体的线性和非线性光学性质。