1nm

Fabrication of 1nm / s High Deposition Microcrystalline Silicon and Its Application in Solar Cells

1nm/s高速率微晶硅薄膜的制备及其在太阳能电池中的应用

METHOD : The UV method used water as solvent . 314 ± 1nm was selected as determination wavelength .

方法：UV法用水作溶剂，选择314±2nm作为测定波长；

The dissolution of domestic and Japan Lomefloxacin capsules was determined by UV spectrophotometry (λ max 287 ± 1nm ) .

采用紫外分光光度法（λ（max）287±1nm）对国产及日本产盐酸洛美沙星胶囊进行体外溶出度测定。

In the longer wavelength ( r > 10nm ) of soft x ray region ( 1nm peak reflectivity of a multilayer mirror has reached 66 % .

在软x射线（1nm＜λ＜30nm）的长波长区域（10nm＜γ＜30nm），多层镜的制作已经成熟，例如：在13.4nm处反射率峰值达到66%。

This device may make on-line checking on mechanical vibration with high frequency ( 40kHz ~ several MHz ) and mini-amplitude ( smaller than 1nm ) and frequency as high as several MHz .

可对高频（40kHz到数MHz）、小振幅（≤1nm）、频振高达数MHz的机械振动波实现在线检测。

This new process gains super-smooth surface on optical material with angstrom dimension ( Ra < 1nm ) . By various experiments , the effects of water quality of polishing disk , time of modifying ice disk , polishing pressure and eccentricity on surface roughness are studied .

这种新工艺可使光学材料获得Ra<1nm的原子级超光滑表面，通过大量的试验，系统研究了抛光盘水质、抛光前修盘时间、抛光压力和偏心等对已加工表面粗糙度的影响规律。

In order to carrying out depolarization in UV range ( 200 ~ 350nm ) and narrow bandwidth ( 1nm ), a depolarizer consisting of two pieces of thick quartz delayers is designed on the basis of Lyot depolarizer .

为了在紫外波段200~350nm，窄带宽1nm的情况下实现消偏，在Lyot型消偏器的基础上，设计了一种由两块厚的石英延迟片组成的消偏器。