The results show that electrical , optical and structure properties of ZWO films depend on sputtering parameters such as oxygen partial pressure , doping content , substrate temperature and sputtering current , etc.
研究表明,ZWO多晶薄膜的电学与光学特性与掺杂量、氧分压、基底温度以及溅射电流等制备条件参数密切相关。